Abstract
This paper aims to provide an analysis on the effects of ion bombardment flux (j i) on film characteristics of nickel carbide films deposited by the cathodic arc method, under the conditions when ion energy (E i) and the ratio of the ion flux to the flux of deposited atoms (j i/j a) were kept constant. The deposition atmosphere consisted in a CH 4+Ar mixture. The substrate current density was varied from 2.7 to 4.4 mA/cm 2 by using either one or two cathodes. The coatings were investigated in terms of elemental and phase composition, texture, chemical bondings, residual stress, hardness, electrical characteristics and tribological performance. The experimental results showed that film crystallinity, hardness and wear resistance of the NiC coatings improved at increased ion bombardment intensity.
| Original language | English |
|---|---|
| Pages (from-to) | 2167-2171 |
| Number of pages | 5 |
| Journal | Optoelectronics and Advanced Materials, Rapid Communications |
| Volume | 4 |
| Issue number | 12 |
| Publication status | Published - 1 Dec 2010 |
| Externally published | Yes |
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Keywords
- Cathodic arc
- Electrical resistivity
- Mechanical properties
- Nickel carbide
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Electronic, Optical and Magnetic Materials
Cite this
Influence of ion bombardment flux on the characteristics of NiC films obtained by cathodic arc deposition. / Balaceanu, M.; Vladescu, A.; Braic, M.; Zoita, C. N.; Feraru, I.; Braic, V.
In: Optoelectronics and Advanced Materials, Rapid Communications, Vol. 4, No. 12, 01.12.2010, p. 2167-2171.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Influence of ion bombardment flux on the characteristics of NiC films obtained by cathodic arc deposition
AU - Balaceanu, M.
AU - Vladescu, A.
AU - Braic, M.
AU - Zoita, C. N.
AU - Feraru, I.
AU - Braic, V.
PY - 2010/12/1
Y1 - 2010/12/1
N2 - This paper aims to provide an analysis on the effects of ion bombardment flux (j i) on film characteristics of nickel carbide films deposited by the cathodic arc method, under the conditions when ion energy (E i) and the ratio of the ion flux to the flux of deposited atoms (j i/j a) were kept constant. The deposition atmosphere consisted in a CH 4+Ar mixture. The substrate current density was varied from 2.7 to 4.4 mA/cm 2 by using either one or two cathodes. The coatings were investigated in terms of elemental and phase composition, texture, chemical bondings, residual stress, hardness, electrical characteristics and tribological performance. The experimental results showed that film crystallinity, hardness and wear resistance of the NiC coatings improved at increased ion bombardment intensity.
AB - This paper aims to provide an analysis on the effects of ion bombardment flux (j i) on film characteristics of nickel carbide films deposited by the cathodic arc method, under the conditions when ion energy (E i) and the ratio of the ion flux to the flux of deposited atoms (j i/j a) were kept constant. The deposition atmosphere consisted in a CH 4+Ar mixture. The substrate current density was varied from 2.7 to 4.4 mA/cm 2 by using either one or two cathodes. The coatings were investigated in terms of elemental and phase composition, texture, chemical bondings, residual stress, hardness, electrical characteristics and tribological performance. The experimental results showed that film crystallinity, hardness and wear resistance of the NiC coatings improved at increased ion bombardment intensity.
KW - Cathodic arc
KW - Electrical resistivity
KW - Mechanical properties
KW - Nickel carbide
UR - http://www.scopus.com/inward/record.url?scp=84859066575&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84859066575&partnerID=8YFLogxK
M3 - Article
AN - SCOPUS:84859066575
VL - 4
SP - 2167
EP - 2171
JO - Optoelectronics and Advanced Materials, Rapid Communications
JF - Optoelectronics and Advanced Materials, Rapid Communications
SN - 1842-6573
IS - 12
ER -