Abstract
The regularities of the nitrogen and argon plasma formation in a hollow cathode with the volume up to 0.2-0.5 m3 using the short-pulsed (1-10 μs) high-frequency (100 kHz) voltage to 3 kV are presented in the paper. It is shown that despite the pulsed nature of voltage, the gaseous discharge steadily burns at the pressure of 0.1 Pa and higher, the discharge current value and plasma concentration grow as the voltage pulse duration and voltage amplitude increase, the general discharge current reaches 10 A, providing the density of the ion saturation current on the items placed in plasma up to 0.5 mA/cm2.
| Original language | English |
|---|---|
| Title of host publication | Proceedings - 2012 7th International Forum on Strategic Technology, IFOST 2012 |
| DOIs | |
| Publication status | Published - 2012 |
| Event | 2012 7th International Forum on Strategic Technology, IFOST 2012 - Tomsk, Russian Federation Duration: 18 Sep 2012 → 21 Sep 2012 |
Other
| Other | 2012 7th International Forum on Strategic Technology, IFOST 2012 |
|---|---|
| Country | Russian Federation |
| City | Tomsk |
| Period | 18.9.12 → 21.9.12 |
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Keywords
- high-voltage repetitively pulsed source
- hollow cathode
- nitrogen and argon plasma
ASJC Scopus subject areas
- Management of Technology and Innovation
Cite this
Investigation of regularity of plasma formation in large volume on the basis of the hollow cathode effect using high-frequency short-pulsed voltage. / Ryabchikov, A. I.; Sivin, Denis Olegovich; Anan'in, Peter Semenovich; Dodorin, K. Yu.
Proceedings - 2012 7th International Forum on Strategic Technology, IFOST 2012. 2012. 6357764.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Investigation of regularity of plasma formation in large volume on the basis of the hollow cathode effect using high-frequency short-pulsed voltage
AU - Ryabchikov, A. I.
AU - Sivin, Denis Olegovich
AU - Anan'in, Peter Semenovich
AU - Dodorin, K. Yu
PY - 2012
Y1 - 2012
N2 - The regularities of the nitrogen and argon plasma formation in a hollow cathode with the volume up to 0.2-0.5 m3 using the short-pulsed (1-10 μs) high-frequency (100 kHz) voltage to 3 kV are presented in the paper. It is shown that despite the pulsed nature of voltage, the gaseous discharge steadily burns at the pressure of 0.1 Pa and higher, the discharge current value and plasma concentration grow as the voltage pulse duration and voltage amplitude increase, the general discharge current reaches 10 A, providing the density of the ion saturation current on the items placed in plasma up to 0.5 mA/cm2.
AB - The regularities of the nitrogen and argon plasma formation in a hollow cathode with the volume up to 0.2-0.5 m3 using the short-pulsed (1-10 μs) high-frequency (100 kHz) voltage to 3 kV are presented in the paper. It is shown that despite the pulsed nature of voltage, the gaseous discharge steadily burns at the pressure of 0.1 Pa and higher, the discharge current value and plasma concentration grow as the voltage pulse duration and voltage amplitude increase, the general discharge current reaches 10 A, providing the density of the ion saturation current on the items placed in plasma up to 0.5 mA/cm2.
KW - high-voltage repetitively pulsed source
KW - hollow cathode
KW - nitrogen and argon plasma
UR - http://www.scopus.com/inward/record.url?scp=84871837453&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84871837453&partnerID=8YFLogxK
U2 - 10.1109/IFOST.2012.6357764
DO - 10.1109/IFOST.2012.6357764
M3 - Conference contribution
AN - SCOPUS:84871837453
SN - 9781467317702
BT - Proceedings - 2012 7th International Forum on Strategic Technology, IFOST 2012
ER -