The results are presented of an electron-microscopic investigation into the ″long-range interaction″ phenomenon, caused by ion implantation, by the example of α-Fe. Ions of C, Fe, W, Hf, and Ar were implanted in the continuous and the frequency-pulsing modes. The ion energy varied within the range of 40-110 kev, the radiation dose being 1×1016- 1×1018 ions×cm-1. The ion implantation formed a developed dislocation structure in a surface layer 20-100 μm thick, while the run of ions in α- Fe didn't exceed 50 nm. The causes of dislocation structure formation during ion irradiation are analyzed.
|Number of pages||8|
|Journal||Izvestia Akademii nauk SSSR. Metally|
|Publication status||Published - May 1993|
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