Interrelationships among macrostress, microstructure and mechanical behavior of sputtered hard Ti(Al,V)N films

M. Jaroš, J. Musil, S. Haviar

Research output: Contribution to journalArticle

Abstract

The article reports on the influence of a compressive macrostress σ in the Ti(Al,V)N films on their mechanical properties, structure, microstructure, and resistance to cracking. The macrostress σ is controlled by the energy Ebi delivered into the growing film by bombarding ions. The Ti(Al,V)N films were sputtered by a dual magnetron with closed magnetic field. It is shown that (1) the compressive macrostress (σ < 0) increases the hardness H of the film and the ratio H/E, (2) the films exhibits a dense, voids-free, non-columnar microstructure in the case when the energy Ebi ≥ 3 MJ/cm3, (3) the enhanced resistance to cracking of the films is controlled by its mechanical properties, microstructure and macrostress σ; here E is the effective Young's modulus.

Original languageEnglish
Pages (from-to)92-96
Number of pages5
JournalMaterials Letters
Volume235
DOIs
Publication statusPublished - 15 Jan 2019

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microstructure
Microstructure
Mechanical properties
mechanical properties
Film growth
Elastic moduli
Hardness
voids
Ions
modulus of elasticity
Magnetic fields
hardness
energy
magnetic fields
ions

Keywords

  • Energy
  • Hardness
  • Macrostress
  • Mechanical properties
  • Microstructure
  • Resistance to cracking
  • Structure
  • Ti(Al, V)N films

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Interrelationships among macrostress, microstructure and mechanical behavior of sputtered hard Ti(Al,V)N films. / Jaroš, M.; Musil, J.; Haviar, S.

In: Materials Letters, Vol. 235, 15.01.2019, p. 92-96.

Research output: Contribution to journalArticle

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