Abstract
High-power pulsed dc magnetron discharges for ionized high-rate sputtering of copper films were investigated. The repetition frequency was 1 kHz at a fixed 20% duty cycle and argon pressures of 0.5 Pa and 5 Pa. Time evolutions of the discharge characteristics were measured at a target power density in a pulse up to 950 W/cm2. Time-averaged mass spectroscopy was performed at substrate positions. It was shown that copper ions are strongly dominant (up to 92%) in total ion fluxes onto the substrate. Their energy distributions with a broadened low-energy part at a lower pressure are extended to higher energies (up to 45 eV relative to ground potential for the target-to-substrate distance of 100 mm).
| Original language | English |
|---|---|
| Article number | 45002 |
| Journal | EPL |
| Volume | 77 |
| Issue number | 4 |
| DOIs | |
| Publication status | Published - 1 Feb 2007 |
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ASJC Scopus subject areas
- Physics and Astronomy(all)
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Ion flux characteristics in high-power pulsed magnetron sputtering discharges. / Vlček, J.; Kudláček, P.; Burcalová, K.; Musil, J.
In: EPL, Vol. 77, No. 4, 45002, 01.02.2007.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Ion flux characteristics in high-power pulsed magnetron sputtering discharges
AU - Vlček, J.
AU - Kudláček, P.
AU - Burcalová, K.
AU - Musil, J.
PY - 2007/2/1
Y1 - 2007/2/1
N2 - High-power pulsed dc magnetron discharges for ionized high-rate sputtering of copper films were investigated. The repetition frequency was 1 kHz at a fixed 20% duty cycle and argon pressures of 0.5 Pa and 5 Pa. Time evolutions of the discharge characteristics were measured at a target power density in a pulse up to 950 W/cm2. Time-averaged mass spectroscopy was performed at substrate positions. It was shown that copper ions are strongly dominant (up to 92%) in total ion fluxes onto the substrate. Their energy distributions with a broadened low-energy part at a lower pressure are extended to higher energies (up to 45 eV relative to ground potential for the target-to-substrate distance of 100 mm).
AB - High-power pulsed dc magnetron discharges for ionized high-rate sputtering of copper films were investigated. The repetition frequency was 1 kHz at a fixed 20% duty cycle and argon pressures of 0.5 Pa and 5 Pa. Time evolutions of the discharge characteristics were measured at a target power density in a pulse up to 950 W/cm2. Time-averaged mass spectroscopy was performed at substrate positions. It was shown that copper ions are strongly dominant (up to 92%) in total ion fluxes onto the substrate. Their energy distributions with a broadened low-energy part at a lower pressure are extended to higher energies (up to 45 eV relative to ground potential for the target-to-substrate distance of 100 mm).
UR - http://www.scopus.com/inward/record.url?scp=77957745027&partnerID=8YFLogxK
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U2 - 10.1209/0295-5075/77/45002
DO - 10.1209/0295-5075/77/45002
M3 - Article
VL - 77
JO - Europhysics Letters
JF - Europhysics Letters
SN - 0295-5075
IS - 4
M1 - 45002
ER -