Liquid-Phase Quasi-Epitaxial Growth of Highly Stable, Monolithic UiO-66-NH2 MOF thin Films on Solid Substrates

Tawheed Hashem, Elvia P. Valadez Sánchez, Peter G. Weidler, Hartmut Gliemann, Mohamed H. Alkordi, Christof Wöll

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)


High quality, monolithic UiO-66-NH2 thin films on diverse solid substrates have been prepared via a low temperature liquid phase epitaxy method. The achievement of continuous films with low defect densities and great stability against high temperatures and hot water is proven, clearly outperforming other reported types of MOF thin films.

Original languageEnglish
Pages (from-to)523
Number of pages1
Issue number5
Publication statusPublished - 1 May 2020
Externally publishedYes


  • liquid-phase separation
  • metal-organic frameworks
  • porous materials
  • thin films
  • UiO-66-NH supported thin films

ASJC Scopus subject areas

  • Chemistry(all)

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