Influence of repetitively pulsed negative bias parameters on macroparticle surface density

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Abstract

The results of an experimental study of the influence of a substrate negative bias with various pulse widths and pulse repetition rates ranging from several Hz to 105 Hz on the macroparticle (MP) accumulation on substrate immersed in a DC titanium vacuum arc plasma are presented. It was found that the rate of MP deposition on the substrate surface depends significantly on the bias pulse parameters and the processing time. The influence of the multiple recharging of MPs in the plasma and the sheath on the reflection of these MPs in a sheath electric field is discussed.

Original languageEnglish
Pages (from-to)467-471
Number of pages5
JournalJournal of Industrial Pollution Control
Volume32
Issue number2
Publication statusPublished - 2016

Keywords

  • Gaseous plasma
  • Macroparticle accumulation
  • Microdroplets
  • Substrate negative bias
  • Vacuum arc plasma

ASJC Scopus subject areas

  • Water Science and Technology
  • Ocean Engineering
  • Pollution
  • Fluid Flow and Transfer Processes
  • Atmospheric Science

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