Irradiation of sputtered Al-Si-N coatings by pulsed 200 keV C+ ion beam

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Abstract

This paper reports on the effect of the irradiation of Al-Si-N coatings by an intense pulsed ion beam. The Al-Si-N coating was deposited on a steel substrate by a reactive magnetron sputtering. The Al-Si-N coating with a high silicon content (30 at.%) was irradiated by a high-intense pulsed C+ ion beam. It was shown that metastable growth defects (GDs) created in the Al-Si-N coating during deposition can be healed up by its post-deposition irradiation using several pulses (1 and 10) of C+ ions with energy Ei = 200 keV, ion current density is = 7 A/cm2, pulse duration tp = 110 ns and radiation dose 2 MGy. The reduction in deposition-induced GD density results in an increased transmittance of the Al-Si-N coatings.

Original languageEnglish
Pages (from-to)65-67
Number of pages3
JournalVacuum
Volume158
DOIs
Publication statusPublished - 1 Dec 2018

Fingerprint

Ion beams
ion beams
Irradiation
coatings
Coatings
irradiation
Ions
Defect density
Steel
Reactive sputtering
defects
Silicon
Magnetron sputtering
ion currents
Dosimetry
transmittance
magnetron sputtering
pulse duration
Current density
steels

Keywords

  • Al-Si-N coating
  • Ion beam
  • Irradiation
  • Light transmittance
  • Magnetron sputtering

ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

Cite this

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title = "Irradiation of sputtered Al-Si-N coatings by pulsed 200 keV C+ ion beam",
abstract = "This paper reports on the effect of the irradiation of Al-Si-N coatings by an intense pulsed ion beam. The Al-Si-N coating was deposited on a steel substrate by a reactive magnetron sputtering. The Al-Si-N coating with a high silicon content (30 at.{\%}) was irradiated by a high-intense pulsed C+ ion beam. It was shown that metastable growth defects (GDs) created in the Al-Si-N coating during deposition can be healed up by its post-deposition irradiation using several pulses (1 and 10) of C+ ions with energy Ei = 200 keV, ion current density is = 7 A/cm2, pulse duration tp = 110 ns and radiation dose 2 MGy. The reduction in deposition-induced GD density results in an increased transmittance of the Al-Si-N coatings.",
keywords = "Al-Si-N coating, Ion beam, Irradiation, Light transmittance, Magnetron sputtering",
author = "G. Remnev and V. Tarbokov and S. Pavlov and F. Konusov and S. Zenkin and J. Musil",
year = "2018",
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journal = "Vacuum",
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TY - JOUR

T1 - Irradiation of sputtered Al-Si-N coatings by pulsed 200 keV C+ ion beam

AU - Remnev, G.

AU - Tarbokov, V.

AU - Pavlov, S.

AU - Konusov, F.

AU - Zenkin, S.

AU - Musil, J.

PY - 2018/12/1

Y1 - 2018/12/1

N2 - This paper reports on the effect of the irradiation of Al-Si-N coatings by an intense pulsed ion beam. The Al-Si-N coating was deposited on a steel substrate by a reactive magnetron sputtering. The Al-Si-N coating with a high silicon content (30 at.%) was irradiated by a high-intense pulsed C+ ion beam. It was shown that metastable growth defects (GDs) created in the Al-Si-N coating during deposition can be healed up by its post-deposition irradiation using several pulses (1 and 10) of C+ ions with energy Ei = 200 keV, ion current density is = 7 A/cm2, pulse duration tp = 110 ns and radiation dose 2 MGy. The reduction in deposition-induced GD density results in an increased transmittance of the Al-Si-N coatings.

AB - This paper reports on the effect of the irradiation of Al-Si-N coatings by an intense pulsed ion beam. The Al-Si-N coating was deposited on a steel substrate by a reactive magnetron sputtering. The Al-Si-N coating with a high silicon content (30 at.%) was irradiated by a high-intense pulsed C+ ion beam. It was shown that metastable growth defects (GDs) created in the Al-Si-N coating during deposition can be healed up by its post-deposition irradiation using several pulses (1 and 10) of C+ ions with energy Ei = 200 keV, ion current density is = 7 A/cm2, pulse duration tp = 110 ns and radiation dose 2 MGy. The reduction in deposition-induced GD density results in an increased transmittance of the Al-Si-N coatings.

KW - Al-Si-N coating

KW - Ion beam

KW - Irradiation

KW - Light transmittance

KW - Magnetron sputtering

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U2 - 10.1016/j.vacuum.2018.09.022

DO - 10.1016/j.vacuum.2018.09.022

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VL - 158

SP - 65

EP - 67

JO - Vacuum

JF - Vacuum

SN - 0042-207X

ER -