Abstract
Several regularities of the accumulation of vacuum arc metal macroparticles (MP) on the sample on repetitively pulsed biasing (105 Hz, 7 μs, -0.5 kV to -3.5 kV) have been investigated. It has been shown that the substrate temperature plays a very important role in controlling the MP amounts on the sample. A possibility to change the metal particle number density on the substrate in the range from 105/cm2 to 107/cm2, depending on bias pulse parameters, sample temperature, and ion plasma saturation current density, has been demonstrated. The shape of MPs and their adhesion to the substrate surface depends strongly on the MP energy balance in a high-voltage space charge sheath.
| Original language | English |
|---|---|
| Pages (from-to) | 1471-1475 |
| Number of pages | 5 |
| Journal | Materials and Manufacturing Processes |
| Volume | 30 |
| Issue number | 12 |
| DOIs | |
| Publication status | Published - 2 Dec 2015 |
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Keywords
- Arc
- Bias
- Biomedicine
- Density
- Deposition
- Implantation
- Implants
- Macroparticles
- Metal
- Plasma
- Vacuum
ASJC Scopus subject areas
- Materials Science(all)
- Mechanics of Materials
- Mechanical Engineering
- Industrial and Manufacturing Engineering
Cite this
Influence of bias parameters and plasma density on vacuum arc macroparticle accumulation. / Ryabchikov, Alexander I.; Sivin, Denis Olegovich; Bumagina, Anna I.
In: Materials and Manufacturing Processes, Vol. 30, No. 12, 02.12.2015, p. 1471-1475.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Influence of bias parameters and plasma density on vacuum arc macroparticle accumulation
AU - Ryabchikov, Alexander I.
AU - Sivin, Denis Olegovich
AU - Bumagina, Anna I.
PY - 2015/12/2
Y1 - 2015/12/2
N2 - Several regularities of the accumulation of vacuum arc metal macroparticles (MP) on the sample on repetitively pulsed biasing (105 Hz, 7 μs, -0.5 kV to -3.5 kV) have been investigated. It has been shown that the substrate temperature plays a very important role in controlling the MP amounts on the sample. A possibility to change the metal particle number density on the substrate in the range from 105/cm2 to 107/cm2, depending on bias pulse parameters, sample temperature, and ion plasma saturation current density, has been demonstrated. The shape of MPs and their adhesion to the substrate surface depends strongly on the MP energy balance in a high-voltage space charge sheath.
AB - Several regularities of the accumulation of vacuum arc metal macroparticles (MP) on the sample on repetitively pulsed biasing (105 Hz, 7 μs, -0.5 kV to -3.5 kV) have been investigated. It has been shown that the substrate temperature plays a very important role in controlling the MP amounts on the sample. A possibility to change the metal particle number density on the substrate in the range from 105/cm2 to 107/cm2, depending on bias pulse parameters, sample temperature, and ion plasma saturation current density, has been demonstrated. The shape of MPs and their adhesion to the substrate surface depends strongly on the MP energy balance in a high-voltage space charge sheath.
KW - Arc
KW - Bias
KW - Biomedicine
KW - Density
KW - Deposition
KW - Implantation
KW - Implants
KW - Macroparticles
KW - Metal
KW - Plasma
KW - Vacuum
UR - http://www.scopus.com/inward/record.url?scp=84938959803&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84938959803&partnerID=8YFLogxK
U2 - 10.1080/10426914.2015.1019094
DO - 10.1080/10426914.2015.1019094
M3 - Article
AN - SCOPUS:84938959803
VL - 30
SP - 1471
EP - 1475
JO - Materials and Manufacturing Processes
JF - Materials and Manufacturing Processes
SN - 1042-6914
IS - 12
ER -