Investigation of the negative ions in Ar/O2 plasma of magnetron sputtering discharge with Al:Zn target by ion mass spectrometry

Petr Pokorný, Martin Mišina, Jiří Bulíř, Ján Lančok, Přemysl Fitl, Jindřich Musil, Michal Novotný

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

The magnetron sputtering discharge used to deposit aluminum-doped zinc oxide was analyzed by energy-resolved ion mass spectrometry. The flux of negative ions was measured at three radial positions in the plane of the substrate holder. The oxygen flow θO2 was varied from 0 to 17 sccm to investigate the discharge in all operation modes, i.e., metallic, transition, and oxide mode of sputtering. The existence of negative ions was determined from the energy spectra. Main attention was devoted to the investigation of O-, O2 -, AlO-, AlO2 -, ZnO-, ZnO2 -, and AlO3 - negative ions and correlations of their intensities in the energy spectrum with discharge parameters (cathode voltage, magnetron power, and gas pressure). It was found that (i) intensities of negative ions exhibit maxima in the vicinity of transition between the metallic and transition mode of sputtering and (ii) in the oxide mode intensities of these ions are saturated. In this paper, we investigate the creation and the flux of negative ions and radicals in Ar + O2 mixture by the unbalanced magnetron equipped with Al:Zn (2 wt%) alloyed target. The existence of negative ions O-, AlO-, ZnO-, and is determined from the energy spectra. The most intense flux of negative ions is located above the race-track center of sputtered target.

Original languageEnglish
Pages (from-to)459-464
Number of pages6
JournalPlasma Processes and Polymers
Volume8
Issue number5
DOIs
Publication statusPublished - 20 May 2011

Fingerprint

negative ions
Magnetron sputtering
Mass spectrometry
magnetron sputtering
Negative ions
mass spectroscopy
Ions
Plasmas
ions
energy spectra
Fluxes
Oxides
Sputtering
Bauxite deposits
sputtering
Zinc Oxide
oxides
holders
Zinc oxide
zinc oxides

Keywords

  • energy-resolved ion mass spectrometry
  • formation of negative ions
  • magnetron sputtering
  • mass spectrometry
  • transparent conductive oxide

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Polymers and Plastics

Cite this

Investigation of the negative ions in Ar/O2 plasma of magnetron sputtering discharge with Al:Zn target by ion mass spectrometry. / Pokorný, Petr; Mišina, Martin; Bulíř, Jiří; Lančok, Ján; Fitl, Přemysl; Musil, Jindřich; Novotný, Michal.

In: Plasma Processes and Polymers, Vol. 8, No. 5, 20.05.2011, p. 459-464.

Research output: Contribution to journalArticle

Pokorný, Petr ; Mišina, Martin ; Bulíř, Jiří ; Lančok, Ján ; Fitl, Přemysl ; Musil, Jindřich ; Novotný, Michal. / Investigation of the negative ions in Ar/O2 plasma of magnetron sputtering discharge with Al:Zn target by ion mass spectrometry. In: Plasma Processes and Polymers. 2011 ; Vol. 8, No. 5. pp. 459-464.
@article{ac8a81255b0b44eb892775ffe421a7ab,
title = "Investigation of the negative ions in Ar/O2 plasma of magnetron sputtering discharge with Al:Zn target by ion mass spectrometry",
abstract = "The magnetron sputtering discharge used to deposit aluminum-doped zinc oxide was analyzed by energy-resolved ion mass spectrometry. The flux of negative ions was measured at three radial positions in the plane of the substrate holder. The oxygen flow θO2 was varied from 0 to 17 sccm to investigate the discharge in all operation modes, i.e., metallic, transition, and oxide mode of sputtering. The existence of negative ions was determined from the energy spectra. Main attention was devoted to the investigation of O-, O2 -, AlO-, AlO2 -, ZnO-, ZnO2 -, and AlO3 - negative ions and correlations of their intensities in the energy spectrum with discharge parameters (cathode voltage, magnetron power, and gas pressure). It was found that (i) intensities of negative ions exhibit maxima in the vicinity of transition between the metallic and transition mode of sputtering and (ii) in the oxide mode intensities of these ions are saturated. In this paper, we investigate the creation and the flux of negative ions and radicals in Ar + O2 mixture by the unbalanced magnetron equipped with Al:Zn (2 wt{\%}) alloyed target. The existence of negative ions O-, AlO-, ZnO-, and is determined from the energy spectra. The most intense flux of negative ions is located above the race-track center of sputtered target.",
keywords = "energy-resolved ion mass spectrometry, formation of negative ions, magnetron sputtering, mass spectrometry, transparent conductive oxide",
author = "Petr Pokorn{\'y} and Martin Mišina and Jiř{\'i} Bul{\'i}ř and J{\'a}n Lančok and Přemysl Fitl and Jindřich Musil and Michal Novotn{\'y}",
year = "2011",
month = "5",
day = "20",
doi = "10.1002/ppap.201000195",
language = "English",
volume = "8",
pages = "459--464",
journal = "Plasma Processes and Polymers",
issn = "1612-8850",
publisher = "Wiley-VCH Verlag",
number = "5",

