Investigation of tungsten dc vacuum arc characteristics. Technological application

I. B. Stepanov, I. A. Ryabchikov, S. V. Dektyarev

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

The paper presents the results of investigation of legitimacies of generation of W vacuum arc plasma in dc mode and their application for deposition of coatings with high adhesion strength. The developed construction of the vacuum arc evaporator (VAE) ensures dc mode of W plasma generation in the current range of 350 A-750 A at arc voltage drop of more than 40 V. It is shown that at discharge current of 750 A W coating deposition rate can achieve 80 μm/h, which offers attractive perspectives for a number of technological applications of W plasma. We also investigated some legitimacies of changes in element composition, adhesion strength, hardness, morphology and structure of W coatings formed from plasma of a dc vacuum arc discharge (VAD) depending on regimes of coating deposition. It is shown that use of Ti plasma for creating a thick transition and damping layer under the regime of plasma immersion ion implantation and coating deposition under intensive ion mixing allows to increase adhesion strength of W coatings by several times.

Original languageEnglish
Pages (from-to)6526-6529
Number of pages4
JournalSurface and Coatings Technology
Volume201
Issue number15
DOIs
Publication statusPublished - 23 Apr 2007

Fingerprint

Tungsten
tungsten
arcs
Vacuum
Plasmas
coatings
Coatings
vacuum
Bond strength (materials)
adhesion
plasma generators
transition layers
evaporators
arc discharges
Evaporators
Deposition rates
Ion implantation
plasma jets
submerging
ion implantation

Keywords

  • Coating
  • Plasma filter
  • Vacuum arc

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Investigation of tungsten dc vacuum arc characteristics. Technological application. / Stepanov, I. B.; Ryabchikov, I. A.; Dektyarev, S. V.

In: Surface and Coatings Technology, Vol. 201, No. 15, 23.04.2007, p. 6526-6529.

Research output: Contribution to journalArticle

@article{9fb445f91a564c009cb3da54253a7a67,
title = "Investigation of tungsten dc vacuum arc characteristics. Technological application",
abstract = "The paper presents the results of investigation of legitimacies of generation of W vacuum arc plasma in dc mode and their application for deposition of coatings with high adhesion strength. The developed construction of the vacuum arc evaporator (VAE) ensures dc mode of W plasma generation in the current range of 350 A-750 A at arc voltage drop of more than 40 V. It is shown that at discharge current of 750 A W coating deposition rate can achieve 80 μm/h, which offers attractive perspectives for a number of technological applications of W plasma. We also investigated some legitimacies of changes in element composition, adhesion strength, hardness, morphology and structure of W coatings formed from plasma of a dc vacuum arc discharge (VAD) depending on regimes of coating deposition. It is shown that use of Ti plasma for creating a thick transition and damping layer under the regime of plasma immersion ion implantation and coating deposition under intensive ion mixing allows to increase adhesion strength of W coatings by several times.",
keywords = "Coating, Plasma filter, Vacuum arc",
author = "Stepanov, {I. B.} and Ryabchikov, {I. A.} and Dektyarev, {S. V.}",
year = "2007",
month = "4",
day = "23",
doi = "10.1016/j.surfcoat.2006.09.013",
language = "English",
volume = "201",
pages = "6526--6529",
journal = "Surface and Coatings Technology",
issn = "0257-8972",
publisher = "Elsevier",
number = "15",

}

TY - JOUR

T1 - Investigation of tungsten dc vacuum arc characteristics. Technological application

AU - Stepanov, I. B.

AU - Ryabchikov, I. A.

AU - Dektyarev, S. V.

PY - 2007/4/23

Y1 - 2007/4/23

N2 - The paper presents the results of investigation of legitimacies of generation of W vacuum arc plasma in dc mode and their application for deposition of coatings with high adhesion strength. The developed construction of the vacuum arc evaporator (VAE) ensures dc mode of W plasma generation in the current range of 350 A-750 A at arc voltage drop of more than 40 V. It is shown that at discharge current of 750 A W coating deposition rate can achieve 80 μm/h, which offers attractive perspectives for a number of technological applications of W plasma. We also investigated some legitimacies of changes in element composition, adhesion strength, hardness, morphology and structure of W coatings formed from plasma of a dc vacuum arc discharge (VAD) depending on regimes of coating deposition. It is shown that use of Ti plasma for creating a thick transition and damping layer under the regime of plasma immersion ion implantation and coating deposition under intensive ion mixing allows to increase adhesion strength of W coatings by several times.

AB - The paper presents the results of investigation of legitimacies of generation of W vacuum arc plasma in dc mode and their application for deposition of coatings with high adhesion strength. The developed construction of the vacuum arc evaporator (VAE) ensures dc mode of W plasma generation in the current range of 350 A-750 A at arc voltage drop of more than 40 V. It is shown that at discharge current of 750 A W coating deposition rate can achieve 80 μm/h, which offers attractive perspectives for a number of technological applications of W plasma. We also investigated some legitimacies of changes in element composition, adhesion strength, hardness, morphology and structure of W coatings formed from plasma of a dc vacuum arc discharge (VAD) depending on regimes of coating deposition. It is shown that use of Ti plasma for creating a thick transition and damping layer under the regime of plasma immersion ion implantation and coating deposition under intensive ion mixing allows to increase adhesion strength of W coatings by several times.

KW - Coating

KW - Plasma filter

KW - Vacuum arc

UR - http://www.scopus.com/inward/record.url?scp=33847341662&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33847341662&partnerID=8YFLogxK

U2 - 10.1016/j.surfcoat.2006.09.013

DO - 10.1016/j.surfcoat.2006.09.013

M3 - Article

VL - 201

SP - 6526

EP - 6529

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

IS - 15

ER -