High frequency short-pulsed plasma-immersion ion implantation or deposition (HFSPPI3D)

A. I. Ryabchikov, I. A. Ryabchikov, I. B. Stepanov

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

An innovative concept in the development of advanced coating deposition and ion implantation method including an application of filtered dc metal plasma and high-frequency short-pulsed negative bias voltage with a duty factor in the range of 10-99% is considered. The systematics of metal ion implantation and metal plasma deposition for conducting and insulating materials were investigated. Experimentally, it has been shown that metal plasma based ion implantation as well as high-concentration metal plasma ion implantation with compensation of ion surface sputtering by metal plasma deposition, as well as ion-assisted coating deposition, can be realized by a variation of bias potential ranging from 0-4 · 103 V, pulse repetition rate smoothly adjusted in the range 2-4.4 · 105 pps and pulse duration ranging from 0.5 to 2 μs. Special features of the material treatment method depending on sample conductivity and thickness, plasma concentration, pulse repetition rate and amplitude and duty factor have been examined. The measurements of the resulting adhesion strength, microhardness investigations of the Ti coatings on the stainless steel and glass-ceramic substrates are presented.

Original languageEnglish
Pages (from-to)8610-8614
Number of pages5
JournalSurface and Coatings Technology
Volume201
Issue number19-20 SPEC. ISS.
DOIs
Publication statusPublished - 5 Aug 2007

Fingerprint

Ion implantation
submerging
ion implantation
Metals
Plasmas
Plasma deposition
Pulse repetition rate
metals
pulse repetition rate
coatings
Coatings
Ions
Insulating materials
Bond strength (materials)
Stainless Steel
Glass ceramics
plasma frequencies
Bias voltage
insulation
Microhardness

Keywords

  • Duty factor
  • Metal plasma
  • Short-pulsed

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

High frequency short-pulsed plasma-immersion ion implantation or deposition (HFSPPI3D). / Ryabchikov, A. I.; Ryabchikov, I. A.; Stepanov, I. B.

In: Surface and Coatings Technology, Vol. 201, No. 19-20 SPEC. ISS., 05.08.2007, p. 8610-8614.

Research output: Contribution to journalArticle

@article{5b07791100ac4c87bebbc7b3963ca183,
title = "High frequency short-pulsed plasma-immersion ion implantation or deposition (HFSPPI3D)",
abstract = "An innovative concept in the development of advanced coating deposition and ion implantation method including an application of filtered dc metal plasma and high-frequency short-pulsed negative bias voltage with a duty factor in the range of 10-99{\%} is considered. The systematics of metal ion implantation and metal plasma deposition for conducting and insulating materials were investigated. Experimentally, it has been shown that metal plasma based ion implantation as well as high-concentration metal plasma ion implantation with compensation of ion surface sputtering by metal plasma deposition, as well as ion-assisted coating deposition, can be realized by a variation of bias potential ranging from 0-4 · 103 V, pulse repetition rate smoothly adjusted in the range 2-4.4 · 105 pps and pulse duration ranging from 0.5 to 2 μs. Special features of the material treatment method depending on sample conductivity and thickness, plasma concentration, pulse repetition rate and amplitude and duty factor have been examined. The measurements of the resulting adhesion strength, microhardness investigations of the Ti coatings on the stainless steel and glass-ceramic substrates are presented.",
keywords = "Duty factor, Metal plasma, Short-pulsed",
author = "Ryabchikov, {A. I.} and Ryabchikov, {I. A.} and Stepanov, {I. B.}",
year = "2007",
month = "8",
day = "5",
doi = "10.1016/j.surfcoat.2006.09.321",
language = "English",
volume = "201",
pages = "8610--8614",
journal = "Surface and Coatings Technology",
issn = "0257-8972",
publisher = "Elsevier",
number = "19-20 SPEC. ISS.",

}

TY - JOUR

T1 - High frequency short-pulsed plasma-immersion ion implantation or deposition (HFSPPI3D)

AU - Ryabchikov, A. I.

AU - Ryabchikov, I. A.

AU - Stepanov, I. B.

PY - 2007/8/5

Y1 - 2007/8/5

N2 - An innovative concept in the development of advanced coating deposition and ion implantation method including an application of filtered dc metal plasma and high-frequency short-pulsed negative bias voltage with a duty factor in the range of 10-99% is considered. The systematics of metal ion implantation and metal plasma deposition for conducting and insulating materials were investigated. Experimentally, it has been shown that metal plasma based ion implantation as well as high-concentration metal plasma ion implantation with compensation of ion surface sputtering by metal plasma deposition, as well as ion-assisted coating deposition, can be realized by a variation of bias potential ranging from 0-4 · 103 V, pulse repetition rate smoothly adjusted in the range 2-4.4 · 105 pps and pulse duration ranging from 0.5 to 2 μs. Special features of the material treatment method depending on sample conductivity and thickness, plasma concentration, pulse repetition rate and amplitude and duty factor have been examined. The measurements of the resulting adhesion strength, microhardness investigations of the Ti coatings on the stainless steel and glass-ceramic substrates are presented.

AB - An innovative concept in the development of advanced coating deposition and ion implantation method including an application of filtered dc metal plasma and high-frequency short-pulsed negative bias voltage with a duty factor in the range of 10-99% is considered. The systematics of metal ion implantation and metal plasma deposition for conducting and insulating materials were investigated. Experimentally, it has been shown that metal plasma based ion implantation as well as high-concentration metal plasma ion implantation with compensation of ion surface sputtering by metal plasma deposition, as well as ion-assisted coating deposition, can be realized by a variation of bias potential ranging from 0-4 · 103 V, pulse repetition rate smoothly adjusted in the range 2-4.4 · 105 pps and pulse duration ranging from 0.5 to 2 μs. Special features of the material treatment method depending on sample conductivity and thickness, plasma concentration, pulse repetition rate and amplitude and duty factor have been examined. The measurements of the resulting adhesion strength, microhardness investigations of the Ti coatings on the stainless steel and glass-ceramic substrates are presented.

KW - Duty factor

KW - Metal plasma

KW - Short-pulsed

UR - http://www.scopus.com/inward/record.url?scp=34447517553&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=34447517553&partnerID=8YFLogxK

U2 - 10.1016/j.surfcoat.2006.09.321

DO - 10.1016/j.surfcoat.2006.09.321

M3 - Article

AN - SCOPUS:34447517553

VL - 201

SP - 8610

EP - 8614

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

IS - 19-20 SPEC. ISS.

ER -