High Intensity low Aluminum Ion Energy Implantation into Titanium

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This study describes the possibility of ultra-high dose aluminum ion implantation for surface modification of titanium. The DC vacuum arc source was used to produce dense metal plasma. Plasma immersion aluminum ions extraction and their ballistic focusing in equipotential space of negatively biased hemispherical electrode was used to obtain high intensity aluminum ion beam with the maximum amplitude of 1 A at the ion current density up to hundreds of mA/cm2. The original filtration system was used to prevent the deposition of vacuum arc aluminum macroparticles onto the irradiation area of titanium sample. Aluminum low energy ions (ion energy E < 10 keV) were implanted into titanium with the doses reaching 1021 ion/cm2. The effect of ion current density, implantation dose and substrate temperature on the phase composition, microstructure and distribution of elements was studied by X-ray diffraction, scanning electron microscopy and glow-discharge optical emission spectroscopy, respectively. The results show the appearance of Ti3Al intermetallic phase after Al implantation. The depth of aluminum penetration into titanium increases with the implantation dose and multiply exceeds the projected ranges of ions of given energies.

Original languageEnglish
Title of host publication2018 22nd International Conference on Ion Implantation Technology, IIT 2018 - Proceedings
EditorsVolker Haublein, Heiner Ryssel
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages364-367
Number of pages4
ISBN (Electronic)9781538668283
DOIs
Publication statusPublished - Sep 2018
Event22nd International Conference on Ion Implantation Technology, IIT 2018 - Wurzburg, Germany
Duration: 16 Sep 201821 Sep 2018

Publication series

NameProceedings of the International Conference on Ion Implantation Technology
Volume2018-September

Conference

Conference22nd International Conference on Ion Implantation Technology, IIT 2018
CountryGermany
CityWurzburg
Period16.9.1821.9.18

Keywords

  • aluminum
  • high intensity implantation
  • intermetallic phases
  • low energy ions

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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  • Cite this

    Ryabchikov, A., Shevelev, A., Sivin, D., Kashkarov, E., Bozhko, I., & Stepanov, I. (2018). High Intensity low Aluminum Ion Energy Implantation into Titanium. In V. Haublein, & H. Ryssel (Eds.), 2018 22nd International Conference on Ion Implantation Technology, IIT 2018 - Proceedings (pp. 364-367). [8807970] (Proceedings of the International Conference on Ion Implantation Technology; Vol. 2018-September). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IIT.2018.8807970