The main electrophysical properties of polyvinylidene fluoride (PVDF) films produced by two technologies: the solution casting method and the method of hot pressing from the melt are investigated. To analyze the PVDF films, methods of dielectric spectroscopy (DS), IR spectroscopy, TGA/DSC analysis, and x-ray diffraction (XRD) are used. It is demonstrated that the IR spectra of both PVDF films change weakly in comparison with the virgin PVDF film. The absorption bands characteristic for α-, β-, and γ-phases are observed for the virgin and both types of PVDF films. This testifies to the fact that the molecular structure of film samples is practically independent of their processing method. The only difference is that the new absorption band at 1723 cm-1 arises in the IR spectra of the films produced by the method of hot pressing from the melt. The TGA/DSC analysis demonstrates that the beginning melting temperature, melting temperature, beginning decomposition temperature, and decomposition temperature for the film samples produced by the method of hot pressing from the melt decrease by 8, 2, 10, and 12°C, respectively, compared to the film samples produced by the solution casting method.
- main electrophysical characteristics
- polyvinylidene fluoride
- processing technology
ASJC Scopus subject areas
- Physics and Astronomy(all)