Low-energy plasma-immersion implantation of nitrogen ions in titanium by a beam with ballistic focusing

I. V. Lopatin, Yu H. Akhmadeev, O. S. Korneva, O. V. Krysina, E. A. Petrikova, N. A. Prokopenko, A. I. Ryabchikov, D. O. Sivin

Research output: Contribution to journalConference article

Abstract

The results of experiments on low-energy implantation of nitrogen ions into VT1-0 titanium alloy are presented. Processing was performed by a nitrogen ion pulsed beam obtained using a ballistic ion focusing system. An ion source was a nitrogen plasma of the non-self-sustained gas arc discharge with a thermionic cathode. It has been shown that when the specimens are processed in such a system, hardness of the surface increases from 1.5 to 2.5 times. In addition, the surface of the specimens undergoes ion etching which causes the formation of an etching cavity whose profile depends on the ion effect parameters.

Original languageEnglish
Article number032043
JournalJournal of Physics: Conference Series
Volume1115
Issue number3
DOIs
Publication statusPublished - 27 Nov 2018
Event6th International Congress on Energy Fluxes and Radiation Effects 2018, EFRE 2018 - Tomsk, Russian Federation
Duration: 16 Sep 201822 Sep 2018

    Fingerprint

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this