Influence of Bias Voltage and CH4/N2 Gas Ratio on the Structure and Mechanical Properties of TiCN Coatings Deposited by Cathodic Arc Deposition Method

Nikolay Petkov, Egor Kashkarov, Aleksei Obrosov, Totka Bakalova, Pavel Kejzlar, Hristo Bahchedzhiev

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1 Citation (Scopus)


This article presents a study of the influence of the bias voltage and CH4/N2 gas ratio on the structure and mechanical properties of TiCN coatings. The coatings are deposited by cathodic arc deposition technology from Ti cathodes under an atmosphere of a mixture of CH4 and N2 gasses. XRD analysis shows that an increase in the methane flow changes the preferential orientation of the coating from (111) to (200) and results in a refinement of the structure (grain size reduction from 23 to 7 nm). SEM analysis shows that the coatings are stoichiometric. It was demonstrated that the bias voltage has an influence on the grain size, hardness and elasticity module. The highest hardness value of 52.5 GPa was measured at the coatings lacking a clear preferential orientation. The adhesion of the coatings showed a critical load in the range of 29-64 N.

Original languageEnglish
Pages (from-to)343-354
Number of pages12
JournalJournal of Materials Engineering and Performance
Issue number1
Publication statusPublished - 1 Jan 2019



  • cathodic arc deposition
  • nanohardness
  • TiCN coatings
  • XRD analysis

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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