Influence of bias parameters and plasma density on vacuum arc macroparticle accumulation

Research output: Contribution to journalArticlepeer-review


Several regularities of the accumulation of vacuum arc metal macroparticles (MP) on the sample on repetitively pulsed biasing (105 Hz, 7 μs, -0.5 kV to -3.5 kV) have been investigated. It has been shown that the substrate temperature plays a very important role in controlling the MP amounts on the sample. A possibility to change the metal particle number density on the substrate in the range from 105/cm2 to 107/cm2, depending on bias pulse parameters, sample temperature, and ion plasma saturation current density, has been demonstrated. The shape of MPs and their adhesion to the substrate surface depends strongly on the MP energy balance in a high-voltage space charge sheath.

Original languageEnglish
Pages (from-to)1471-1475
Number of pages5
JournalMaterials and Manufacturing Processes
Issue number12
Publication statusPublished - 2 Dec 2015


  • Arc
  • Bias
  • Biomedicine
  • Density
  • Deposition
  • Implantation
  • Implants
  • Macroparticles
  • Metal
  • Plasma
  • Vacuum

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Industrial and Manufacturing Engineering

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