Investigation of the possibility of unfiltered aluminium vacuum arc plasma application for high-frequency short-pulse plasma immersion ion implantation

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3 Citations (Scopus)

Abstract

This paper is devoted to the study of the possibilities of unfiltered aluminium vacuum arc plasma application for intermetallic layers formation using the high-frequency short-pulse plasma immersion ion implantation method. It is shown experimentally that the number density of aluminium macroparticles (MPs) on the substrate surface is decreased dramatically by 3 orders of magnitude when the ion-plasma substrate treatment time is increased from 30 s to 3 min at the bias potential -2 kV. It was shown that at high intensity low energy plasma immersion implantation of Al ions in Ti and Ni substrates a deep layer (several μm) of aluminium dopants with concentration in the range of (12-35) at% can be formed.

Original languageEnglish
Pages (from-to)120-125
Number of pages6
JournalApplied Surface Science
Volume310
DOIs
Publication statusPublished - 15 Aug 2014

Fingerprint

Plasma applications
Aluminum
Ion implantation
Vacuum
Plasmas
Substrates
Ions
Intermetallics
Doping (additives)

Keywords

  • Aluminium plasma
  • Intermetallic compounds
  • Macroparticles
  • Negative high-frequency short-pulsed bias
  • Vacuum-arc

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

Cite this

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abstract = "This paper is devoted to the study of the possibilities of unfiltered aluminium vacuum arc plasma application for intermetallic layers formation using the high-frequency short-pulse plasma immersion ion implantation method. It is shown experimentally that the number density of aluminium macroparticles (MPs) on the substrate surface is decreased dramatically by 3 orders of magnitude when the ion-plasma substrate treatment time is increased from 30 s to 3 min at the bias potential -2 kV. It was shown that at high intensity low energy plasma immersion implantation of Al ions in Ti and Ni substrates a deep layer (several μm) of aluminium dopants with concentration in the range of (12-35) at{\%} can be formed.",
keywords = "Aluminium plasma, Intermetallic compounds, Macroparticles, Negative high-frequency short-pulsed bias, Vacuum-arc",
author = "Sivin, {Denis Olegovich} and Ryabchikov, {A. I.} and Bumagina, {A. I.} and Bolbasov, {E. N.} and Daneikina, {N. V.}",
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AU - Sivin, Denis Olegovich

AU - Ryabchikov, A. I.

AU - Bumagina, A. I.

AU - Bolbasov, E. N.

AU - Daneikina, N. V.

PY - 2014/8/15

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AB - This paper is devoted to the study of the possibilities of unfiltered aluminium vacuum arc plasma application for intermetallic layers formation using the high-frequency short-pulse plasma immersion ion implantation method. It is shown experimentally that the number density of aluminium macroparticles (MPs) on the substrate surface is decreased dramatically by 3 orders of magnitude when the ion-plasma substrate treatment time is increased from 30 s to 3 min at the bias potential -2 kV. It was shown that at high intensity low energy plasma immersion implantation of Al ions in Ti and Ni substrates a deep layer (several μm) of aluminium dopants with concentration in the range of (12-35) at% can be formed.

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KW - Negative high-frequency short-pulsed bias

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