Influence of the plasma-immersion ion implantation of titanium on the structure, morphology, and composition of the surface layer of Zr–1Nb alloy

A. N. Sutygina, N. N. Nikitenkov, E. B. Kashkarov, M. S. Syrtanov, L. Volesky, P. Louda, T. S. Priamushko, V. S. Sypchenko, A. Hashhash

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The results of investigating the plasma-immersion ion implantation of titanium into Zr–1Nb alloy from arc-discharge plasma are presented. The investigations are performed using 1.5-kV bias voltage applied to the sample by means of a coaxial plasma filter for 5, 15, and 30 min. Scanning electron and atomic-force microscopy data demonstrate that, after implantation, grains with sizes of ~50–100 nm and craters with lateral sizes varying from ~1 μm to vanishingly small values are detected on the surface. Energy-dispersive X-ray spectroscopy data indicate the formation of an oxide film under titanium implantation. It follows from X-ray diffraction analysis that implanted titanium is in the dissolved state and the crystal-lattice-parameter ratio c/a increases after ion implantation. The layer-by-layer elemental analysis of the implanted layer performed via optical emission spectroscopy is evidence that the titanium-concentration maximum is shifted to larger depths with incresing implantation duration.

Original languageEnglish
Pages (from-to)452-457
Number of pages6
JournalJournal of Surface Investigation
Volume11
Issue number2
DOIs
Publication statusPublished - 1 Mar 2017

Fingerprint

Titanium
Ion implantation
Plasmas
Chemical analysis
Optical emission spectroscopy
Bias voltage
Crystal lattices
X ray diffraction analysis
Lattice constants
Oxide films
Atomic force microscopy
Scanning
Electrons

Keywords

  • clusters
  • implantation
  • plasma filters
  • vacuum-arc discharge
  • zirconium alloy

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

Cite this

Influence of the plasma-immersion ion implantation of titanium on the structure, morphology, and composition of the surface layer of Zr–1Nb alloy. / Sutygina, A. N.; Nikitenkov, N. N.; Kashkarov, E. B.; Syrtanov, M. S.; Volesky, L.; Louda, P.; Priamushko, T. S.; Sypchenko, V. S.; Hashhash, A.

In: Journal of Surface Investigation, Vol. 11, No. 2, 01.03.2017, p. 452-457.

Research output: Contribution to journalArticle

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AU - Sutygina, A. N.

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AU - Kashkarov, E. B.

AU - Syrtanov, M. S.

AU - Volesky, L.

AU - Louda, P.

AU - Priamushko, T. S.

AU - Sypchenko, V. S.

AU - Hashhash, A.

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N2 - The results of investigating the plasma-immersion ion implantation of titanium into Zr–1Nb alloy from arc-discharge plasma are presented. The investigations are performed using 1.5-kV bias voltage applied to the sample by means of a coaxial plasma filter for 5, 15, and 30 min. Scanning electron and atomic-force microscopy data demonstrate that, after implantation, grains with sizes of ~50–100 nm and craters with lateral sizes varying from ~1 μm to vanishingly small values are detected on the surface. Energy-dispersive X-ray spectroscopy data indicate the formation of an oxide film under titanium implantation. It follows from X-ray diffraction analysis that implanted titanium is in the dissolved state and the crystal-lattice-parameter ratio c/a increases after ion implantation. The layer-by-layer elemental analysis of the implanted layer performed via optical emission spectroscopy is evidence that the titanium-concentration maximum is shifted to larger depths with incresing implantation duration.

AB - The results of investigating the plasma-immersion ion implantation of titanium into Zr–1Nb alloy from arc-discharge plasma are presented. The investigations are performed using 1.5-kV bias voltage applied to the sample by means of a coaxial plasma filter for 5, 15, and 30 min. Scanning electron and atomic-force microscopy data demonstrate that, after implantation, grains with sizes of ~50–100 nm and craters with lateral sizes varying from ~1 μm to vanishingly small values are detected on the surface. Energy-dispersive X-ray spectroscopy data indicate the formation of an oxide film under titanium implantation. It follows from X-ray diffraction analysis that implanted titanium is in the dissolved state and the crystal-lattice-parameter ratio c/a increases after ion implantation. The layer-by-layer elemental analysis of the implanted layer performed via optical emission spectroscopy is evidence that the titanium-concentration maximum is shifted to larger depths with incresing implantation duration.

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