Abstract
The magnetron sputtering discharge used to deposit aluminum-doped zinc oxide was analyzed by energy-resolved ion mass spectrometry. The flux of negative ions was measured at three radial positions in the plane of the substrate holder. The oxygen flow θO2 was varied from 0 to 17 sccm to investigate the discharge in all operation modes, i.e., metallic, transition, and oxide mode of sputtering. The existence of negative ions was determined from the energy spectra. Main attention was devoted to the investigation of O-, O2 -, AlO-, AlO2 -, ZnO-, ZnO2 -, and AlO3 - negative ions and correlations of their intensities in the energy spectrum with discharge parameters (cathode voltage, magnetron power, and gas pressure). It was found that (i) intensities of negative ions exhibit maxima in the vicinity of transition between the metallic and transition mode of sputtering and (ii) in the oxide mode intensities of these ions are saturated. In this paper, we investigate the creation and the flux of negative ions and radicals in Ar + O2 mixture by the unbalanced magnetron equipped with Al:Zn (2 wt%) alloyed target. The existence of negative ions O-, AlO-, ZnO-, and is determined from the energy spectra. The most intense flux of negative ions is located above the race-track center of sputtered target.
| Original language | English |
|---|---|
| Pages (from-to) | 459-464 |
| Number of pages | 6 |
| Journal | Plasma Processes and Polymers |
| Volume | 8 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - 20 May 2011 |
Fingerprint
Keywords
- energy-resolved ion mass spectrometry
- formation of negative ions
- magnetron sputtering
- mass spectrometry
- transparent conductive oxide
ASJC Scopus subject areas
- Condensed Matter Physics
- Polymers and Plastics
Cite this
Investigation of the negative ions in Ar/O2 plasma of magnetron sputtering discharge with Al:Zn target by ion mass spectrometry. / Pokorný, Petr; Mišina, Martin; Bulíř, Jiří; Lančok, Ján; Fitl, Přemysl; Musil, Jindřich; Novotný, Michal.
In: Plasma Processes and Polymers, Vol. 8, No. 5, 20.05.2011, p. 459-464.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Investigation of the negative ions in Ar/O2 plasma of magnetron sputtering discharge with Al:Zn target by ion mass spectrometry
AU - Pokorný, Petr
AU - Mišina, Martin
AU - Bulíř, Jiří
AU - Lančok, Ján
AU - Fitl, Přemysl
AU - Musil, Jindřich
AU - Novotný, Michal
PY - 2011/5/20
Y1 - 2011/5/20
N2 - The magnetron sputtering discharge used to deposit aluminum-doped zinc oxide was analyzed by energy-resolved ion mass spectrometry. The flux of negative ions was measured at three radial positions in the plane of the substrate holder. The oxygen flow θO2 was varied from 0 to 17 sccm to investigate the discharge in all operation modes, i.e., metallic, transition, and oxide mode of sputtering. The existence of negative ions was determined from the energy spectra. Main attention was devoted to the investigation of O-, O2 -, AlO-, AlO2 -, ZnO-, ZnO2 -, and AlO3 - negative ions and correlations of their intensities in the energy spectrum with discharge parameters (cathode voltage, magnetron power, and gas pressure). It was found that (i) intensities of negative ions exhibit maxima in the vicinity of transition between the metallic and transition mode of sputtering and (ii) in the oxide mode intensities of these ions are saturated. In this paper, we investigate the creation and the flux of negative ions and radicals in Ar + O2 mixture by the unbalanced magnetron equipped with Al:Zn (2 wt%) alloyed target. The existence of negative ions O-, AlO-, ZnO-, and is determined from the energy spectra. The most intense flux of negative ions is located above the race-track center of sputtered target.
AB - The magnetron sputtering discharge used to deposit aluminum-doped zinc oxide was analyzed by energy-resolved ion mass spectrometry. The flux of negative ions was measured at three radial positions in the plane of the substrate holder. The oxygen flow θO2 was varied from 0 to 17 sccm to investigate the discharge in all operation modes, i.e., metallic, transition, and oxide mode of sputtering. The existence of negative ions was determined from the energy spectra. Main attention was devoted to the investigation of O-, O2 -, AlO-, AlO2 -, ZnO-, ZnO2 -, and AlO3 - negative ions and correlations of their intensities in the energy spectrum with discharge parameters (cathode voltage, magnetron power, and gas pressure). It was found that (i) intensities of negative ions exhibit maxima in the vicinity of transition between the metallic and transition mode of sputtering and (ii) in the oxide mode intensities of these ions are saturated. In this paper, we investigate the creation and the flux of negative ions and radicals in Ar + O2 mixture by the unbalanced magnetron equipped with Al:Zn (2 wt%) alloyed target. The existence of negative ions O-, AlO-, ZnO-, and is determined from the energy spectra. The most intense flux of negative ions is located above the race-track center of sputtered target.
KW - energy-resolved ion mass spectrometry
KW - formation of negative ions
KW - magnetron sputtering
KW - mass spectrometry
KW - transparent conductive oxide
UR - http://www.scopus.com/inward/record.url?scp=79956007897&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=79956007897&partnerID=8YFLogxK
U2 - 10.1002/ppap.201000195
DO - 10.1002/ppap.201000195
M3 - Article
AN - SCOPUS:79956007897
VL - 8
SP - 459
EP - 464
JO - Plasma Processes and Polymers
JF - Plasma Processes and Polymers
SN - 1612-8850
IS - 5
ER -