Growth of magnetron sputtered TiO2 thin films studied by X-ray scattering

R. Kužel, L. Nichtová, D. Heřman, J. Šícha, J. Musil

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)


Two sets of nanocrystalline TiO2 thin films magnetron deposited on glass and silicon substrates have been studied by X-ray scattering and measurements of contact angle of water drop on the film surface. Phase analysis and X-ray line broadening were studied by X-ray powder diffraction in parallel beam optics, the residual stresses were measured with the aid of the Eulerian cradle and surface roughness determined by X-ray reflectivity measurement. By both thickness dependence of XRD patterns and depth profiling mesurements it was found that rutile growths on the substrate and it is transformed to anatase with increasing distance from the substrate.

Original languageEnglish
Pages (from-to)241-246
Number of pages6
JournalZeitschrift fur Kristallographie, Supplement
Issue number26
Publication statusPublished - 1 Dec 2007


  • Thin film growth
  • Thin films
  • Titanium oxide
  • X-ray diffraction

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Inorganic Chemistry

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