Abstract
RBS, ERD, resonant elastic Backscattering Spectrometry of 1H+ and 4He+ ions, electrical resistivity analysis were used to study properties of near-surface layers of modified nanocrystalline α-BN and α-Al2O3 ceramics. High-fluence and high-flux pulse implantation of Ti+n ions and post-implantation thermal annealing in vacuum were utilised for modification of the ceramics. As a result of implantation and subsequent annealing, thermally stable (up to 1600 K) low electrical conductive surface coatings were formed. Observed changes in elements depth profiles and in surface electrical resistivity of these coatings as a result of the post-implantation thermal treatment are discussed in connection with temperature evolution of the damage microstructure.
Original language | English |
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Pages (from-to) | 271-277 |
Number of pages | 7 |
Journal | Materials Science Forum |
Volume | 248-249 |
Publication status | Published - 1997 |
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Keywords
- Ceramics
- Electrical Conductivity Analysis
- Ion Beam Analysis
- Pulsed Ion Implantation
- Thermal Annealing
ASJC Scopus subject areas
- Materials Science(all)
Cite this
Ion beam and electrical conductivity analysis of nanocrystalline α-BN and α-Al2O3 ceramics implanted with Ti+n ions and annealed. / Duvanov, S. M.; Kabyshev, A. V.; Kobzev, A. P.
In: Materials Science Forum, Vol. 248-249, 1997, p. 271-277.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Ion beam and electrical conductivity analysis of nanocrystalline α-BN and α-Al2O3 ceramics implanted with Ti+n ions and annealed
AU - Duvanov, S. M.
AU - Kabyshev, A. V.
AU - Kobzev, A. P.
PY - 1997
Y1 - 1997
N2 - RBS, ERD, resonant elastic Backscattering Spectrometry of 1H+ and 4He+ ions, electrical resistivity analysis were used to study properties of near-surface layers of modified nanocrystalline α-BN and α-Al2O3 ceramics. High-fluence and high-flux pulse implantation of Ti+n ions and post-implantation thermal annealing in vacuum were utilised for modification of the ceramics. As a result of implantation and subsequent annealing, thermally stable (up to 1600 K) low electrical conductive surface coatings were formed. Observed changes in elements depth profiles and in surface electrical resistivity of these coatings as a result of the post-implantation thermal treatment are discussed in connection with temperature evolution of the damage microstructure.
AB - RBS, ERD, resonant elastic Backscattering Spectrometry of 1H+ and 4He+ ions, electrical resistivity analysis were used to study properties of near-surface layers of modified nanocrystalline α-BN and α-Al2O3 ceramics. High-fluence and high-flux pulse implantation of Ti+n ions and post-implantation thermal annealing in vacuum were utilised for modification of the ceramics. As a result of implantation and subsequent annealing, thermally stable (up to 1600 K) low electrical conductive surface coatings were formed. Observed changes in elements depth profiles and in surface electrical resistivity of these coatings as a result of the post-implantation thermal treatment are discussed in connection with temperature evolution of the damage microstructure.
KW - Ceramics
KW - Electrical Conductivity Analysis
KW - Ion Beam Analysis
KW - Pulsed Ion Implantation
KW - Thermal Annealing
UR - http://www.scopus.com/inward/record.url?scp=0030721884&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0030721884&partnerID=8YFLogxK
M3 - Article
AN - SCOPUS:0030721884
VL - 248-249
SP - 271
EP - 277
JO - Materials Science Forum
JF - Materials Science Forum
SN - 0255-5476
ER -