Intense pulsed ion beam sources for industrial applications

W. J. Zhao, G. E. Remnev, S. Yan, M. S. Opekounov, X. Y. Le, V. M. Matvienko, B. X. Han, J. M. Xue, Y. G. Wang

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

The different kinds of intense pulsed ion beam (IPIB) sources and their applications to surface modification of materials, e.g., IPIB technology, are reviewed. Intense pulsed energy effects on the surface microstructure as well as properties of 45# steel have been experimentally investigated in this work with different pulse parameters of the IPIB, such as current density and pulse duration. It is shown that ion beams with power density (106-108 W/cm2) are very promising ones, but the modification result is affected significantly by the pulsed ion beam parameters. New requirements to the IPIB sources for the industrial applications are discussed.

Original languageEnglish
Pages (from-to)1045-1048
Number of pages4
JournalReview of Scientific Instruments
Volume71
Issue number2 II
Publication statusPublished - Feb 2000

Fingerprint

Ion beams
Industrial applications
ion beams
Surface treatment
radiant flux density
pulse duration
Current density
steels
current density
requirements
microstructure
Microstructure
Steel
pulses
energy

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)
  • Instrumentation

Cite this

Zhao, W. J., Remnev, G. E., Yan, S., Opekounov, M. S., Le, X. Y., Matvienko, V. M., ... Wang, Y. G. (2000). Intense pulsed ion beam sources for industrial applications. Review of Scientific Instruments, 71(2 II), 1045-1048.

Intense pulsed ion beam sources for industrial applications. / Zhao, W. J.; Remnev, G. E.; Yan, S.; Opekounov, M. S.; Le, X. Y.; Matvienko, V. M.; Han, B. X.; Xue, J. M.; Wang, Y. G.

In: Review of Scientific Instruments, Vol. 71, No. 2 II, 02.2000, p. 1045-1048.

Research output: Contribution to journalArticle

Zhao, WJ, Remnev, GE, Yan, S, Opekounov, MS, Le, XY, Matvienko, VM, Han, BX, Xue, JM & Wang, YG 2000, 'Intense pulsed ion beam sources for industrial applications', Review of Scientific Instruments, vol. 71, no. 2 II, pp. 1045-1048.
Zhao WJ, Remnev GE, Yan S, Opekounov MS, Le XY, Matvienko VM et al. Intense pulsed ion beam sources for industrial applications. Review of Scientific Instruments. 2000 Feb;71(2 II):1045-1048.
Zhao, W. J. ; Remnev, G. E. ; Yan, S. ; Opekounov, M. S. ; Le, X. Y. ; Matvienko, V. M. ; Han, B. X. ; Xue, J. M. ; Wang, Y. G. / Intense pulsed ion beam sources for industrial applications. In: Review of Scientific Instruments. 2000 ; Vol. 71, No. 2 II. pp. 1045-1048.
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