Growth of magnetron sputtered TiO2 thin films studied by X-ray scattering

R. Kužel, L. Nichtová, D. Heřman, J. Šícha, J. Musil

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

Two sets of nanocrystalline TiO2 thin films magnetron deposited on glass and silicon substrates have been studied by X-ray scattering and measurements of contact angle of water drop on the film surface. Phase analysis and X-ray line broadening were studied by X-ray powder diffraction in parallel beam optics, the residual stresses were measured with the aid of the Eulerian cradle and surface roughness determined by X-ray reflectivity measurement. By both thickness dependence of XRD patterns and depth profiling mesurements it was found that rutile growths on the substrate and it is transformed to anatase with increasing distance from the substrate.

Original languageEnglish
Pages (from-to)241-246
Number of pages6
JournalZeitschrift fur Kristallographie, Supplement
Volume2
Issue number26
Publication statusPublished - 1 Dec 2007

Fingerprint

X ray scattering
Thin films
Substrates
thin films
scattering
X rays
x rays
Depth profiling
Silicon
X ray powder diffraction
Titanium dioxide
Contact angle
Residual stresses
Optics
Surface roughness
anatase
rutile
residual stress
Glass
surface roughness

Keywords

  • Thin film growth
  • Thin films
  • Titanium oxide
  • X-ray diffraction

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Inorganic Chemistry

Cite this

Growth of magnetron sputtered TiO2 thin films studied by X-ray scattering. / Kužel, R.; Nichtová, L.; Heřman, D.; Šícha, J.; Musil, J.

In: Zeitschrift fur Kristallographie, Supplement, Vol. 2, No. 26, 01.12.2007, p. 241-246.

Research output: Contribution to journalArticle

Kužel, R, Nichtová, L, Heřman, D, Šícha, J & Musil, J 2007, 'Growth of magnetron sputtered TiO2 thin films studied by X-ray scattering', Zeitschrift fur Kristallographie, Supplement, vol. 2, no. 26, pp. 241-246.
Kužel, R. ; Nichtová, L. ; Heřman, D. ; Šícha, J. ; Musil, J. / Growth of magnetron sputtered TiO2 thin films studied by X-ray scattering. In: Zeitschrift fur Kristallographie, Supplement. 2007 ; Vol. 2, No. 26. pp. 241-246.
@article{ec4cb49c0bac435296301438d9d8ea5f,
title = "Growth of magnetron sputtered TiO2 thin films studied by X-ray scattering",
abstract = "Two sets of nanocrystalline TiO2 thin films magnetron deposited on glass and silicon substrates have been studied by X-ray scattering and measurements of contact angle of water drop on the film surface. Phase analysis and X-ray line broadening were studied by X-ray powder diffraction in parallel beam optics, the residual stresses were measured with the aid of the Eulerian cradle and surface roughness determined by X-ray reflectivity measurement. By both thickness dependence of XRD patterns and depth profiling mesurements it was found that rutile growths on the substrate and it is transformed to anatase with increasing distance from the substrate.",
keywords = "Thin film growth, Thin films, Titanium oxide, X-ray diffraction",
author = "R. Kužel and L. Nichtov{\'a} and D. Heřman and J. Š{\'i}cha and J. Musil",
year = "2007",
month = "12",
day = "1",
language = "English",
volume = "2",
pages = "241--246",
journal = "Zeitschrift fur Kristallographie, Supplement",
issn = "0930-486X",
publisher = "R. Oldenbourg",
number = "26",

}

TY - JOUR

T1 - Growth of magnetron sputtered TiO2 thin films studied by X-ray scattering

AU - Kužel, R.

AU - Nichtová, L.

AU - Heřman, D.

AU - Šícha, J.

AU - Musil, J.

PY - 2007/12/1

Y1 - 2007/12/1

N2 - Two sets of nanocrystalline TiO2 thin films magnetron deposited on glass and silicon substrates have been studied by X-ray scattering and measurements of contact angle of water drop on the film surface. Phase analysis and X-ray line broadening were studied by X-ray powder diffraction in parallel beam optics, the residual stresses were measured with the aid of the Eulerian cradle and surface roughness determined by X-ray reflectivity measurement. By both thickness dependence of XRD patterns and depth profiling mesurements it was found that rutile growths on the substrate and it is transformed to anatase with increasing distance from the substrate.

AB - Two sets of nanocrystalline TiO2 thin films magnetron deposited on glass and silicon substrates have been studied by X-ray scattering and measurements of contact angle of water drop on the film surface. Phase analysis and X-ray line broadening were studied by X-ray powder diffraction in parallel beam optics, the residual stresses were measured with the aid of the Eulerian cradle and surface roughness determined by X-ray reflectivity measurement. By both thickness dependence of XRD patterns and depth profiling mesurements it was found that rutile growths on the substrate and it is transformed to anatase with increasing distance from the substrate.

KW - Thin film growth

KW - Thin films

KW - Titanium oxide

KW - X-ray diffraction

UR - http://www.scopus.com/inward/record.url?scp=54849432292&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=54849432292&partnerID=8YFLogxK

M3 - Article

VL - 2

SP - 241

EP - 246

JO - Zeitschrift fur Kristallographie, Supplement

JF - Zeitschrift fur Kristallographie, Supplement

SN - 0930-486X

IS - 26

ER -