Influence of bias parameters and plasma density on vacuum arc macroparticle accumulation

Several regularities of the accumulation of vacuum arc metal macroparticles (MP) on the sample on repetitively pulsed biasing (10⁵ Hz, 7 μs, -0.5 kV to -3.5 kV) have been investigated. It has been shown that the substrate temperature plays a very important role in controlling the MP amounts on the sample. A possibility to change the metal particle number density on the substrate in the range from 10⁵/cm² to 10⁷/cm², depending on bias pulse parameters, sample temperature, and ion plasma saturation current density, has been demonstrated. The shape of MPs and their adhesion to the substrate surface depends strongly on the MP energy balance in a high-voltage space charge sheath.