Magnetron sputtered Cr-Ni-N and Ti-Mo-N films: Comparison of mechanical properties

F. Regent, J. Musil

Research output: Contribution to journalArticlepeer-review

74 Citations (Scopus)


This article reports on structure and mechanical properties of Cr-Ni-N and Ti-Mo-N films with a low (< 10 at.%) content of Ni or Mo, respectively. The films were deposited by reactive sputtering using d.c. unbalanced magnetron equipped with a round planar Cr target fixed to the magnetron cathode with a Ni ring or alloyed TiMo (90:10 at.%) target. The investigation of sputtered films showed that: (i) both Cr-Ni-N and Ti-Mo-N films can form a superhard material with a maximum microhardness Hmax of approximately 45 GPa; (ii) the films with Hmax exhibit a single-oriented structure and; (iii) the Cr-Ni-N films exhibit a higher resistance to plastic deformation compared to the Ti-Mo-N films. The relationships between microhardness, H, reduced Young's modulus, E* = E/(1 - ν2), and elastic recovery, We, evaluated from loading/unloading curves measured using a computer-controlled microhardness tester Fisherscope H 100, are given; here E and ν are the Young's modulus and Poisson ratio, respectively. The production of a high-temperature (β-Ti,Mo)(110) phase in pure Ti-Mo alloy film sputtered on unheated steel substrate is also reported.

Original languageEnglish
Pages (from-to)146-151
Number of pages6
JournalSurface and Coatings Technology
Publication statusPublished - 1 Jul 2001


  • Cr-Ni-N and Ti-Mo-N films
  • High-temperature phase
  • Magnetron sputtering
  • Mechanical porperties
  • Structure

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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