Low pressure annealing of gold nanostructures

J. Siegel, O. Kvítek, O. Lyutakov, A. Řezníčková, V. Švorčík

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Ultra-thin Au films sputtered on glass substrates were investigated. The samples were annealed in air and in an evacuated chamber. The dependence of the annealing process on ambient pressure during thermal treatment was studied. The thermally-induced changes in surface morphology were followed by atomic force microscopy. The changes have a great impact on dielectric, optical and physical properties of the prepared structures. UVeVis absorption spectra were used to investigate optical parameters and showed the semiconducting characteristic of intrinsic Au clusters. It was found that reduced ambient pressure stabilizes the continuous structure of the thin gold film during the annealing process.

Original languageEnglish
Pages (from-to)100-105
Number of pages6
JournalVacuum
Volume98
DOIs
Publication statusPublished - 1 Jan 2013
Externally publishedYes

Keywords

  • Annealing
  • Gold
  • Sputtering
  • Surface morphology
  • Thin film

ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

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    Siegel, J., Kvítek, O., Lyutakov, O., Řezníčková, A., & Švorčík, V. (2013). Low pressure annealing of gold nanostructures. Vacuum, 98, 100-105. https://doi.org/10.1016/j.vacuum.2013.03.019