Investigation of the possibility of unfiltered aluminium vacuum arc plasma application for high-frequency short-pulse plasma immersion ion implantation

Abstract

This paper is devoted to the study of the possibilities of unfiltered aluminium vacuum arc plasma application for intermetallic layers formation using the high-frequency short-pulse plasma immersion ion implantation method. It is shown experimentally that the number density of aluminium macroparticles (MPs) on the substrate surface is decreased dramatically by 3 orders of magnitude when the ion-plasma substrate treatment time is increased from 30 s to 3 min at the bias potential -2 kV. It was shown that at high intensity low energy plasma immersion implantation of Al ions in Ti and Ni substrates a deep layer (several μm) of aluminium dopants with concentration in the range of (12-35) at% can be formed.

Original language	English
Pages (from-to)	120-125
Number of pages	6
Journal	Applied Surface Science
Volume	310
DOIs	https://doi.org/10.1016/j.apsusc.2014.03.129
Publication status	Published - 15 Aug 2014

Keywords

Aluminium plasma
Intermetallic compounds
Macroparticles
Negative high-frequency short-pulsed bias
Vacuum-arc

ASJC Scopus subject areas

Surfaces, Coatings and Films

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10.1016/j.apsusc.2014.03.129

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Investigation of the possibility of unfiltered aluminium vacuum arc plasma application for high-frequency short-pulse plasma immersion ion implantation. / Sivin, Denis Olegovich ; Ryabchikov, A. I.; Bumagina, A. I.; Bolbasov, E. N.; Daneikina, N. V.

In: Applied Surface Science, Vol. 310, 15.08.2014, p. 120-125.

Research output: Contribution to journal › Article › peer-review

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abstract = "This paper is devoted to the study of the possibilities of unfiltered aluminium vacuum arc plasma application for intermetallic layers formation using the high-frequency short-pulse plasma immersion ion implantation method. It is shown experimentally that the number density of aluminium macroparticles (MPs) on the substrate surface is decreased dramatically by 3 orders of magnitude when the ion-plasma substrate treatment time is increased from 30 s to 3 min at the bias potential -2 kV. It was shown that at high intensity low energy plasma immersion implantation of Al ions in Ti and Ni substrates a deep layer (several μm) of aluminium dopants with concentration in the range of (12-35) at% can be formed.",

keywords = "Aluminium plasma, Intermetallic compounds, Macroparticles, Negative high-frequency short-pulsed bias, Vacuum-arc",

author = "Sivin, {Denis Olegovich} and Ryabchikov, {A. I.} and Bumagina, {A. I.} and Bolbasov, {E. N.} and Daneikina, {N. V.}",

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AU - Sivin, Denis Olegovich

AU - Ryabchikov, A. I.

AU - Bumagina, A. I.

AU - Bolbasov, E. N.

AU - Daneikina, N. V.

PY - 2014/8/15

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