Laser patterning of transparent polymers assisted by plasmon excitation

R. Elashnikov, A. Trelin, J. Otta, P. Fitl, D. Mares, V. Jerabek, V. Svorcik, O. Lyutakov

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Plasmon-assisted lithography of thin transparent polymer films, based on polymer mass-redistribution under plasmon excitation, is presented. The plasmon-supported structures were prepared by thermal annealing of thin Ag films sputtered on glass or glass/graphene substrates. Thin films of polymethylmethacrylate, polystyrene and polylactic acid were then spin-coated on the created plasmon-supported structures. Subsequent laser beam writing, at the wavelength corresponding to the position of plasmon absorption, leads to mass redistribution and patterning of the thin polymer films. The prepared structures were characterized using UV-Vis spectroscopy and confocal and AFM microscopy. The shape of the prepared structures was found to be strongly dependent on the substrate type. The mechanism leading to polymer patterning was examined and attributed to the plasmon-heating. The proposed method makes it possible to create different patterns in polymer films without the need for wet technological stages, powerful light sources or a change in the polymer optical properties.

Original languageEnglish
Pages (from-to)4860-4865
Number of pages6
JournalSoft Matter
Volume14
Issue number23
DOIs
Publication statusPublished - 1 Jan 2018
Externally publishedYes

Fingerprint

Polymer films
Polymers
Lasers
polymers
excitation
lasers
Glass
Thin films
Graphite
Polystyrenes
Polymethyl Methacrylate
Substrates
Ultraviolet spectroscopy
Lithography
Laser beams
Light sources
Microscopic examination
Optical properties
Annealing
Heating

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics

Cite this

Elashnikov, R., Trelin, A., Otta, J., Fitl, P., Mares, D., Jerabek, V., ... Lyutakov, O. (2018). Laser patterning of transparent polymers assisted by plasmon excitation. Soft Matter, 14(23), 4860-4865. https://doi.org/10.1039/c8sm00418h

Laser patterning of transparent polymers assisted by plasmon excitation. / Elashnikov, R.; Trelin, A.; Otta, J.; Fitl, P.; Mares, D.; Jerabek, V.; Svorcik, V.; Lyutakov, O.

In: Soft Matter, Vol. 14, No. 23, 01.01.2018, p. 4860-4865.

Research output: Contribution to journalArticle

Elashnikov, R, Trelin, A, Otta, J, Fitl, P, Mares, D, Jerabek, V, Svorcik, V & Lyutakov, O 2018, 'Laser patterning of transparent polymers assisted by plasmon excitation', Soft Matter, vol. 14, no. 23, pp. 4860-4865. https://doi.org/10.1039/c8sm00418h
Elashnikov R, Trelin A, Otta J, Fitl P, Mares D, Jerabek V et al. Laser patterning of transparent polymers assisted by plasmon excitation. Soft Matter. 2018 Jan 1;14(23):4860-4865. https://doi.org/10.1039/c8sm00418h
Elashnikov, R. ; Trelin, A. ; Otta, J. ; Fitl, P. ; Mares, D. ; Jerabek, V. ; Svorcik, V. ; Lyutakov, O. / Laser patterning of transparent polymers assisted by plasmon excitation. In: Soft Matter. 2018 ; Vol. 14, No. 23. pp. 4860-4865.
@article{06c69f431c1f4841b56ea7f5a74a0d25,
title = "Laser patterning of transparent polymers assisted by plasmon excitation",
abstract = "Plasmon-assisted lithography of thin transparent polymer films, based on polymer mass-redistribution under plasmon excitation, is presented. The plasmon-supported structures were prepared by thermal annealing of thin Ag films sputtered on glass or glass/graphene substrates. Thin films of polymethylmethacrylate, polystyrene and polylactic acid were then spin-coated on the created plasmon-supported structures. Subsequent laser beam writing, at the wavelength corresponding to the position of plasmon absorption, leads to mass redistribution and patterning of the thin polymer films. The prepared structures were characterized using UV-Vis spectroscopy and confocal and AFM microscopy. The shape of the prepared structures was found to be strongly dependent on the substrate type. The mechanism leading to polymer patterning was examined and attributed to the plasmon-heating. The proposed method makes it possible to create different patterns in polymer films without the need for wet technological stages, powerful light sources or a change in the polymer optical properties.",
author = "R. Elashnikov and A. Trelin and J. Otta and P. Fitl and D. Mares and V. Jerabek and V. Svorcik and O. Lyutakov",
year = "2018",
month = "1",
day = "1",
doi = "10.1039/c8sm00418h",
language = "English",
volume = "14",
pages = "4860--4865",
journal = "Soft Matter",
issn = "1744-683X",
publisher = "Royal Society of Chemistry",
number = "23",

}

TY - JOUR

T1 - Laser patterning of transparent polymers assisted by plasmon excitation

AU - Elashnikov, R.

AU - Trelin, A.

AU - Otta, J.

AU - Fitl, P.

AU - Mares, D.

AU - Jerabek, V.

AU - Svorcik, V.

AU - Lyutakov, O.

PY - 2018/1/1

Y1 - 2018/1/1

N2 - Plasmon-assisted lithography of thin transparent polymer films, based on polymer mass-redistribution under plasmon excitation, is presented. The plasmon-supported structures were prepared by thermal annealing of thin Ag films sputtered on glass or glass/graphene substrates. Thin films of polymethylmethacrylate, polystyrene and polylactic acid were then spin-coated on the created plasmon-supported structures. Subsequent laser beam writing, at the wavelength corresponding to the position of plasmon absorption, leads to mass redistribution and patterning of the thin polymer films. The prepared structures were characterized using UV-Vis spectroscopy and confocal and AFM microscopy. The shape of the prepared structures was found to be strongly dependent on the substrate type. The mechanism leading to polymer patterning was examined and attributed to the plasmon-heating. The proposed method makes it possible to create different patterns in polymer films without the need for wet technological stages, powerful light sources or a change in the polymer optical properties.

AB - Plasmon-assisted lithography of thin transparent polymer films, based on polymer mass-redistribution under plasmon excitation, is presented. The plasmon-supported structures were prepared by thermal annealing of thin Ag films sputtered on glass or glass/graphene substrates. Thin films of polymethylmethacrylate, polystyrene and polylactic acid were then spin-coated on the created plasmon-supported structures. Subsequent laser beam writing, at the wavelength corresponding to the position of plasmon absorption, leads to mass redistribution and patterning of the thin polymer films. The prepared structures were characterized using UV-Vis spectroscopy and confocal and AFM microscopy. The shape of the prepared structures was found to be strongly dependent on the substrate type. The mechanism leading to polymer patterning was examined and attributed to the plasmon-heating. The proposed method makes it possible to create different patterns in polymer films without the need for wet technological stages, powerful light sources or a change in the polymer optical properties.

UR - http://www.scopus.com/inward/record.url?scp=85048579248&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85048579248&partnerID=8YFLogxK

U2 - 10.1039/c8sm00418h

DO - 10.1039/c8sm00418h

M3 - Article

VL - 14

SP - 4860

EP - 4865

JO - Soft Matter

JF - Soft Matter

SN - 1744-683X

IS - 23

ER -