Hothersall Memorial Award Lecture 2009

Nano-electrodeposition for hard magnetic layers

P. L. Cavallotti, M. Bestetti, S. Franz, A. Vicenzo

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

Electrocrystallisation must be carefully controlled in order to define a magnetic deposit at a nanolevel. A rational approach to the electrodeposition processes in order to control them is presented, taking into consideration and comparing the electrokinetic behaviour of the elements and the electrodeposit structure, resulting from the electron exchange reaction at the cathodic surface. Transient electrokinetic parameters were obtained with the secondary current pulse technique, where a square galvanostatic pulse of a few microseconds' duration is overimposed on the cathode while electrodeposition is running. Two parameters are measured - the transient Tafel slope and the adsorption pseudocapacitance; while a third parameter, the diffusive time constant, must be introduced if the overvoltage does not arrive at a steady state during the short pulse period. These parameters are related to the growth of different structures; this is important for most deposition processes, in particular for nano-electrodeposition of magnetic layers. Two processes for depositing hard magnetic layers are examined: cellular electrodeposition of Co giving hard layers with high magnetic moment, and electrodeposition of CoPt alloys, with high coercivity even at a relatively high thickness. The interactions between Co and Pt during the deposition process and in the deposited layer are underlined.

Original languageEnglish
Pages (from-to)28-34
Number of pages7
JournalTransactions of the Institute of Metal Finishing
Volume88
Issue number1
DOIs
Publication statusPublished - 1 Jan 2010
Externally publishedYes

Fingerprint

lectures
Electrodeposition
electrodeposition
electrokinetics
pulses
overvoltage
Coercive force
Magnetic moments
time constant
coercivity
Cathodes
Deposits
magnetic moments
cathodes
deposits
slopes
Adsorption
adsorption
Electrons
electrons

Keywords

  • Cobalt
  • COPT
  • COPTW
  • Electrodeposition
  • Hard Magnetic films
  • Micromagnets

ASJC Scopus subject areas

  • Mechanics of Materials
  • Metals and Alloys
  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Hothersall Memorial Award Lecture 2009 : Nano-electrodeposition for hard magnetic layers. / Cavallotti, P. L.; Bestetti, M.; Franz, S.; Vicenzo, A.

In: Transactions of the Institute of Metal Finishing, Vol. 88, No. 1, 01.01.2010, p. 28-34.

Research output: Contribution to journalArticle

@article{f7baff522ca0491482505605f7aa03b3,
title = "Hothersall Memorial Award Lecture 2009: Nano-electrodeposition for hard magnetic layers",
abstract = "Electrocrystallisation must be carefully controlled in order to define a magnetic deposit at a nanolevel. A rational approach to the electrodeposition processes in order to control them is presented, taking into consideration and comparing the electrokinetic behaviour of the elements and the electrodeposit structure, resulting from the electron exchange reaction at the cathodic surface. Transient electrokinetic parameters were obtained with the secondary current pulse technique, where a square galvanostatic pulse of a few microseconds' duration is overimposed on the cathode while electrodeposition is running. Two parameters are measured - the transient Tafel slope and the adsorption pseudocapacitance; while a third parameter, the diffusive time constant, must be introduced if the overvoltage does not arrive at a steady state during the short pulse period. These parameters are related to the growth of different structures; this is important for most deposition processes, in particular for nano-electrodeposition of magnetic layers. Two processes for depositing hard magnetic layers are examined: cellular electrodeposition of Co giving hard layers with high magnetic moment, and electrodeposition of CoPt alloys, with high coercivity even at a relatively high thickness. The interactions between Co and Pt during the deposition process and in the deposited layer are underlined.",
keywords = "Cobalt, COPT, COPTW, Electrodeposition, Hard Magnetic films, Micromagnets",
author = "Cavallotti, {P. L.} and M. Bestetti and S. Franz and A. Vicenzo",
year = "2010",
month = "1",
day = "1",
doi = "10.1179/174591909X12614814030177",
language = "English",
volume = "88",
pages = "28--34",
journal = "Transactions of the Institute of Metal Finishing",
issn = "0020-2967",
publisher = "Maney Publishing",
number = "1",

}

TY - JOUR

T1 - Hothersall Memorial Award Lecture 2009

T2 - Nano-electrodeposition for hard magnetic layers

AU - Cavallotti, P. L.

AU - Bestetti, M.

AU - Franz, S.

AU - Vicenzo, A.

PY - 2010/1/1

Y1 - 2010/1/1

N2 - Electrocrystallisation must be carefully controlled in order to define a magnetic deposit at a nanolevel. A rational approach to the electrodeposition processes in order to control them is presented, taking into consideration and comparing the electrokinetic behaviour of the elements and the electrodeposit structure, resulting from the electron exchange reaction at the cathodic surface. Transient electrokinetic parameters were obtained with the secondary current pulse technique, where a square galvanostatic pulse of a few microseconds' duration is overimposed on the cathode while electrodeposition is running. Two parameters are measured - the transient Tafel slope and the adsorption pseudocapacitance; while a third parameter, the diffusive time constant, must be introduced if the overvoltage does not arrive at a steady state during the short pulse period. These parameters are related to the growth of different structures; this is important for most deposition processes, in particular for nano-electrodeposition of magnetic layers. Two processes for depositing hard magnetic layers are examined: cellular electrodeposition of Co giving hard layers with high magnetic moment, and electrodeposition of CoPt alloys, with high coercivity even at a relatively high thickness. The interactions between Co and Pt during the deposition process and in the deposited layer are underlined.

AB - Electrocrystallisation must be carefully controlled in order to define a magnetic deposit at a nanolevel. A rational approach to the electrodeposition processes in order to control them is presented, taking into consideration and comparing the electrokinetic behaviour of the elements and the electrodeposit structure, resulting from the electron exchange reaction at the cathodic surface. Transient electrokinetic parameters were obtained with the secondary current pulse technique, where a square galvanostatic pulse of a few microseconds' duration is overimposed on the cathode while electrodeposition is running. Two parameters are measured - the transient Tafel slope and the adsorption pseudocapacitance; while a third parameter, the diffusive time constant, must be introduced if the overvoltage does not arrive at a steady state during the short pulse period. These parameters are related to the growth of different structures; this is important for most deposition processes, in particular for nano-electrodeposition of magnetic layers. Two processes for depositing hard magnetic layers are examined: cellular electrodeposition of Co giving hard layers with high magnetic moment, and electrodeposition of CoPt alloys, with high coercivity even at a relatively high thickness. The interactions between Co and Pt during the deposition process and in the deposited layer are underlined.

KW - Cobalt

KW - COPT

KW - COPTW

KW - Electrodeposition

KW - Hard Magnetic films

KW - Micromagnets

UR - http://www.scopus.com/inward/record.url?scp=77955824813&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77955824813&partnerID=8YFLogxK

U2 - 10.1179/174591909X12614814030177

DO - 10.1179/174591909X12614814030177

M3 - Article

VL - 88

SP - 28

EP - 34

JO - Transactions of the Institute of Metal Finishing

JF - Transactions of the Institute of Metal Finishing

SN - 0020-2967

IS - 1

ER -