Mass spectrometry investigation of magnetron sputtering discharges

P. Pokorný, J. Musil, J. Lančok, P. Fitl, M. Novotný, J. Bulíř, J. Vlček

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

This paper deals with the mass spectrometric characterization of atoms, radicals and ions generated in the RF magnetron discharges sputtering metal targets in Ne, Ar, Kr and Xe gases. In magnetron discharges different kinds of species such as atoms, radicals and positive and negative ions according to the target material and sputtering gas pressure can be generated. The mass spectrometry of the magnetron discharge, which gives the detailed information on these species, is of key importance for the development of new advanced thin films. The amount of individual atoms, radicals and ions and the ion energy distribution as a function of flow and pressure of the sputtering gas, and the magnetron power is discussed in detail. This article shows (1) the ion distribution functions of gas and sputtered target material ions as a function of sputtering gas pressure, (2) the evolution of the amount of single-ionized and double-ionized atoms of gases and metals generated in the RF discharge during sputtering of Ag films in various inert gases as a function of gas pressure, and (3) the contamination of the sputtered metallic films by the oxygen from a residual gas atmosphere in the deposition chamber at low film deposition rates.

Original languageEnglish
Pages (from-to)438-443
Number of pages6
JournalVacuum
Volume143
DOIs
Publication statusPublished - 1 Sep 2017

Fingerprint

Magnetron sputtering
Mass spectrometry
magnetron sputtering
mass spectroscopy
Gases
sputtering
Sputtering
gas pressure
Ions
gases
atoms
ions
Atoms
Discharge (fluid mechanics)
residual gas
ion distribution
positive ions
negative ions
Metals
metals

ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

Cite this

Pokorný, P., Musil, J., Lančok, J., Fitl, P., Novotný, M., Bulíř, J., & Vlček, J. (2017). Mass spectrometry investigation of magnetron sputtering discharges. Vacuum, 143, 438-443. https://doi.org/10.1016/j.vacuum.2017.06.032

Mass spectrometry investigation of magnetron sputtering discharges. / Pokorný, P.; Musil, J.; Lančok, J.; Fitl, P.; Novotný, M.; Bulíř, J.; Vlček, J.

In: Vacuum, Vol. 143, 01.09.2017, p. 438-443.

Research output: Contribution to journalArticle

Pokorný, P, Musil, J, Lančok, J, Fitl, P, Novotný, M, Bulíř, J & Vlček, J 2017, 'Mass spectrometry investigation of magnetron sputtering discharges', Vacuum, vol. 143, pp. 438-443. https://doi.org/10.1016/j.vacuum.2017.06.032
Pokorný P, Musil J, Lančok J, Fitl P, Novotný M, Bulíř J et al. Mass spectrometry investigation of magnetron sputtering discharges. Vacuum. 2017 Sep 1;143:438-443. https://doi.org/10.1016/j.vacuum.2017.06.032
Pokorný, P. ; Musil, J. ; Lančok, J. ; Fitl, P. ; Novotný, M. ; Bulíř, J. ; Vlček, J. / Mass spectrometry investigation of magnetron sputtering discharges. In: Vacuum. 2017 ; Vol. 143. pp. 438-443.
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