Low energy, high intensity metal ion implantation method for deep dopant containing layer formation

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4 Citations (Scopus)

Abstract

This study describes the first results of high intensity macroparticle-free aluminum ion beam formation and its application to low ion energy implantation. A DC vacuum arc was used to produce aluminum plasma flow. A repetitively pulsed macroparticle-free high intensity aluminum ion beam was formed using a plasma immersion ion extraction combined with ion beam focusing. A very high current ion beam with the current up to 0.475 A at bias pulse duration of 4 μs and the pulse repetition rate of 105 pulses per second was obtained. Nickel substrates were irradiated by aluminum ions with very high current densities up to 100 mA/cm2 and accelerating voltages up to 2.1 kV. The maximum fluence of implantation reached 1.2 × 1021 ion/сm2. The results of the element composition of the modified layer were also investigated.

Original languageEnglish
Pages (from-to)123-128
Number of pages6
JournalSurface and Coatings Technology
Volume355
DOIs
Publication statusPublished - 15 Dec 2018

Fingerprint

Aluminum
Ion implantation
Ion beams
Metal ions
ion implantation
metal ions
ion beams
Doping (additives)
Ions
aluminum
high current
Laser pulses
implantation
ion extraction
Plasma flow
Pulse repetition rate
ions
energy
pulse repetition rate
magnetohydrodynamic flow

Keywords

  • Aluminum
  • High intensity ion beam
  • Intermetallic layers
  • Metal ion implantation
  • Nickel

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

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title = "Low energy, high intensity metal ion implantation method for deep dopant containing layer formation",
abstract = "This study describes the first results of high intensity macroparticle-free aluminum ion beam formation and its application to low ion energy implantation. A DC vacuum arc was used to produce aluminum plasma flow. A repetitively pulsed macroparticle-free high intensity aluminum ion beam was formed using a plasma immersion ion extraction combined with ion beam focusing. A very high current ion beam with the current up to 0.475 A at bias pulse duration of 4 μs and the pulse repetition rate of 105 pulses per second was obtained. Nickel substrates were irradiated by aluminum ions with very high current densities up to 100 mA/cm2 and accelerating voltages up to 2.1 kV. The maximum fluence of implantation reached 1.2 × 1021 ion/сm2. The results of the element composition of the modified layer were also investigated.",
keywords = "Aluminum, High intensity ion beam, Intermetallic layers, Metal ion implantation, Nickel",
author = "Ryabchikov, {Alexander I.} and Shevelev, {Alexey E.} and Sivin, {Denis O.} and Ivanova, {Anna I.} and Medvedev, {Vladislav N.}",
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publisher = "Elsevier",

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T1 - Low energy, high intensity metal ion implantation method for deep dopant containing layer formation

AU - Ryabchikov, Alexander I.

AU - Shevelev, Alexey E.

AU - Sivin, Denis O.

AU - Ivanova, Anna I.

AU - Medvedev, Vladislav N.

PY - 2018/12/15

Y1 - 2018/12/15

N2 - This study describes the first results of high intensity macroparticle-free aluminum ion beam formation and its application to low ion energy implantation. A DC vacuum arc was used to produce aluminum plasma flow. A repetitively pulsed macroparticle-free high intensity aluminum ion beam was formed using a plasma immersion ion extraction combined with ion beam focusing. A very high current ion beam with the current up to 0.475 A at bias pulse duration of 4 μs and the pulse repetition rate of 105 pulses per second was obtained. Nickel substrates were irradiated by aluminum ions with very high current densities up to 100 mA/cm2 and accelerating voltages up to 2.1 kV. The maximum fluence of implantation reached 1.2 × 1021 ion/сm2. The results of the element composition of the modified layer were also investigated.

AB - This study describes the first results of high intensity macroparticle-free aluminum ion beam formation and its application to low ion energy implantation. A DC vacuum arc was used to produce aluminum plasma flow. A repetitively pulsed macroparticle-free high intensity aluminum ion beam was formed using a plasma immersion ion extraction combined with ion beam focusing. A very high current ion beam with the current up to 0.475 A at bias pulse duration of 4 μs and the pulse repetition rate of 105 pulses per second was obtained. Nickel substrates were irradiated by aluminum ions with very high current densities up to 100 mA/cm2 and accelerating voltages up to 2.1 kV. The maximum fluence of implantation reached 1.2 × 1021 ion/сm2. The results of the element composition of the modified layer were also investigated.

KW - Aluminum

KW - High intensity ion beam

KW - Intermetallic layers

KW - Metal ion implantation

KW - Nickel

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JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

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