Abstract
The article reports mass spectrometric characterizations of ions generated in RF magnetron discharges generated using silver targets and Ne, Ar, Kr and Xe gases. Both the amount of ions and ion energies in magnetron discharges were investigated. The following ions X+, Ag+, (XAg) +, X2 +, Ag2 +, X ++ and Ag++ were found in the RF discharges; here X = Ne, Ar, Kr, Xe is the inert gas atom and Ag is the silver atom. The amount of individual ions, their energies and ion energy distribution (IED) functions as a function of sputtering gas pressure were measured. It is shown that the sputtering gas pressure strongly influences the generation of ions, their amount and energy in the RF magnetron discharges. The knowledge of the energies and amounts of individual ions is of a key importance in the deposition of thin films with controlled properties using RF magnetron discharges.
| Original language | English |
|---|---|
| Pages (from-to) | 593-602 |
| Number of pages | 10 |
| Journal | Plasma Processes and Polymers |
| Volume | 10 |
| Issue number | 7 |
| DOIs | |
| Publication status | Published - 1 Jul 2013 |
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Keywords
- double charge ions
- mass spectrometry
- noble gas
- RF magnetron discharges
- silver
- single charge ions
ASJC Scopus subject areas
- Condensed Matter Physics
- Polymers and Plastics
Cite this
Mass spectrometric characterizations of ions generated in RF magnetron discharges during sputtering of silver in Ne, Ar, Kr and Xe gases. / Pokorný, Petr; Novotný, Michal; Musil, Jindřich; Fitl, Přemysl; Bulíř, Jiří; Lančok, Ján.
In: Plasma Processes and Polymers, Vol. 10, No. 7, 01.07.2013, p. 593-602.Research output: Contribution to journal › Article
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TY - JOUR
T1 - Mass spectrometric characterizations of ions generated in RF magnetron discharges during sputtering of silver in Ne, Ar, Kr and Xe gases
AU - Pokorný, Petr
AU - Novotný, Michal
AU - Musil, Jindřich
AU - Fitl, Přemysl
AU - Bulíř, Jiří
AU - Lančok, Ján
PY - 2013/7/1
Y1 - 2013/7/1
N2 - The article reports mass spectrometric characterizations of ions generated in RF magnetron discharges generated using silver targets and Ne, Ar, Kr and Xe gases. Both the amount of ions and ion energies in magnetron discharges were investigated. The following ions X+, Ag+, (XAg) +, X2 +, Ag2 +, X ++ and Ag++ were found in the RF discharges; here X = Ne, Ar, Kr, Xe is the inert gas atom and Ag is the silver atom. The amount of individual ions, their energies and ion energy distribution (IED) functions as a function of sputtering gas pressure were measured. It is shown that the sputtering gas pressure strongly influences the generation of ions, their amount and energy in the RF magnetron discharges. The knowledge of the energies and amounts of individual ions is of a key importance in the deposition of thin films with controlled properties using RF magnetron discharges.
AB - The article reports mass spectrometric characterizations of ions generated in RF magnetron discharges generated using silver targets and Ne, Ar, Kr and Xe gases. Both the amount of ions and ion energies in magnetron discharges were investigated. The following ions X+, Ag+, (XAg) +, X2 +, Ag2 +, X ++ and Ag++ were found in the RF discharges; here X = Ne, Ar, Kr, Xe is the inert gas atom and Ag is the silver atom. The amount of individual ions, their energies and ion energy distribution (IED) functions as a function of sputtering gas pressure were measured. It is shown that the sputtering gas pressure strongly influences the generation of ions, their amount and energy in the RF magnetron discharges. The knowledge of the energies and amounts of individual ions is of a key importance in the deposition of thin films with controlled properties using RF magnetron discharges.
KW - double charge ions
KW - mass spectrometry
KW - noble gas
KW - RF magnetron discharges
KW - silver
KW - single charge ions
UR - http://www.scopus.com/inward/record.url?scp=84879879570&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84879879570&partnerID=8YFLogxK
U2 - 10.1002/ppap.201200145
DO - 10.1002/ppap.201200145
M3 - Article
AN - SCOPUS:84879879570
VL - 10
SP - 593
EP - 602
JO - Plasma Processes and Polymers
JF - Plasma Processes and Polymers
SN - 1612-8850
IS - 7
ER -