Abstract
This paper is devoted to the study of the possibilities of unfiltered aluminium vacuum arc plasma application for intermetallic layers formation using the high-frequency short-pulse plasma immersion ion implantation method. It is shown experimentally that the number density of aluminium macroparticles (MPs) on the substrate surface is decreased dramatically by 3 orders of magnitude when the ion-plasma substrate treatment time is increased from 30 s to 3 min at the bias potential -2 kV. It was shown that at high intensity low energy plasma immersion implantation of Al ions in Ti and Ni substrates a deep layer (several μm) of aluminium dopants with concentration in the range of (12-35) at% can be formed.
| Original language | English |
|---|---|
| Pages (from-to) | 120-125 |
| Number of pages | 6 |
| Journal | Applied Surface Science |
| Volume | 310 |
| DOIs | |
| Publication status | Published - 15 Aug 2014 |
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Keywords
- Aluminium plasma
- Intermetallic compounds
- Macroparticles
- Negative high-frequency short-pulsed bias
- Vacuum-arc
ASJC Scopus subject areas
- Surfaces, Coatings and Films
Cite this
Investigation of the possibility of unfiltered aluminium vacuum arc plasma application for high-frequency short-pulse plasma immersion ion implantation. / Sivin, Denis Olegovich; Ryabchikov, A. I.; Bumagina, A. I.; Bolbasov, E. N.; Daneikina, N. V.
In: Applied Surface Science, Vol. 310, 15.08.2014, p. 120-125.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Investigation of the possibility of unfiltered aluminium vacuum arc plasma application for high-frequency short-pulse plasma immersion ion implantation
AU - Sivin, Denis Olegovich
AU - Ryabchikov, A. I.
AU - Bumagina, A. I.
AU - Bolbasov, E. N.
AU - Daneikina, N. V.
PY - 2014/8/15
Y1 - 2014/8/15
N2 - This paper is devoted to the study of the possibilities of unfiltered aluminium vacuum arc plasma application for intermetallic layers formation using the high-frequency short-pulse plasma immersion ion implantation method. It is shown experimentally that the number density of aluminium macroparticles (MPs) on the substrate surface is decreased dramatically by 3 orders of magnitude when the ion-plasma substrate treatment time is increased from 30 s to 3 min at the bias potential -2 kV. It was shown that at high intensity low energy plasma immersion implantation of Al ions in Ti and Ni substrates a deep layer (several μm) of aluminium dopants with concentration in the range of (12-35) at% can be formed.
AB - This paper is devoted to the study of the possibilities of unfiltered aluminium vacuum arc plasma application for intermetallic layers formation using the high-frequency short-pulse plasma immersion ion implantation method. It is shown experimentally that the number density of aluminium macroparticles (MPs) on the substrate surface is decreased dramatically by 3 orders of magnitude when the ion-plasma substrate treatment time is increased from 30 s to 3 min at the bias potential -2 kV. It was shown that at high intensity low energy plasma immersion implantation of Al ions in Ti and Ni substrates a deep layer (several μm) of aluminium dopants with concentration in the range of (12-35) at% can be formed.
KW - Aluminium plasma
KW - Intermetallic compounds
KW - Macroparticles
KW - Negative high-frequency short-pulsed bias
KW - Vacuum-arc
UR - http://www.scopus.com/inward/record.url?scp=84903268358&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84903268358&partnerID=8YFLogxK
U2 - 10.1016/j.apsusc.2014.03.129
DO - 10.1016/j.apsusc.2014.03.129
M3 - Article
VL - 310
SP - 120
EP - 125
JO - Applied Surface Science
JF - Applied Surface Science
SN - 0169-4332
ER -