Abstract
This study describes the first results of high intensity macroparticle-free aluminum ion beam formation and its application to low ion energy implantation. A DC vacuum arc was used to produce aluminum plasma flow. A repetitively pulsed macroparticle-free high intensity aluminum ion beam was formed using a plasma immersion ion extraction combined with ion beam focusing. A very high current ion beam with the current up to 0.475 A at bias pulse duration of 4 μs and the pulse repetition rate of 105 pulses per second was obtained. Nickel substrates were irradiated by aluminum ions with very high current densities up to 100 mA/cm2 and accelerating voltages up to 2.1 kV. The maximum fluence of implantation reached 1.2 × 1021 ion/сm2. The results of the element composition of the modified layer were also investigated.
Original language | English |
---|---|
Pages (from-to) | 123-128 |
Number of pages | 6 |
Journal | Surface and Coatings Technology |
Volume | 355 |
DOIs | |
Publication status | Published - 15 Dec 2018 |
Keywords
- Aluminum
- High intensity ion beam
- Intermetallic layers
- Metal ion implantation
- Nickel
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry