Growth and structure of thin films by high-intensity pulsed ion-beam deposition

Yu F. Ivanov, V. M. Matvienko, A. V. Potyomkin, G. E. Remnev, A. N. Zakoutayev

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

The high-intensity pulsed ion-beam (HIPIB)/solid interaction results in the generation of an ablated plasma (approx.10 20 cm -3, approx.1 eV) which can be used to advantage for the deposition of thin films. Presented are the results of investigation on the deposition by HIPIB of thin films of high-melting metals, i.e. W, Ta, Mo, Nb, as well as of Al and Cu. The kinetics of the layer-by-layer film growth has been studied using transmission electron microscopy (TEM), transmission electron diffraction (TED) and reflection ellipsometry. The experiments were performed on a TEMP-2 supercurrent accelerator (ion energy 500 keV; ion current density at the target >200 A/cm 2 power density (0.7 - 1.5) 10 8 W/cm 2; pulse duration 60 ns; pulse repetition rate 8 - 10 min -1). The deposition of the films was carried out at room temperature at a high rate of 0.6 - 4.0 mm/s using (100)Si, (001)NaCl, glass and glass ceramic substrates.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium - Proceedings
PublisherMaterials Research Society
Pages593-598
Number of pages6
Volume396
Publication statusPublished - 1996

Fingerprint

Ion beams
Thin films
Electron reflection
Metal melting
Ions
Pulse repetition rate
Ellipsometry
Beam plasma interactions
Glass ceramics
Film growth
Electron diffraction
Particle accelerators
Laser pulses
Current density
Transmission electron microscopy
Plasmas
Glass
Kinetics
Substrates
Experiments

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Ivanov, Y. F., Matvienko, V. M., Potyomkin, A. V., Remnev, G. E., & Zakoutayev, A. N. (1996). Growth and structure of thin films by high-intensity pulsed ion-beam deposition. In Materials Research Society Symposium - Proceedings (Vol. 396, pp. 593-598). Materials Research Society.

Growth and structure of thin films by high-intensity pulsed ion-beam deposition. / Ivanov, Yu F.; Matvienko, V. M.; Potyomkin, A. V.; Remnev, G. E.; Zakoutayev, A. N.

Materials Research Society Symposium - Proceedings. Vol. 396 Materials Research Society, 1996. p. 593-598.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Ivanov, YF, Matvienko, VM, Potyomkin, AV, Remnev, GE & Zakoutayev, AN 1996, Growth and structure of thin films by high-intensity pulsed ion-beam deposition. in Materials Research Society Symposium - Proceedings. vol. 396, Materials Research Society, pp. 593-598.
Ivanov YF, Matvienko VM, Potyomkin AV, Remnev GE, Zakoutayev AN. Growth and structure of thin films by high-intensity pulsed ion-beam deposition. In Materials Research Society Symposium - Proceedings. Vol. 396. Materials Research Society. 1996. p. 593-598
Ivanov, Yu F. ; Matvienko, V. M. ; Potyomkin, A. V. ; Remnev, G. E. ; Zakoutayev, A. N. / Growth and structure of thin films by high-intensity pulsed ion-beam deposition. Materials Research Society Symposium - Proceedings. Vol. 396 Materials Research Society, 1996. pp. 593-598
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