Influence of thermal annealing on the structure of defects and properties of nanostructures Ti-Si-N coatings obtained by cathode vacuum arc deposition

Abstract

Original results of investigations of Ti-Si-N nanostructured coatings deposited by cathodic vacuum arc evaporation are presented in this work. Investigations are provided by the supplementing each other methods: slow positron beam, XRD, SEM with EDS, RBS, AFM, as well as measurement of nanohardness and elastic modulus before and after annealing at 600 °C (for 30 min). It was found that after deposition the solid solution (Ti, Si) N is formed in coatings. In this solid solution the stress-strain state (compressive strain - 2,6%) is occurring. As a result of thermal annealing the deformation slightly decreases to - 2,3%. Measurements provided by method of Positron annihilation spectroscopy (PAS) show that at the interfaces of coatings the segregated defects are occurring as a result of thermal diffusion process. These defects form clusters of vacancy-type defects of a high concentration - from 5·10¹⁶ cm^-3 to 7,5·10¹⁷ cm^{- 3}.

Original language	English
Pages (from-to)	134-139
Number of pages	6
Journal	Problems of Atomic Science and Technology
Issue number	2
Publication status	Published - 22 Apr 2013
Externally published	Yes

ASJC Scopus subject areas

Radiation
Nuclear and High Energy Physics
Nuclear Energy and Engineering
Materials Science(all)

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Pogrebnjak, A. D., Krause-Rehberg, R., Kupchishin, A. I., Drobyshevskaya, A. A., Ivaschenko, V. I., Shypylenko, A. P., Kolesnikov, D. A., & Erdybaeva, N. K. (2013). Influence of thermal annealing on the structure of defects and properties of nanostructures Ti-Si-N coatings obtained by cathode vacuum arc deposition. Problems of Atomic Science and Technology, (2), 134-139.

Influence of thermal annealing on the structure of defects and properties of nanostructures Ti-Si-N coatings obtained by cathode vacuum arc deposition. / Pogrebnjak, A. D.; Krause-Rehberg, R.; Kupchishin, A. I.; Drobyshevskaya, A. A.; Ivaschenko, V. I.; Shypylenko, A. P.; Kolesnikov, D. A.; Erdybaeva, N. K.

In: Problems of Atomic Science and Technology, No. 2, 22.04.2013, p. 134-139.

Research output: Contribution to journal › Article

Pogrebnjak, A. D. ; Krause-Rehberg, R. ; Kupchishin, A. I. ; Drobyshevskaya, A. A. ; Ivaschenko, V. I. ; Shypylenko, A. P. ; Kolesnikov, D. A. ; Erdybaeva, N. K. / Influence of thermal annealing on the structure of defects and properties of nanostructures Ti-Si-N coatings obtained by cathode vacuum arc deposition. In: Problems of Atomic Science and Technology. 2013 ; No. 2. pp. 134-139.

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title = "Influence of thermal annealing on the structure of defects and properties of nanostructures Ti-Si-N coatings obtained by cathode vacuum arc deposition",

abstract = "Original results of investigations of Ti-Si-N nanostructured coatings deposited by cathodic vacuum arc evaporation are presented in this work. Investigations are provided by the supplementing each other methods: slow positron beam, XRD, SEM with EDS, RBS, AFM, as well as measurement of nanohardness and elastic modulus before and after annealing at 600 °C (for 30 min). It was found that after deposition the solid solution (Ti, Si) N is formed in coatings. In this solid solution the stress-strain state (compressive strain - 2,6%) is occurring. As a result of thermal annealing the deformation slightly decreases to - 2,3%. Measurements provided by method of Positron annihilation spectroscopy (PAS) show that at the interfaces of coatings the segregated defects are occurring as a result of thermal diffusion process. These defects form clusters of vacancy-type defects of a high concentration - from 5·1016 cm-3 to 7,5·1017 cm- 3.",

author = "Pogrebnjak, {A. D.} and R. Krause-Rehberg and Kupchishin, {A. I.} and Drobyshevskaya, {A. A.} and Ivaschenko, {V. I.} and Shypylenko, {A. P.} and Kolesnikov, {D. A.} and Erdybaeva, {N. K.}",

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AU - Krause-Rehberg, R.

AU - Kupchishin, A. I.

AU - Drobyshevskaya, A. A.

AU - Ivaschenko, V. I.

AU - Shypylenko, A. P.

AU - Kolesnikov, D. A.

AU - Erdybaeva, N. K.

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N2 - Original results of investigations of Ti-Si-N nanostructured coatings deposited by cathodic vacuum arc evaporation are presented in this work. Investigations are provided by the supplementing each other methods: slow positron beam, XRD, SEM with EDS, RBS, AFM, as well as measurement of nanohardness and elastic modulus before and after annealing at 600 °C (for 30 min). It was found that after deposition the solid solution (Ti, Si) N is formed in coatings. In this solid solution the stress-strain state (compressive strain - 2,6%) is occurring. As a result of thermal annealing the deformation slightly decreases to - 2,3%. Measurements provided by method of Positron annihilation spectroscopy (PAS) show that at the interfaces of coatings the segregated defects are occurring as a result of thermal diffusion process. These defects form clusters of vacancy-type defects of a high concentration - from 5·1016 cm-3 to 7,5·1017 cm- 3.

AB - Original results of investigations of Ti-Si-N nanostructured coatings deposited by cathodic vacuum arc evaporation are presented in this work. Investigations are provided by the supplementing each other methods: slow positron beam, XRD, SEM with EDS, RBS, AFM, as well as measurement of nanohardness and elastic modulus before and after annealing at 600 °C (for 30 min). It was found that after deposition the solid solution (Ti, Si) N is formed in coatings. In this solid solution the stress-strain state (compressive strain - 2,6%) is occurring. As a result of thermal annealing the deformation slightly decreases to - 2,3%. Measurements provided by method of Positron annihilation spectroscopy (PAS) show that at the interfaces of coatings the segregated defects are occurring as a result of thermal diffusion process. These defects form clusters of vacancy-type defects of a high concentration - from 5·1016 cm-3 to 7,5·1017 cm- 3.

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