TY - GEN
T1 - High Intensity low Aluminum Ion Energy Implantation into Titanium
AU - Ryabchikov, Alexander
AU - Shevelev, Alexey
AU - Sivin, Denis
AU - Kashkarov, Egor
AU - Bozhko, Irina
AU - Stepanov, Igor
PY - 2018/9
Y1 - 2018/9
N2 - This study describes the possibility of ultra-high dose aluminum ion implantation for surface modification of titanium. The DC vacuum arc source was used to produce dense metal plasma. Plasma immersion aluminum ions extraction and their ballistic focusing in equipotential space of negatively biased hemispherical electrode was used to obtain high intensity aluminum ion beam with the maximum amplitude of 1 A at the ion current density up to hundreds of mA/cm2. The original filtration system was used to prevent the deposition of vacuum arc aluminum macroparticles onto the irradiation area of titanium sample. Aluminum low energy ions (ion energy E < 10 keV) were implanted into titanium with the doses reaching 1021 ion/cm2. The effect of ion current density, implantation dose and substrate temperature on the phase composition, microstructure and distribution of elements was studied by X-ray diffraction, scanning electron microscopy and glow-discharge optical emission spectroscopy, respectively. The results show the appearance of Ti3Al intermetallic phase after Al implantation. The depth of aluminum penetration into titanium increases with the implantation dose and multiply exceeds the projected ranges of ions of given energies.
AB - This study describes the possibility of ultra-high dose aluminum ion implantation for surface modification of titanium. The DC vacuum arc source was used to produce dense metal plasma. Plasma immersion aluminum ions extraction and their ballistic focusing in equipotential space of negatively biased hemispherical electrode was used to obtain high intensity aluminum ion beam with the maximum amplitude of 1 A at the ion current density up to hundreds of mA/cm2. The original filtration system was used to prevent the deposition of vacuum arc aluminum macroparticles onto the irradiation area of titanium sample. Aluminum low energy ions (ion energy E < 10 keV) were implanted into titanium with the doses reaching 1021 ion/cm2. The effect of ion current density, implantation dose and substrate temperature on the phase composition, microstructure and distribution of elements was studied by X-ray diffraction, scanning electron microscopy and glow-discharge optical emission spectroscopy, respectively. The results show the appearance of Ti3Al intermetallic phase after Al implantation. The depth of aluminum penetration into titanium increases with the implantation dose and multiply exceeds the projected ranges of ions of given energies.
KW - aluminum
KW - high intensity implantation
KW - intermetallic phases
KW - low energy ions
UR - http://www.scopus.com/inward/record.url?scp=85071920197&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85071920197&partnerID=8YFLogxK
U2 - 10.1109/IIT.2018.8807970
DO - 10.1109/IIT.2018.8807970
M3 - Conference contribution
AN - SCOPUS:85071920197
T3 - Proceedings of the International Conference on Ion Implantation Technology
SP - 364
EP - 367
BT - 2018 22nd International Conference on Ion Implantation Technology, IIT 2018 - Proceedings
A2 - Haublein, Volker
A2 - Ryssel, Heiner
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 22nd International Conference on Ion Implantation Technology, IIT 2018
Y2 - 16 September 2018 through 21 September 2018
ER -