Abstract
The results on the deposition of thin elemental and compound films by means of a high-power ion beam are presented. The TEMP accelerator (an ion energy of 300 keV, a current density of 100-150 A/cm 2 on a target, a pulse repetition rate of 0.3 Hz, a vacuum of 10 4 Torr) was used. The thin metallic (Cd, Zn and other) and stoichiometric Y 1-Ba 2-Cu 3-O 7-x films were obtained. The film growth rate was (0.3-1)·10 8 Å/s. The results show (i) the metallic films were continuous with very smooth surface morphology when they were examined by scanning electron microscopy, and (ii) transmission electron diffraction and transmission electron microscopy indicated small grain polycrystalline metallic films, and (iii) by Rutherford backward scattering and Auger electron spectroscopy it is shown that the stoichiometric Y 1-Ba 2-Cu 3-O 7-x films can be deposited at relatively low substrate temperature 300-450C.
| Original language | English |
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| Title of host publication | Beams 92 - Proceedings of the 9th International Conference on High-Power Particle Beams |
| Pages | 1966-1970 |
| Number of pages | 5 |
| Volume | 3 |
| Publication status | Published - 1992 |
| Event | 9th International Conference on High-Power Particle Beams, Beams 92 - Washington, DC, United States Duration: 25 May 2092 → 29 May 2092 |
Other
| Other | 9th International Conference on High-Power Particle Beams, Beams 92 |
|---|---|
| Country | United States |
| City | Washington, DC |
| Period | 25.5.92 → 29.5.92 |
ASJC Scopus subject areas
- Nuclear and High Energy Physics