Abstract
This study describes the first results of high intensity macroparticle-free aluminum ion beam formation and its application to low ion energy implantation. A DC vacuum arc was used to produce aluminum plasma flow. A repetitively pulsed macroparticle-free high intensity aluminum ion beam was formed using a plasma immersion ion extraction combined with ion beam focusing. A very high current ion beam with the current up to 0.475 A at bias pulse duration of 4 μs and the pulse repetition rate of 105 pulses per second was obtained. Nickel substrates were irradiated by aluminum ions with very high current densities up to 100 mA/cm2 and accelerating voltages up to 2.1 kV. The maximum fluence of implantation reached 1.2 × 1021 ion/сm2. The results of the element composition of the modified layer were also investigated.
| Original language | English |
|---|---|
| Pages (from-to) | 123-128 |
| Number of pages | 6 |
| Journal | Surface and Coatings Technology |
| Volume | 355 |
| DOIs | |
| Publication status | Published - 15 Dec 2018 |
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Keywords
- Aluminum
- High intensity ion beam
- Intermetallic layers
- Metal ion implantation
- Nickel
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry
Cite this
Low energy, high intensity metal ion implantation method for deep dopant containing layer formation. / Ryabchikov, Alexander I.; Shevelev, Alexey E.; Sivin, Denis O.; Ivanova, Anna I.; Medvedev, Vladislav N.
In: Surface and Coatings Technology, Vol. 355, 15.12.2018, p. 123-128.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Low energy, high intensity metal ion implantation method for deep dopant containing layer formation
AU - Ryabchikov, Alexander I.
AU - Shevelev, Alexey E.
AU - Sivin, Denis O.
AU - Ivanova, Anna I.
AU - Medvedev, Vladislav N.
PY - 2018/12/15
Y1 - 2018/12/15
N2 - This study describes the first results of high intensity macroparticle-free aluminum ion beam formation and its application to low ion energy implantation. A DC vacuum arc was used to produce aluminum plasma flow. A repetitively pulsed macroparticle-free high intensity aluminum ion beam was formed using a plasma immersion ion extraction combined with ion beam focusing. A very high current ion beam with the current up to 0.475 A at bias pulse duration of 4 μs and the pulse repetition rate of 105 pulses per second was obtained. Nickel substrates were irradiated by aluminum ions with very high current densities up to 100 mA/cm2 and accelerating voltages up to 2.1 kV. The maximum fluence of implantation reached 1.2 × 1021 ion/сm2. The results of the element composition of the modified layer were also investigated.
AB - This study describes the first results of high intensity macroparticle-free aluminum ion beam formation and its application to low ion energy implantation. A DC vacuum arc was used to produce aluminum plasma flow. A repetitively pulsed macroparticle-free high intensity aluminum ion beam was formed using a plasma immersion ion extraction combined with ion beam focusing. A very high current ion beam with the current up to 0.475 A at bias pulse duration of 4 μs and the pulse repetition rate of 105 pulses per second was obtained. Nickel substrates were irradiated by aluminum ions with very high current densities up to 100 mA/cm2 and accelerating voltages up to 2.1 kV. The maximum fluence of implantation reached 1.2 × 1021 ion/сm2. The results of the element composition of the modified layer were also investigated.
KW - Aluminum
KW - High intensity ion beam
KW - Intermetallic layers
KW - Metal ion implantation
KW - Nickel
UR - http://www.scopus.com/inward/record.url?scp=85045462254&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85045462254&partnerID=8YFLogxK
U2 - 10.1016/j.surfcoat.2018.02.111
DO - 10.1016/j.surfcoat.2018.02.111
M3 - Article
AN - SCOPUS:85045462254
VL - 355
SP - 123
EP - 128
JO - Surface and Coatings Technology
JF - Surface and Coatings Technology
SN - 0257-8972
ER -