High-frequency short-pulsed metal plasma-immersion ion implantation or deposition using filtered DC vacuum-arc plasma

Research output: Contribution to journalArticle

29 Citations (Scopus)

Abstract

A new approach to the development of advanced coating deposition and ion implantation method including an application of filtered dc metal plasma and high-frequency short-pulsed negative bias voltage with a duty factor in the range of 10-99% are considered. The ion energy spectrum for different negative bias potential pulse durations (120-1100 ns) was measured. The chart of various methods of ion beam and plasma material treatment using high-frequency short pulse metal plasma immersion ion implantation or deposition depending on bias pulse duty factor and amplitude for Cu plasma is presented. The ion assisted coating deposition has been examined depending on samples conductivity and thickness, plasma concentration, pulse repetition rate, amplitude, and duty factor.

Original languageEnglish
Pages (from-to)6523-6525
Number of pages3
JournalSurface and Coatings Technology
Volume201
Issue number15
DOIs
Publication statusPublished - 23 Apr 2007

Fingerprint

Ion implantation
plasma jets
submerging
ion implantation
Metals
direct current
Vacuum
Plasmas
vacuum
metals
coatings
pulse repetition rate
Ions
plasma frequencies
charts
pulses
Pulse repetition rate
Coatings
implantation
Bias voltage

Keywords

  • Duty factor
  • Metal plasma
  • Short-pulsed

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

@article{33eb41d86c8c4819b58b23609f89661c,
title = "High-frequency short-pulsed metal plasma-immersion ion implantation or deposition using filtered DC vacuum-arc plasma",
abstract = "A new approach to the development of advanced coating deposition and ion implantation method including an application of filtered dc metal plasma and high-frequency short-pulsed negative bias voltage with a duty factor in the range of 10-99{\%} are considered. The ion energy spectrum for different negative bias potential pulse durations (120-1100 ns) was measured. The chart of various methods of ion beam and plasma material treatment using high-frequency short pulse metal plasma immersion ion implantation or deposition depending on bias pulse duty factor and amplitude for Cu plasma is presented. The ion assisted coating deposition has been examined depending on samples conductivity and thickness, plasma concentration, pulse repetition rate, amplitude, and duty factor.",
keywords = "Duty factor, Metal plasma, Short-pulsed",
author = "Ryabchikov, {A. I.} and Ryabchikov, {I. A.} and Stepanov, {I. B.} and Yury Petrovich Usov",
year = "2007",
month = "4",
day = "23",
doi = "10.1016/j.surfcoat.2006.09.053",
language = "English",
volume = "201",
pages = "6523--6525",
journal = "Surface and Coatings Technology",
issn = "0257-8972",
publisher = "Elsevier",
number = "15",

}

TY - JOUR

T1 - High-frequency short-pulsed metal plasma-immersion ion implantation or deposition using filtered DC vacuum-arc plasma

AU - Ryabchikov, A. I.

AU - Ryabchikov, I. A.

AU - Stepanov, I. B.

AU - Usov, Yury Petrovich

PY - 2007/4/23

Y1 - 2007/4/23

N2 - A new approach to the development of advanced coating deposition and ion implantation method including an application of filtered dc metal plasma and high-frequency short-pulsed negative bias voltage with a duty factor in the range of 10-99% are considered. The ion energy spectrum for different negative bias potential pulse durations (120-1100 ns) was measured. The chart of various methods of ion beam and plasma material treatment using high-frequency short pulse metal plasma immersion ion implantation or deposition depending on bias pulse duty factor and amplitude for Cu plasma is presented. The ion assisted coating deposition has been examined depending on samples conductivity and thickness, plasma concentration, pulse repetition rate, amplitude, and duty factor.

AB - A new approach to the development of advanced coating deposition and ion implantation method including an application of filtered dc metal plasma and high-frequency short-pulsed negative bias voltage with a duty factor in the range of 10-99% are considered. The ion energy spectrum for different negative bias potential pulse durations (120-1100 ns) was measured. The chart of various methods of ion beam and plasma material treatment using high-frequency short pulse metal plasma immersion ion implantation or deposition depending on bias pulse duty factor and amplitude for Cu plasma is presented. The ion assisted coating deposition has been examined depending on samples conductivity and thickness, plasma concentration, pulse repetition rate, amplitude, and duty factor.

KW - Duty factor

KW - Metal plasma

KW - Short-pulsed

UR - http://www.scopus.com/inward/record.url?scp=33847650546&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33847650546&partnerID=8YFLogxK

U2 - 10.1016/j.surfcoat.2006.09.053

DO - 10.1016/j.surfcoat.2006.09.053

M3 - Article

AN - SCOPUS:33847650546

VL - 201

SP - 6523

EP - 6525

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

IS - 15

ER -