Influence of a Hydrogen Atmosphere on the Properties of an Aluminum Oxide Film on VT1-0 Titanium

V. S. Sypchenko, Van Tsailun, N. N. Nikitenkov, Yu I. Tyurin, T. I. Sigfusson, E. S. Kiseleva

Research output: Contribution to journalArticle

Abstract

Abstract: In this study, we have considered interaction between an aluminum oxide film magnetron-sputtered on commercially pure VT1-0 titanium and a hydrogen atmosphere. The time the system was exposed to hydrogen varied from 1 to 4 h with all other parameters remaining the same. Data for the distribution of hydrogen over the depth (film thickness) and its content in the thin-film system have been obtained, and the influence of the hold time in hydrogen on the adhesion and friction coefficient of the film has been revealed. In addition, the surface conductivity and hydrogen distribution in the aluminum oxide film have been determined.

Original languageEnglish
Pages (from-to)518-522
Number of pages5
JournalTechnical Physics
Volume64
Issue number4
DOIs
Publication statusPublished - 1 Apr 2019

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oxide films
aluminum oxides
titanium
atmospheres
hydrogen
coefficient of friction
adhesion
film thickness
conductivity
coefficients
thin films
interactions

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Influence of a Hydrogen Atmosphere on the Properties of an Aluminum Oxide Film on VT1-0 Titanium. / Sypchenko, V. S.; Tsailun, Van; Nikitenkov, N. N.; Tyurin, Yu I.; Sigfusson, T. I.; Kiseleva, E. S.

In: Technical Physics, Vol. 64, No. 4, 01.04.2019, p. 518-522.

Research output: Contribution to journalArticle

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