Influence of ion bombardment flux on the characteristics of NiC films obtained by cathodic arc deposition

M. Balaceanu, A. Vladescu, M. Braic, C. N. Zoita, I. Feraru, V. Braic

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

This paper aims to provide an analysis on the effects of ion bombardment flux (j i) on film characteristics of nickel carbide films deposited by the cathodic arc method, under the conditions when ion energy (E i) and the ratio of the ion flux to the flux of deposited atoms (j i/j a) were kept constant. The deposition atmosphere consisted in a CH 4+Ar mixture. The substrate current density was varied from 2.7 to 4.4 mA/cm 2 by using either one or two cathodes. The coatings were investigated in terms of elemental and phase composition, texture, chemical bondings, residual stress, hardness, electrical characteristics and tribological performance. The experimental results showed that film crystallinity, hardness and wear resistance of the NiC coatings improved at increased ion bombardment intensity.

Original languageEnglish
Pages (from-to)2167-2171
Number of pages5
JournalOptoelectronics and Advanced Materials, Rapid Communications
Volume4
Issue number12
Publication statusPublished - 1 Dec 2010
Externally publishedYes

Keywords

  • Cathodic arc
  • Electrical resistivity
  • Mechanical properties
  • Nickel carbide

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

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