High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO 2 films: The effect of repetition frequency

J. Šícha, D. Heřman, J. Musil, Z. Strýhal, J. Pavlík

Research output: Contribution to journalArticle

22 Citations (Scopus)

Abstract

The article reports on low-temperature high-rate sputtering of hydrophilic transparent TiO 2 thin films using dc dual magnetron (DM) sputtering in Ar + O 2 mixture on unheated glass substrates. The DM was operated in a bipolar asymmetric mode and was equipped with Ti(99.5) targets of 50 mm in diameter. The substrate surface temperature T surf measured by a thermostrip was less than 180 °C for all experiments. The effect of the repetition frequency f r was investigated in detail. It was found that the increase of f r from 100 to 350 kHz leads to (a) an improvement of the efficiency of the deposition process that results in a significant increase of the deposition rate a D of sputtered TiO 2 films and (b) a decrease of peak pulse voltage and sustaining of the magnetron discharge at higher target power densities. It was demonstrated that several hundreds nm thick hydrophilic TiO 2 films can be sputtered on unheated glass substrates at a D = 80 nm/min, T surf < 180 °C when high value of f r = 350 kHz was used. Properties of a thin hydrophilic TiO 2 film deposited on a polycarbonate substrate are given.

Original languageEnglish
Pages (from-to)123-129
Number of pages7
JournalNanoscale Research Letters
Volume2
Issue number3
DOIs
Publication statusPublished - 1 Mar 2007

Keywords

  • Deposition rate
  • Dual magnetron sputtering
  • Hydrophilicity
  • Polycarbonate
  • TiO film
  • Unheated substrate

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics

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