Ion beam and electrical conductivity analysis of nanocrystalline α-BN and α-Al2O3 ceramics implanted with Ti+n ions and annealed

S. M. Duvanov, A. V. Kabyshev, A. P. Kobzev

    Research output: Contribution to journalArticle

    2 Citations (Scopus)

    Abstract

    RBS, ERD, resonant elastic Backscattering Spectrometry of 1H+ and 4He+ ions, electrical resistivity analysis were used to study properties of near-surface layers of modified nanocrystalline α-BN and α-Al2O3 ceramics. High-fluence and high-flux pulse implantation of Ti+n ions and post-implantation thermal annealing in vacuum were utilised for modification of the ceramics. As a result of implantation and subsequent annealing, thermally stable (up to 1600 K) low electrical conductive surface coatings were formed. Observed changes in elements depth profiles and in surface electrical resistivity of these coatings as a result of the post-implantation thermal treatment are discussed in connection with temperature evolution of the damage microstructure.

    Original languageEnglish
    Pages (from-to)271-277
    Number of pages7
    JournalMaterials Science Forum
    Volume248-249
    Publication statusPublished - 1997

    Keywords

    • Ceramics
    • Electrical Conductivity Analysis
    • Ion Beam Analysis
    • Pulsed Ion Implantation
    • Thermal Annealing

    ASJC Scopus subject areas

    • Materials Science(all)

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