Hybrid HIPIMS+MFMS power supply for dual magnetron sputtering systems

V. O. Oskirko, A. N. Zakharov, A. P. Pavlov, Solovyev, V. A. Semenov, S. V. Rabotkin

Research output: Contribution to journalArticlepeer-review

Abstract

The paper presents a novel power supply device that provides a hybrid technique of dual magnetron sputtering. This power supply generates a sequence of bipolar pulses which provides both mid-frequency and high-power impulse magnetron sputtering. This allows using the advantages of both techniques, while numerous adjustable parameters considerably enhance the capabilities of the magnetron sputtering system. In the proposed power supply circuit, special attention is paid to the output pulse formers and the power switch control. The experimental results are obtained for superimposed mid-frequency and dual high-power impulse magnetron sputtering. During the aluminum film deposition, the deposition rate, the ion current density on the substrate and the ion-to-atom ratio are regulated by changing the power ratio between mid-frequency and high-power impulse magnetron sputtering.

Original languageEnglish
Article number109670
JournalVacuum
Volume181
DOIs
Publication statusPublished - Nov 2020
Externally publishedYes

Keywords

  • Dual magnetron sputtering
  • High-power impulse magnetron sputtering
  • Mid-frequency magnetron sputtering
  • Superimposed MF and HIPIMS

ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

Fingerprint Dive into the research topics of 'Hybrid HIPIMS+MFMS power supply for dual magnetron sputtering systems'. Together they form a unique fingerprint.

Cite this