High-rate deposition of thin films by high-intensity pulsed ion beam evaporation

Abstract

A high-intensity ion beam (500 keV, current density 60-200 A/cm ², power density (0.25-1)·10 ⁸ W/cm ², pulse duration 60 ns, pulse repetition rate 4-6 min ^-1) was used to deposit thin metal and carbon films by evaporation of respective targets. The instantaneous deposition rate was 0.6-5 mm/s. The films were examined using transmission electron microscopy and transmission electron diffraction. The metal films had a polycrystalline structure with the grains measuring from 20 to 100 nm, the lower the melting point the greater the grain size. The carbon films contained 25-125 nm diamonds. The ablation plasma was studied employing methods of pulsed spectroscopy.

Original language	English
Title of host publication	Materials Research Society Symposium - Proceedings
Publisher	Materials Research Society
Pages	317-322
Number of pages	6
Volume	388
Publication status	Published - 1995
Event	Proceedings of the 1995 MRS Spring Meeting - San Francisco, CA, USA Duration: 17 Apr 1995 → 21 Apr 1995

Other

Other	Proceedings of the 1995 MRS Spring Meeting
City	San Francisco, CA, USA
Period	17.4.95 → 21.4.95

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials

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High-rate deposition of thin films by high-intensity pulsed ion beam evaporation. / Zakoutayev, A. N.; Remnev, G. E.; Ivanov, Yu F.; Arteyev, M. S.; Matvienko, V. M.; Potyomkin, A. V.

Materials Research Society Symposium - Proceedings. Vol. 388 Materials Research Society, 1995. p. 317-322.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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title = "High-rate deposition of thin films by high-intensity pulsed ion beam evaporation",

abstract = "A high-intensity ion beam (500 keV, current density 60-200 A/cm 2, power density (0.25-1)·10 8 W/cm 2, pulse duration 60 ns, pulse repetition rate 4-6 min -1) was used to deposit thin metal and carbon films by evaporation of respective targets. The instantaneous deposition rate was 0.6-5 mm/s. The films were examined using transmission electron microscopy and transmission electron diffraction. The metal films had a polycrystalline structure with the grains measuring from 20 to 100 nm, the lower the melting point the greater the grain size. The carbon films contained 25-125 nm diamonds. The ablation plasma was studied employing methods of pulsed spectroscopy. ",

author = "Zakoutayev, {A. N.} and Remnev, {G. E.} and Ivanov, {Yu F.} and Arteyev, {M. S.} and Matvienko, {V. M.} and Potyomkin, {A. V.}",

year = "1995",

language = "English",

volume = "388",

pages = "317--322",

booktitle = "Materials Research Society Symposium - Proceedings",

publisher = "Materials Research Society",

note = "Proceedings of the 1995 MRS Spring Meeting ; Conference date: 17-04-1995 Through 21-04-1995",

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TY - GEN

T1 - High-rate deposition of thin films by high-intensity pulsed ion beam evaporation

AU - Zakoutayev, A. N.

AU - Remnev, G. E.

AU - Ivanov, Yu F.

AU - Arteyev, M. S.

AU - Matvienko, V. M.

AU - Potyomkin, A. V.

PY - 1995

Y1 - 1995

N2 - A high-intensity ion beam (500 keV, current density 60-200 A/cm 2, power density (0.25-1)·10 8 W/cm 2, pulse duration 60 ns, pulse repetition rate 4-6 min -1) was used to deposit thin metal and carbon films by evaporation of respective targets. The instantaneous deposition rate was 0.6-5 mm/s. The films were examined using transmission electron microscopy and transmission electron diffraction. The metal films had a polycrystalline structure with the grains measuring from 20 to 100 nm, the lower the melting point the greater the grain size. The carbon films contained 25-125 nm diamonds. The ablation plasma was studied employing methods of pulsed spectroscopy.

AB - A high-intensity ion beam (500 keV, current density 60-200 A/cm 2, power density (0.25-1)·10 8 W/cm 2, pulse duration 60 ns, pulse repetition rate 4-6 min -1) was used to deposit thin metal and carbon films by evaporation of respective targets. The instantaneous deposition rate was 0.6-5 mm/s. The films were examined using transmission electron microscopy and transmission electron diffraction. The metal films had a polycrystalline structure with the grains measuring from 20 to 100 nm, the lower the melting point the greater the grain size. The carbon films contained 25-125 nm diamonds. The ablation plasma was studied employing methods of pulsed spectroscopy.

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M3 - Conference contribution

AN - SCOPUS:0029530209

VL - 388

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EP - 322

BT - Materials Research Society Symposium - Proceedings

PB - Materials Research Society

T2 - Proceedings of the 1995 MRS Spring Meeting

Y2 - 17 April 1995 through 21 April 1995

ER -