Abstract
The article reports on low-temperature high-rate sputtering of hydrophilic transparent TiO 2 thin films using dc dual magnetron (DM) sputtering in Ar + O 2 mixture on unheated glass substrates. The DM was operated in a bipolar asymmetric mode and was equipped with Ti(99.5) targets of 50 mm in diameter. The substrate surface temperature T surf measured by a thermostrip was less than 180 °C for all experiments. The effect of the repetition frequency f r was investigated in detail. It was found that the increase of f r from 100 to 350 kHz leads to (a) an improvement of the efficiency of the deposition process that results in a significant increase of the deposition rate a D of sputtered TiO 2 films and (b) a decrease of peak pulse voltage and sustaining of the magnetron discharge at higher target power densities. It was demonstrated that several hundreds nm thick hydrophilic TiO 2 films can be sputtered on unheated glass substrates at a D = 80 nm/min, T surf < 180 °C when high value of f r = 350 kHz was used. Properties of a thin hydrophilic TiO 2 film deposited on a polycarbonate substrate are given.
| Original language | English |
|---|---|
| Pages (from-to) | 123-129 |
| Number of pages | 7 |
| Journal | Nanoscale Research Letters |
| Volume | 2 |
| Issue number | 3 |
| DOIs | |
| Publication status | Published - 1 Mar 2007 |
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Keywords
- Deposition rate
- Dual magnetron sputtering
- Hydrophilicity
- Polycarbonate
- TiO film
- Unheated substrate
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics
Cite this
High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO 2 films : The effect of repetition frequency. / Šícha, J.; Heřman, D.; Musil, J.; Strýhal, Z.; Pavlík, J.
In: Nanoscale Research Letters, Vol. 2, No. 3, 01.03.2007, p. 123-129.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO 2 films
T2 - The effect of repetition frequency
AU - Šícha, J.
AU - Heřman, D.
AU - Musil, J.
AU - Strýhal, Z.
AU - Pavlík, J.
PY - 2007/3/1
Y1 - 2007/3/1
N2 - The article reports on low-temperature high-rate sputtering of hydrophilic transparent TiO 2 thin films using dc dual magnetron (DM) sputtering in Ar + O 2 mixture on unheated glass substrates. The DM was operated in a bipolar asymmetric mode and was equipped with Ti(99.5) targets of 50 mm in diameter. The substrate surface temperature T surf measured by a thermostrip was less than 180 °C for all experiments. The effect of the repetition frequency f r was investigated in detail. It was found that the increase of f r from 100 to 350 kHz leads to (a) an improvement of the efficiency of the deposition process that results in a significant increase of the deposition rate a D of sputtered TiO 2 films and (b) a decrease of peak pulse voltage and sustaining of the magnetron discharge at higher target power densities. It was demonstrated that several hundreds nm thick hydrophilic TiO 2 films can be sputtered on unheated glass substrates at a D = 80 nm/min, T surf < 180 °C when high value of f r = 350 kHz was used. Properties of a thin hydrophilic TiO 2 film deposited on a polycarbonate substrate are given.
AB - The article reports on low-temperature high-rate sputtering of hydrophilic transparent TiO 2 thin films using dc dual magnetron (DM) sputtering in Ar + O 2 mixture on unheated glass substrates. The DM was operated in a bipolar asymmetric mode and was equipped with Ti(99.5) targets of 50 mm in diameter. The substrate surface temperature T surf measured by a thermostrip was less than 180 °C for all experiments. The effect of the repetition frequency f r was investigated in detail. It was found that the increase of f r from 100 to 350 kHz leads to (a) an improvement of the efficiency of the deposition process that results in a significant increase of the deposition rate a D of sputtered TiO 2 films and (b) a decrease of peak pulse voltage and sustaining of the magnetron discharge at higher target power densities. It was demonstrated that several hundreds nm thick hydrophilic TiO 2 films can be sputtered on unheated glass substrates at a D = 80 nm/min, T surf < 180 °C when high value of f r = 350 kHz was used. Properties of a thin hydrophilic TiO 2 film deposited on a polycarbonate substrate are given.
KW - Deposition rate
KW - Dual magnetron sputtering
KW - Hydrophilicity
KW - Polycarbonate
KW - TiO film
KW - Unheated substrate
UR - http://www.scopus.com/inward/record.url?scp=33947509524&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=33947509524&partnerID=8YFLogxK
U2 - 10.1007/s11671-007-9042-z
DO - 10.1007/s11671-007-9042-z
M3 - Article
VL - 2
SP - 123
EP - 129
JO - Nanoscale Research Letters
JF - Nanoscale Research Letters
SN - 1931-7573
IS - 3
ER -