Abstract
The results of the work on the creation of regular microstructures using deep x-ray lithography with synchrotron radiation are presented. The characteristics of the main processes of supporting membranes formation, absorbing layers and topological templates, as well as the results of measurements of the resulting structures when exposed to the channel of synchrotron radiation are presented.
| Original language | English |
|---|---|
| Title of host publication | Proceedings - 2012 7th International Forum on Strategic Technology, IFOST 2012 |
| DOIs | |
| Publication status | Published - 2012 |
| Event | 2012 7th International Forum on Strategic Technology, IFOST 2012 - Tomsk, Russian Federation Duration: 18 Sep 2012 → 21 Sep 2012 |
Other
| Other | 2012 7th International Forum on Strategic Technology, IFOST 2012 |
|---|---|
| Country | Russian Federation |
| City | Tomsk |
| Period | 18.9.12 → 21.9.12 |
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Keywords
- deep x-ray lithography
- LIGA-technology
- regular microstructures
ASJC Scopus subject areas
- Management of Technology and Innovation
Cite this
Manufacturing of regular microstructures by methods of LIGA - Technologies. / Aumalikova, M. N.; Timchenko, N. A.; Kuznetsov, S. I.; Goldenberg, B. G.; Pindurin, V. F.; Litvin, S. V.; Kanaev, V. G.
Proceedings - 2012 7th International Forum on Strategic Technology, IFOST 2012. 2012. 6357553.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
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TY - GEN
T1 - Manufacturing of regular microstructures by methods of LIGA - Technologies
AU - Aumalikova, M. N.
AU - Timchenko, N. A.
AU - Kuznetsov, S. I.
AU - Goldenberg, B. G.
AU - Pindurin, V. F.
AU - Litvin, S. V.
AU - Kanaev, V. G.
PY - 2012
Y1 - 2012
N2 - The results of the work on the creation of regular microstructures using deep x-ray lithography with synchrotron radiation are presented. The characteristics of the main processes of supporting membranes formation, absorbing layers and topological templates, as well as the results of measurements of the resulting structures when exposed to the channel of synchrotron radiation are presented.
AB - The results of the work on the creation of regular microstructures using deep x-ray lithography with synchrotron radiation are presented. The characteristics of the main processes of supporting membranes formation, absorbing layers and topological templates, as well as the results of measurements of the resulting structures when exposed to the channel of synchrotron radiation are presented.
KW - deep x-ray lithography
KW - LIGA-technology
KW - regular microstructures
UR - http://www.scopus.com/inward/record.url?scp=84871840934&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84871840934&partnerID=8YFLogxK
U2 - 10.1109/IFOST.2012.6357553
DO - 10.1109/IFOST.2012.6357553
M3 - Conference contribution
AN - SCOPUS:84871840934
SN - 9781467317702
BT - Proceedings - 2012 7th International Forum on Strategic Technology, IFOST 2012
ER -