High intensity pulsed ion beam sources and their industrial applications

G. E. Remnev, I. F. Isakov, M. S. Opekounov, V. M. Matvienko, V. A. Ryzhkov, V. K. Struts, I. I. Grushin, A. N. Zakoutayev, A. V. Potyomkin, Vladislav Alexandrovich Tarbokov, A. N. Pushkaryov, V. L. Kutuzov, M. Yu Ovsyannikov

Research output: Contribution to journalArticlepeer-review

147 Citations (Scopus)


This paper presents research on practical applications of high intensity pulsed ion beams (HIPIBs) investigated at the Nuclear Physics Institute of the Tomsk Polytechnic University (NPI TPU) and the Scientific Industrial Enterprise 'Linetron', N. Novgorod. The most interesting scientific results have been obtained in the following fields: HIPIB surface modification for the increase of wear resistance of tools; deposition of thin metal, composite and diamond-like carbon (DLC) films; short-pulse ion implantation in semiconductors. It was shown that ion beams with relatively low power density (106-109W/cm2) are very promising for industrial applications. The paper presents a brief description of the HIPIB-solids interaction and main HIPIB parameters used in the research, as well as modification of properties of treated samples.

Original languageEnglish
Pages (from-to)206-212
Number of pages7
JournalSurface and Coatings Technology
Issue number2-3
Publication statusPublished - 12 May 1999


  • Deposition
  • High intensity pulsed ion beams
  • Ion implantation
  • Semiconductors
  • Surface modification
  • Thin films
  • Wear resistance

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

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