Abstract
Remarkable properties of titanium dioxide films such as hydrophilicity or photocatalytic activity depend largely on their phase composition, microstructure and in particular on the crystallinity. By in-situ X-ray diffraction studies of isochronal and isothermal annealing of amorphous films with different thickness at different temperatures it was found that the crystallization process can be quite well described by the Johnson-Mehl-Avrami- Kolmogorov formula modified by the introduction of crystallization onset. This and other parameters of the formula strongly depend on the film thickness. For thickness below about 500 nm the crystallization is very slow. Simultaneously, the appearance and increase of tensile stresses with the annealing time were observed and these stresses were confirmed by detailed studies by both total pattern fitting and sin2ψ method on post-annealed samples. The stresses rapidly increase with decreasing thickness of the films. It seems that there is a strong correlation between the stresses and crystallization onset and/or crystallization rate. Tensile stresses that are generated during crystallization further inhibit crystallization and cause significant thickness dependence of the crystallization. The temperature and time dependence of microstructure of crystallized amorphous films differ significantly from those obtained for as-deposited nanocrystalline films or nanocrystalline powders. During annealing, quite large crystallites are formed quickly with the preferred orientation (001) that is suppressed with the proceeding time.
| Original language | English |
|---|---|
| Pages (from-to) | 1649-1654 |
| Number of pages | 6 |
| Journal | Thin Solid Films |
| Volume | 519 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - 30 Dec 2010 |
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ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry
Cite this
In-situ X-ray diffraction studies of time and thickness dependence of crystallization of amorphous TiO2 thin films and stress evolution. / Kužel, R.; Nichtová, L.; Matěj, Z.; Musil, J.
In: Thin Solid Films, Vol. 519, No. 5, 30.12.2010, p. 1649-1654.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - In-situ X-ray diffraction studies of time and thickness dependence of crystallization of amorphous TiO2 thin films and stress evolution
AU - Kužel, R.
AU - Nichtová, L.
AU - Matěj, Z.
AU - Musil, J.
PY - 2010/12/30
Y1 - 2010/12/30
N2 - Remarkable properties of titanium dioxide films such as hydrophilicity or photocatalytic activity depend largely on their phase composition, microstructure and in particular on the crystallinity. By in-situ X-ray diffraction studies of isochronal and isothermal annealing of amorphous films with different thickness at different temperatures it was found that the crystallization process can be quite well described by the Johnson-Mehl-Avrami- Kolmogorov formula modified by the introduction of crystallization onset. This and other parameters of the formula strongly depend on the film thickness. For thickness below about 500 nm the crystallization is very slow. Simultaneously, the appearance and increase of tensile stresses with the annealing time were observed and these stresses were confirmed by detailed studies by both total pattern fitting and sin2ψ method on post-annealed samples. The stresses rapidly increase with decreasing thickness of the films. It seems that there is a strong correlation between the stresses and crystallization onset and/or crystallization rate. Tensile stresses that are generated during crystallization further inhibit crystallization and cause significant thickness dependence of the crystallization. The temperature and time dependence of microstructure of crystallized amorphous films differ significantly from those obtained for as-deposited nanocrystalline films or nanocrystalline powders. During annealing, quite large crystallites are formed quickly with the preferred orientation (001) that is suppressed with the proceeding time.
AB - Remarkable properties of titanium dioxide films such as hydrophilicity or photocatalytic activity depend largely on their phase composition, microstructure and in particular on the crystallinity. By in-situ X-ray diffraction studies of isochronal and isothermal annealing of amorphous films with different thickness at different temperatures it was found that the crystallization process can be quite well described by the Johnson-Mehl-Avrami- Kolmogorov formula modified by the introduction of crystallization onset. This and other parameters of the formula strongly depend on the film thickness. For thickness below about 500 nm the crystallization is very slow. Simultaneously, the appearance and increase of tensile stresses with the annealing time were observed and these stresses were confirmed by detailed studies by both total pattern fitting and sin2ψ method on post-annealed samples. The stresses rapidly increase with decreasing thickness of the films. It seems that there is a strong correlation between the stresses and crystallization onset and/or crystallization rate. Tensile stresses that are generated during crystallization further inhibit crystallization and cause significant thickness dependence of the crystallization. The temperature and time dependence of microstructure of crystallized amorphous films differ significantly from those obtained for as-deposited nanocrystalline films or nanocrystalline powders. During annealing, quite large crystallites are formed quickly with the preferred orientation (001) that is suppressed with the proceeding time.
UR - http://www.scopus.com/inward/record.url?scp=78649802776&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=78649802776&partnerID=8YFLogxK
U2 - 10.1016/j.tsf.2010.08.122
DO - 10.1016/j.tsf.2010.08.122
M3 - Article
AN - SCOPUS:78649802776
VL - 519
SP - 1649
EP - 1654
JO - Thin Solid Films
JF - Thin Solid Films
SN - 0040-6090
IS - 5
ER -