Original results of investigations of Ti-Si-N nanostructured coatings deposited by cathodic vacuum arc evaporation are presented in this work. Investigations are provided by the supplementing each other methods: slow positron beam, XRD, SEM with EDS, RBS, AFM, as well as measurement of nanohardness and elastic modulus before and after annealing at 600 °C (for 30 min). It was found that after deposition the solid solution (Ti, Si) N is formed in coatings. In this solid solution the stress-strain state (compressive strain - 2,6%) is occurring. As a result of thermal annealing the deformation slightly decreases to - 2,3%. Measurements provided by method of Positron annihilation spectroscopy (PAS) show that at the interfaces of coatings the segregated defects are occurring as a result of thermal diffusion process. These defects form clusters of vacancy-type defects of a high concentration - from 5·1016 cm-3 to 7,5·1017 cm- 3.
|Number of pages||6|
|Journal||Problems of Atomic Science and Technology|
|Publication status||Published - 22 Apr 2013|
ASJC Scopus subject areas
- Nuclear and High Energy Physics
- Nuclear Energy and Engineering
- Materials Science(all)