Abstract
The article reports on low-temperature high-rate sputtering of hydrophilic transparent TiO 2 thin films using dc dual magnetron (DM) sputtering in Ar + O 2 mixture on unheated glass substrates. The DM was operated in a bipolar asymmetric mode and was equipped with Ti(99.5) targets of 50 mm in diameter. The substrate surface temperature T surf measured by a thermostrip was less than 180 °C for all experiments. The effect of the repetition frequency f r was investigated in detail. It was found that the increase of f r from 100 to 350 kHz leads to (a) an improvement of the efficiency of the deposition process that results in a significant increase of the deposition rate a D of sputtered TiO 2 films and (b) a decrease of peak pulse voltage and sustaining of the magnetron discharge at higher target power densities. It was demonstrated that several hundreds nm thick hydrophilic TiO 2 films can be sputtered on unheated glass substrates at a D = 80 nm/min, T surf < 180 °C when high value of f r = 350 kHz was used. Properties of a thin hydrophilic TiO 2 film deposited on a polycarbonate substrate are given.
Original language | English |
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Pages (from-to) | 123-129 |
Number of pages | 7 |
Journal | Nanoscale Research Letters |
Volume | 2 |
Issue number | 3 |
DOIs | |
Publication status | Published - 1 Mar 2007 |
Keywords
- Deposition rate
- Dual magnetron sputtering
- Hydrophilicity
- Polycarbonate
- TiO film
- Unheated substrate
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics