High-rate reactive deposition of transparent SiO2 films containing low amount of Zr from molten magnetron target

Jindrich Musil, Vaclav Satava, Pavel Baroch

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

The paper reports on a reactive deposition of transparent SiO2 films with a low amount (≤ 3 at.%) of Zr prepared from the molten target using the AC pulsed dual magnetron. It is shown that the deposition rate a D of the transparent oxide film strongly increases at the critical target power density (Wt)cr when the solid target starts to melt and the magnetron operates with a molten target. In this case, the evaporation of target material plays a dominant role in the reactive deposition of thin films. This process is called the ionized magnetron evaporation. Oxide films reactively deposited from the molten target are well transparent and highly elastic. The maximum deposition rate of the transparent oxide film achieved in our experiments is 814 nm/min.

Original languageEnglish
Pages (from-to)775-777
Number of pages3
JournalThin Solid Films
Volume519
Issue number2
DOIs
Publication statusPublished - 1 Nov 2010

Fingerprint

Oxide films
Molten materials
Deposition rates
Evaporation
oxide films
evaporation
Thin films
radiant flux density
alternating current
Experiments
thin films

Keywords

  • Deposition rate
  • Evaporation
  • Molten target
  • Reactive deposition
  • Sputtering
  • Target power density
  • Thin films

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

High-rate reactive deposition of transparent SiO2 films containing low amount of Zr from molten magnetron target. / Musil, Jindrich; Satava, Vaclav; Baroch, Pavel.

In: Thin Solid Films, Vol. 519, No. 2, 01.11.2010, p. 775-777.

Research output: Contribution to journalArticle

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