Abstract
This article reports on structure and mechanical properties of Cr-Ni-N and Ti-Mo-N films with a low (< 10 at.%) content of Ni or Mo, respectively. The films were deposited by reactive sputtering using d.c. unbalanced magnetron equipped with a round planar Cr target fixed to the magnetron cathode with a Ni ring or alloyed TiMo (90:10 at.%) target. The investigation of sputtered films showed that: (i) both Cr-Ni-N and Ti-Mo-N films can form a superhard material with a maximum microhardness Hmax of approximately 45 GPa; (ii) the films with Hmax exhibit a single-oriented structure and; (iii) the Cr-Ni-N films exhibit a higher resistance to plastic deformation compared to the Ti-Mo-N films. The relationships between microhardness, H, reduced Young's modulus, E* = E/(1 - ν2), and elastic recovery, We, evaluated from loading/unloading curves measured using a computer-controlled microhardness tester Fisherscope H 100, are given; here E and ν are the Young's modulus and Poisson ratio, respectively. The production of a high-temperature (β-Ti,Mo)(110) phase in pure Ti-Mo alloy film sputtered on unheated steel substrate is also reported.
Original language | English |
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Pages (from-to) | 146-151 |
Number of pages | 6 |
Journal | Surface and Coatings Technology |
Volume | 142-144 |
DOIs | |
Publication status | Published - 1 Jul 2001 |
Keywords
- Cr-Ni-N and Ti-Mo-N films
- High-temperature phase
- Magnetron sputtering
- Mechanical porperties
- Structure
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry