Joint influence of steered vacuum arc and negative repetitively pulsed bias on titanium macroparticles suppression

Research output: Contribution to journalArticle

Abstract

This paper presents the results of an experimental study of titanium macroparticle accumulation on a negatively biased substrate immersed in DC vacuum arc plasma generated by an evaporator with an axial magnetic field and a steered arc evaporator. Using a steered arc with a tangential magnetic field strength of 200 Gs reduced the generation of macroparticles 5-fold compared to a plasma source with an axial magnetic field. The application of repetitively pulsed negative bias significantly decreased macroparticle assembly on the substrate surface for both evaporator designs. After 20 min of ion-plasma treatment with negatively pulsed bias (−2 kV, 7 μs, 105 p.p.s.) and steered arc, the observed macroparticle surface density appeared to be 2 orders of magnitude smaller than after vacuum arc plasma deposition at the anode potential using an evaporator with an axial magnetic field. The possibility of high–frequency short–pulse plasma immersion ion implantation by implementing DC vacuum arc plasma is discussed.

Original languageEnglish
Pages (from-to)240-246
Number of pages7
JournalSurface and Coatings Technology
Volume355
DOIs
Publication statusPublished - 15 Dec 2018

Fingerprint

evaporators
Evaporators
Titanium
arcs
titanium
retarding
Vacuum
plasma jets
Magnetic fields
Plasmas
vacuum
magnetic fields
direct current
Plasma deposition
Plasma sources
Substrates
Ion implantation
submerging
ion implantation
field strength

Keywords

  • High-frequency short-pulse negative bias potential
  • Macroparticles
  • Steered arc
  • Vacuum-arc plasma

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

@article{1005ad09ed2442739f14b7d51315d1b2,
title = "Joint influence of steered vacuum arc and negative repetitively pulsed bias on titanium macroparticles suppression",
abstract = "This paper presents the results of an experimental study of titanium macroparticle accumulation on a negatively biased substrate immersed in DC vacuum arc plasma generated by an evaporator with an axial magnetic field and a steered arc evaporator. Using a steered arc with a tangential magnetic field strength of 200 Gs reduced the generation of macroparticles 5-fold compared to a plasma source with an axial magnetic field. The application of repetitively pulsed negative bias significantly decreased macroparticle assembly on the substrate surface for both evaporator designs. After 20 min of ion-plasma treatment with negatively pulsed bias (−2 kV, 7 μs, 105 p.p.s.) and steered arc, the observed macroparticle surface density appeared to be 2 orders of magnitude smaller than after vacuum arc plasma deposition at the anode potential using an evaporator with an axial magnetic field. The possibility of high–frequency short–pulse plasma immersion ion implantation by implementing DC vacuum arc plasma is discussed.",
keywords = "High-frequency short-pulse negative bias potential, Macroparticles, Steered arc, Vacuum-arc plasma",
author = "Ryabchikov, {Alexander I.} and Ananin, {Peter S.} and Shevelev, {Alexey E.} and Dektyarev, {Sergey V.} and Sivin, {Denis O.} and Ivanova, {Anna I.}",
year = "2018",
month = "12",
day = "15",
doi = "10.1016/j.surfcoat.2018.02.047",
language = "English",
volume = "355",
pages = "240--246",
journal = "Surface and Coatings Technology",
issn = "0257-8972",
publisher = "Elsevier",

}

TY - JOUR

T1 - Joint influence of steered vacuum arc and negative repetitively pulsed bias on titanium macroparticles suppression

AU - Ryabchikov, Alexander I.

AU - Ananin, Peter S.

AU - Shevelev, Alexey E.

AU - Dektyarev, Sergey V.

AU - Sivin, Denis O.

AU - Ivanova, Anna I.

PY - 2018/12/15

Y1 - 2018/12/15

N2 - This paper presents the results of an experimental study of titanium macroparticle accumulation on a negatively biased substrate immersed in DC vacuum arc plasma generated by an evaporator with an axial magnetic field and a steered arc evaporator. Using a steered arc with a tangential magnetic field strength of 200 Gs reduced the generation of macroparticles 5-fold compared to a plasma source with an axial magnetic field. The application of repetitively pulsed negative bias significantly decreased macroparticle assembly on the substrate surface for both evaporator designs. After 20 min of ion-plasma treatment with negatively pulsed bias (−2 kV, 7 μs, 105 p.p.s.) and steered arc, the observed macroparticle surface density appeared to be 2 orders of magnitude smaller than after vacuum arc plasma deposition at the anode potential using an evaporator with an axial magnetic field. The possibility of high–frequency short–pulse plasma immersion ion implantation by implementing DC vacuum arc plasma is discussed.

AB - This paper presents the results of an experimental study of titanium macroparticle accumulation on a negatively biased substrate immersed in DC vacuum arc plasma generated by an evaporator with an axial magnetic field and a steered arc evaporator. Using a steered arc with a tangential magnetic field strength of 200 Gs reduced the generation of macroparticles 5-fold compared to a plasma source with an axial magnetic field. The application of repetitively pulsed negative bias significantly decreased macroparticle assembly on the substrate surface for both evaporator designs. After 20 min of ion-plasma treatment with negatively pulsed bias (−2 kV, 7 μs, 105 p.p.s.) and steered arc, the observed macroparticle surface density appeared to be 2 orders of magnitude smaller than after vacuum arc plasma deposition at the anode potential using an evaporator with an axial magnetic field. The possibility of high–frequency short–pulse plasma immersion ion implantation by implementing DC vacuum arc plasma is discussed.

KW - High-frequency short-pulse negative bias potential

KW - Macroparticles

KW - Steered arc

KW - Vacuum-arc plasma

UR - http://www.scopus.com/inward/record.url?scp=85042323058&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85042323058&partnerID=8YFLogxK

U2 - 10.1016/j.surfcoat.2018.02.047

DO - 10.1016/j.surfcoat.2018.02.047

M3 - Article

VL - 355

SP - 240

EP - 246

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

ER -