}

TY - JOUR

T1 - Investigation of the negative ions in Ar/O2 plasma of magnetron sputtering discharge with Al:Zn target by ion mass spectrometry

AU - Pokorný, Petr

AU - Mišina, Martin

AU - Bulíř, Jiří

AU - Lančok, Ján

AU - Fitl, Přemysl

AU - Musil, Jindřich

AU - Novotný, Michal

PY - 2011/5/20

Y1 - 2011/5/20

N2 - The magnetron sputtering discharge used to deposit aluminum-doped zinc oxide was analyzed by energy-resolved ion mass spectrometry. The flux of negative ions was measured at three radial positions in the plane of the substrate holder. The oxygen flow θO2 was varied from 0 to 17 sccm to investigate the discharge in all operation modes, i.e., metallic, transition, and oxide mode of sputtering. The existence of negative ions was determined from the energy spectra. Main attention was devoted to the investigation of O-, O2 -, AlO-, AlO2 -, ZnO-, ZnO2 -, and AlO3 - negative ions and correlations of their intensities in the energy spectrum with discharge parameters (cathode voltage, magnetron power, and gas pressure). It was found that (i) intensities of negative ions exhibit maxima in the vicinity of transition between the metallic and transition mode of sputtering and (ii) in the oxide mode intensities of these ions are saturated. In this paper, we investigate the creation and the flux of negative ions and radicals in Ar + O2 mixture by the unbalanced magnetron equipped with Al:Zn (2 wt%) alloyed target. The existence of negative ions O-, AlO-, ZnO-, and is determined from the energy spectra. The most intense flux of negative ions is located above the race-track center of sputtered target.

AB - The magnetron sputtering discharge used to deposit aluminum-doped zinc oxide was analyzed by energy-resolved ion mass spectrometry. The flux of negative ions was measured at three radial positions in the plane of the substrate holder. The oxygen flow θO2 was varied from 0 to 17 sccm to investigate the discharge in all operation modes, i.e., metallic, transition, and oxide mode of sputtering. The existence of negative ions was determined from the energy spectra. Main attention was devoted to the investigation of O-, O2 -, AlO-, AlO2 -, ZnO-, ZnO2 -, and AlO3 - negative ions and correlations of their intensities in the energy spectrum with discharge parameters (cathode voltage, magnetron power, and gas pressure). It was found that (i) intensities of negative ions exhibit maxima in the vicinity of transition between the metallic and transition mode of sputtering and (ii) in the oxide mode intensities of these ions are saturated. In this paper, we investigate the creation and the flux of negative ions and radicals in Ar + O2 mixture by the unbalanced magnetron equipped with Al:Zn (2 wt%) alloyed target. The existence of negative ions O-, AlO-, ZnO-, and is determined from the energy spectra. The most intense flux of negative ions is located above the race-track center of sputtered target.

KW - energy-resolved ion mass spectrometry

KW - formation of negative ions

KW - magnetron sputtering

KW - mass spectrometry

KW - transparent conductive oxide

UR - http://www.scopus.com/inward/record.url?scp=79956007897&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79956007897&partnerID=8YFLogxK

U2 - 10.1002/ppap.201000195

DO - 10.1002/ppap.201000195

M3 - Article

VL - 8

SP - 459

EP - 464

JO - Plasma Processes and Polymers

JF - Plasma Processes and Polymers

SN - 1612-8850

IS - 5

ER -