Low energy, high intensity metal ion implantation method for deep dopant containing layer formation

Abstract

This study describes the first results of high intensity macroparticle-free aluminum ion beam formation and its application to low ion energy implantation. A DC vacuum arc was used to produce aluminum plasma flow. A repetitively pulsed macroparticle-free high intensity aluminum ion beam was formed using a plasma immersion ion extraction combined with ion beam focusing. A very high current ion beam with the current up to 0.475 A at bias pulse duration of 4 μs and the pulse repetition rate of 10⁵ pulses per second was obtained. Nickel substrates were irradiated by aluminum ions with very high current densities up to 100 mA/cm² and accelerating voltages up to 2.1 kV. The maximum fluence of implantation reached 1.2 × 10²¹ ion/сm². The results of the element composition of the modified layer were also investigated.

Original language	English
Pages (from-to)	123-128
Number of pages	6
Journal	Surface and Coatings Technology
Volume	355
DOIs	https://doi.org/10.1016/j.surfcoat.2018.02.111
Publication status	Published - 15 Dec 2018

Keywords

Aluminum
High intensity ion beam
Intermetallic layers
Metal ion implantation
Nickel

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1016/j.surfcoat.2018.02.111

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Ryabchikov, A. I., Shevelev, A. E., Sivin, D. O., Ivanova, A. I., & Medvedev, V. N. (2018). Low energy, high intensity metal ion implantation method for deep dopant containing layer formation. Surface and Coatings Technology, 355, 123-128. https://doi.org/10.1016/j.surfcoat.2018.02.111

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title = "Low energy, high intensity metal ion implantation method for deep dopant containing layer formation",

abstract = "This study describes the first results of high intensity macroparticle-free aluminum ion beam formation and its application to low ion energy implantation. A DC vacuum arc was used to produce aluminum plasma flow. A repetitively pulsed macroparticle-free high intensity aluminum ion beam was formed using a plasma immersion ion extraction combined with ion beam focusing. A very high current ion beam with the current up to 0.475 A at bias pulse duration of 4 μs and the pulse repetition rate of 105 pulses per second was obtained. Nickel substrates were irradiated by aluminum ions with very high current densities up to 100 mA/cm2 and accelerating voltages up to 2.1 kV. The maximum fluence of implantation reached 1.2 × 1021 ion/сm2. The results of the element composition of the modified layer were also investigated.",

keywords = "Aluminum, High intensity ion beam, Intermetallic layers, Metal ion implantation, Nickel",

author = "Ryabchikov, {Alexander I.} and Shevelev, {Alexey E.} and Sivin, {Denis O.} and Ivanova, {Anna I.} and Medvedev, {Vladislav N.}",

year = "2018",

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doi = "10.1016/j.surfcoat.2018.02.111",

language = "English",

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journal = "Surface and Coatings Technology",

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publisher = "Elsevier",

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TY - JOUR

T1 - Low energy, high intensity metal ion implantation method for deep dopant containing layer formation

AU - Ryabchikov, Alexander I.

AU - Shevelev, Alexey E.

AU - Sivin, Denis O.

AU - Ivanova, Anna I.

AU - Medvedev, Vladislav N.

PY - 2018/12/15

Y1 - 2018/12/15

N2 - This study describes the first results of high intensity macroparticle-free aluminum ion beam formation and its application to low ion energy implantation. A DC vacuum arc was used to produce aluminum plasma flow. A repetitively pulsed macroparticle-free high intensity aluminum ion beam was formed using a plasma immersion ion extraction combined with ion beam focusing. A very high current ion beam with the current up to 0.475 A at bias pulse duration of 4 μs and the pulse repetition rate of 105 pulses per second was obtained. Nickel substrates were irradiated by aluminum ions with very high current densities up to 100 mA/cm2 and accelerating voltages up to 2.1 kV. The maximum fluence of implantation reached 1.2 × 1021 ion/сm2. The results of the element composition of the modified layer were also investigated.

AB - This study describes the first results of high intensity macroparticle-free aluminum ion beam formation and its application to low ion energy implantation. A DC vacuum arc was used to produce aluminum plasma flow. A repetitively pulsed macroparticle-free high intensity aluminum ion beam was formed using a plasma immersion ion extraction combined with ion beam focusing. A very high current ion beam with the current up to 0.475 A at bias pulse duration of 4 μs and the pulse repetition rate of 105 pulses per second was obtained. Nickel substrates were irradiated by aluminum ions with very high current densities up to 100 mA/cm2 and accelerating voltages up to 2.1 kV. The maximum fluence of implantation reached 1.2 × 1021 ion/сm2. The results of the element composition of the modified layer were also investigated.

KW - Aluminum

KW - High intensity ion beam

KW - Intermetallic layers

KW - Metal ion implantation

KW - Nickel

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