Ion beam and electrical conductivity analysis of nanocrystalline α-BN and α-Al2O3 ceramics implanted with Ti+n ions and annealed

Abstract

RBS, ERD, resonant elastic Backscattering Spectrometry of ¹H⁺ and ⁴He⁺ ions, electrical resistivity analysis were used to study properties of near-surface layers of modified nanocrystalline α-BN and α-Al₂O₃ ceramics. High-fluence and high-flux pulse implantation of Ti⁺ⁿ ions and post-implantation thermal annealing in vacuum were utilised for modification of the ceramics. As a result of implantation and subsequent annealing, thermally stable (up to 1600 K) low electrical conductive surface coatings were formed. Observed changes in elements depth profiles and in surface electrical resistivity of these coatings as a result of the post-implantation thermal treatment are discussed in connection with temperature evolution of the damage microstructure.

Original language	English
Pages (from-to)	271-277
Number of pages	7
Journal	Materials Science Forum
Volume	248-249
Publication status	Published - 1997

Keywords

Ceramics
Electrical Conductivity Analysis
Ion Beam Analysis
Pulsed Ion Implantation
Thermal Annealing

ASJC Scopus subject areas

Materials Science(all)

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Duvanov, S. M., Kabyshev, A. V., & Kobzev, A. P. (1997). Ion beam and electrical conductivity analysis of nanocrystalline α-BN and α-Al₂O₃ ceramics implanted with Ti⁺ⁿ ions and annealed. Materials Science Forum, 248-249, 271-277.

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abstract = "RBS, ERD, resonant elastic Backscattering Spectrometry of 1H+ and 4He+ ions, electrical resistivity analysis were used to study properties of near-surface layers of modified nanocrystalline α-BN and α-Al2O3 ceramics. High-fluence and high-flux pulse implantation of Ti+n ions and post-implantation thermal annealing in vacuum were utilised for modification of the ceramics. As a result of implantation and subsequent annealing, thermally stable (up to 1600 K) low electrical conductive surface coatings were formed. Observed changes in elements depth profiles and in surface electrical resistivity of these coatings as a result of the post-implantation thermal treatment are discussed in connection with temperature evolution of the damage microstructure.",

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author = "Duvanov, {S. M.} and Kabyshev, {A. V.} and Kobzev, {A. P.}",

year = "1997",

language = "English",

volume = "248-249",

pages = "271--277",

journal = "Materials Science Forum",

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T1 - Ion beam and electrical conductivity analysis of nanocrystalline α-BN and α-Al2O3 ceramics implanted with Ti+n ions and annealed

AU - Duvanov, S. M.

AU - Kabyshev, A. V.

AU - Kobzev, A. P.

PY - 1997

Y1 - 1997

N2 - RBS, ERD, resonant elastic Backscattering Spectrometry of 1H+ and 4He+ ions, electrical resistivity analysis were used to study properties of near-surface layers of modified nanocrystalline α-BN and α-Al2O3 ceramics. High-fluence and high-flux pulse implantation of Ti+n ions and post-implantation thermal annealing in vacuum were utilised for modification of the ceramics. As a result of implantation and subsequent annealing, thermally stable (up to 1600 K) low electrical conductive surface coatings were formed. Observed changes in elements depth profiles and in surface electrical resistivity of these coatings as a result of the post-implantation thermal treatment are discussed in connection with temperature evolution of the damage microstructure.

AB - RBS, ERD, resonant elastic Backscattering Spectrometry of 1H+ and 4He+ ions, electrical resistivity analysis were used to study properties of near-surface layers of modified nanocrystalline α-BN and α-Al2O3 ceramics. High-fluence and high-flux pulse implantation of Ti+n ions and post-implantation thermal annealing in vacuum were utilised for modification of the ceramics. As a result of implantation and subsequent annealing, thermally stable (up to 1600 K) low electrical conductive surface coatings were formed. Observed changes in elements depth profiles and in surface electrical resistivity of these coatings as a result of the post-implantation thermal treatment are discussed in connection with temperature evolution of the damage microstructure.

KW - Ceramics

KW - Electrical Conductivity Analysis

KW - Ion Beam Analysis

KW - Pulsed Ion Implantation

KW - Thermal Annealing

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