High-rate deposition of thin films by high-intensity pulsed ion beam evaporation

A. N. Zakoutayev, G. E. Remnev, Yu F. Ivanov, M. S. Arteyev, V. M. Matvienko, A. V. Potyomkin

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

A high-intensity ion beam (500 keV, current density 60-200 A/cm 2, power density (0.25-1)·10 8 W/cm 2, pulse duration 60 ns, pulse repetition rate 4-6 min -1) was used to deposit thin metal and carbon films by evaporation of respective targets. The instantaneous deposition rate was 0.6-5 mm/s. The films were examined using transmission electron microscopy and transmission electron diffraction. The metal films had a polycrystalline structure with the grains measuring from 20 to 100 nm, the lower the melting point the greater the grain size. The carbon films contained 25-125 nm diamonds. The ablation plasma was studied employing methods of pulsed spectroscopy.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium - Proceedings
PublisherMaterials Research Society
Pages317-322
Number of pages6
Volume388
Publication statusPublished - 1995
EventProceedings of the 1995 MRS Spring Meeting - San Francisco, CA, USA
Duration: 17 Apr 199521 Apr 1995

Other

OtherProceedings of the 1995 MRS Spring Meeting
CitySan Francisco, CA, USA
Period17.4.9521.4.95

Fingerprint

Carbon films
Deposition rates
Ion beams
Evaporation
Metals
Thin films
Pulse repetition rate
Diamond
Ablation
Electron diffraction
Melting point
Laser pulses
Diamonds
Current density
Deposits
Spectroscopy
Transmission electron microscopy
Plasmas

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Zakoutayev, A. N., Remnev, G. E., Ivanov, Y. F., Arteyev, M. S., Matvienko, V. M., & Potyomkin, A. V. (1995). High-rate deposition of thin films by high-intensity pulsed ion beam evaporation. In Materials Research Society Symposium - Proceedings (Vol. 388, pp. 317-322). Materials Research Society.

High-rate deposition of thin films by high-intensity pulsed ion beam evaporation. / Zakoutayev, A. N.; Remnev, G. E.; Ivanov, Yu F.; Arteyev, M. S.; Matvienko, V. M.; Potyomkin, A. V.

Materials Research Society Symposium - Proceedings. Vol. 388 Materials Research Society, 1995. p. 317-322.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Zakoutayev, AN, Remnev, GE, Ivanov, YF, Arteyev, MS, Matvienko, VM & Potyomkin, AV 1995, High-rate deposition of thin films by high-intensity pulsed ion beam evaporation. in Materials Research Society Symposium - Proceedings. vol. 388, Materials Research Society, pp. 317-322, Proceedings of the 1995 MRS Spring Meeting, San Francisco, CA, USA, 17.4.95.
Zakoutayev AN, Remnev GE, Ivanov YF, Arteyev MS, Matvienko VM, Potyomkin AV. High-rate deposition of thin films by high-intensity pulsed ion beam evaporation. In Materials Research Society Symposium - Proceedings. Vol. 388. Materials Research Society. 1995. p. 317-322
Zakoutayev, A. N. ; Remnev, G. E. ; Ivanov, Yu F. ; Arteyev, M. S. ; Matvienko, V. M. ; Potyomkin, A. V. / High-rate deposition of thin films by high-intensity pulsed ion beam evaporation. Materials Research Society Symposium - Proceedings. Vol. 388 Materials Research Society, 1995. pp. 317-322
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