Influence of bias parameters and plasma density on vacuum arc macroparticle accumulation

Research output: Contribution to journalArticle

Abstract

Several regularities of the accumulation of vacuum arc metal macroparticles (MP) on the sample on repetitively pulsed biasing (105 Hz, 7 μs, -0.5 kV to -3.5 kV) have been investigated. It has been shown that the substrate temperature plays a very important role in controlling the MP amounts on the sample. A possibility to change the metal particle number density on the substrate in the range from 105/cm2 to 107/cm2, depending on bias pulse parameters, sample temperature, and ion plasma saturation current density, has been demonstrated. The shape of MPs and their adhesion to the substrate surface depends strongly on the MP energy balance in a high-voltage space charge sheath.

Original languageEnglish
Pages (from-to)1471-1475
Number of pages5
JournalMaterials and Manufacturing Processes
Volume30
Issue number12
DOIs
Publication statusPublished - 2 Dec 2015

Fingerprint

Plasma density
Vacuum
Substrates
Metals
Plasma sheaths
Energy balance
Electric space charge
Current density
Adhesion
Ions
Plasmas
Temperature
Electric potential

Keywords

  • Arc
  • Bias
  • Biomedicine
  • Density
  • Deposition
  • Implantation
  • Implants
  • Macroparticles
  • Metal
  • Plasma
  • Vacuum

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Industrial and Manufacturing Engineering

Cite this

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title = "Influence of bias parameters and plasma density on vacuum arc macroparticle accumulation",
abstract = "Several regularities of the accumulation of vacuum arc metal macroparticles (MP) on the sample on repetitively pulsed biasing (105 Hz, 7 μs, -0.5 kV to -3.5 kV) have been investigated. It has been shown that the substrate temperature plays a very important role in controlling the MP amounts on the sample. A possibility to change the metal particle number density on the substrate in the range from 105/cm2 to 107/cm2, depending on bias pulse parameters, sample temperature, and ion plasma saturation current density, has been demonstrated. The shape of MPs and their adhesion to the substrate surface depends strongly on the MP energy balance in a high-voltage space charge sheath.",
keywords = "Arc, Bias, Biomedicine, Density, Deposition, Implantation, Implants, Macroparticles, Metal, Plasma, Vacuum",
author = "Ryabchikov, {Alexander I.} and Sivin, {Denis Olegovich} and Bumagina, {Anna I.}",
year = "2015",
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language = "English",
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journal = "Materials and Manufacturing Processes",
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publisher = "Taylor and Francis Ltd.",
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AU - Ryabchikov, Alexander I.

AU - Sivin, Denis Olegovich

AU - Bumagina, Anna I.

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N2 - Several regularities of the accumulation of vacuum arc metal macroparticles (MP) on the sample on repetitively pulsed biasing (105 Hz, 7 μs, -0.5 kV to -3.5 kV) have been investigated. It has been shown that the substrate temperature plays a very important role in controlling the MP amounts on the sample. A possibility to change the metal particle number density on the substrate in the range from 105/cm2 to 107/cm2, depending on bias pulse parameters, sample temperature, and ion plasma saturation current density, has been demonstrated. The shape of MPs and their adhesion to the substrate surface depends strongly on the MP energy balance in a high-voltage space charge sheath.

AB - Several regularities of the accumulation of vacuum arc metal macroparticles (MP) on the sample on repetitively pulsed biasing (105 Hz, 7 μs, -0.5 kV to -3.5 kV) have been investigated. It has been shown that the substrate temperature plays a very important role in controlling the MP amounts on the sample. A possibility to change the metal particle number density on the substrate in the range from 105/cm2 to 107/cm2, depending on bias pulse parameters, sample temperature, and ion plasma saturation current density, has been demonstrated. The shape of MPs and their adhesion to the substrate surface depends strongly on the MP energy balance in a high-voltage space charge sheath.

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