Abstract
This paper is devoted to the study of the possibilities of unfiltered aluminium vacuum arc plasma application for intermetallic layers formation using the high-frequency short-pulse plasma immersion ion implantation method. It is shown experimentally that the number density of aluminium macroparticles (MPs) on the substrate surface is decreased dramatically by 3 orders of magnitude when the ion-plasma substrate treatment time is increased from 30 s to 3 min at the bias potential -2 kV. It was shown that at high intensity low energy plasma immersion implantation of Al ions in Ti and Ni substrates a deep layer (several μm) of aluminium dopants with concentration in the range of (12-35) at% can be formed.
| Original language | English |
|---|---|
| Pages (from-to) | 120-125 |
| Number of pages | 6 |
| Journal | Applied Surface Science |
| Volume | 310 |
| DOIs | |
| Publication status | Published - 15 Aug 2014 |
Keywords
- Aluminium plasma
- Intermetallic compounds
- Macroparticles
- Negative high-frequency short-pulsed bias
- Vacuum-arc
ASJC Scopus subject areas
- Surfaces, Coatings and Films
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Cite this
Sivin, D. O., Ryabchikov, A. I., Bumagina, A. I., Bolbasov, E. N., & Daneikina, N. V. (2014). Investigation of the possibility of unfiltered aluminium vacuum arc plasma application for high-frequency short-pulse plasma immersion ion implantation. Applied Surface Science, 310, 120-125. https://doi.org/10.1016/j.apsusc.2014.03.129