Investigation of the possibility of unfiltered aluminium vacuum arc plasma application for high-frequency short-pulse plasma immersion ion implantation

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

This paper is devoted to the study of the possibilities of unfiltered aluminium vacuum arc plasma application for intermetallic layers formation using the high-frequency short-pulse plasma immersion ion implantation method. It is shown experimentally that the number density of aluminium macroparticles (MPs) on the substrate surface is decreased dramatically by 3 orders of magnitude when the ion-plasma substrate treatment time is increased from 30 s to 3 min at the bias potential -2 kV. It was shown that at high intensity low energy plasma immersion implantation of Al ions in Ti and Ni substrates a deep layer (several μm) of aluminium dopants with concentration in the range of (12-35) at% can be formed.

Original languageEnglish
Pages (from-to)120-125
Number of pages6
JournalApplied Surface Science
Volume310
DOIs
Publication statusPublished - 15 Aug 2014

Keywords

  • Aluminium plasma
  • Intermetallic compounds
  • Macroparticles
  • Negative high-frequency short-pulsed bias
  • Vacuum-arc

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

Fingerprint Dive into the research topics of 'Investigation of the possibility of unfiltered aluminium vacuum arc plasma application for high-frequency short-pulse plasma immersion ion implantation'. Together they form a unique fingerprint.

  • Cite this