Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina

Petr Pokorný, Jir̂í Bulír̂, Ján Lanĉok, Jindr̂ich Musil, Michal Novotný

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11 Citations (Scopus)


The paper is devoted to the investigation of ion composition of plasma of dc pulsed magnetron discharge generated by a magnetron with Al target in an Ar/O2 mixture. The magnetron discharge was investigated in the non-reactive, metallic and oxide mode of sputtering using a mass spectrometer. The amount and energies of neutral oxygen atoms O, positive O+ and O 2+ ions, and negative O- and O 2- ions were measured as a function of oxygen flow rate φO2, magnetron voltage Ud and constant power Pd = 400 W delivered to the magnetron discharge, repetition frequency of pulses fr = 10 kHz and the ratio of O 2 and Ar flow rates φO2Ar. The content of ions and radicals in magnetron discharge is compared with optical spectroscopy measurements. The obtained results give a deeper insight into reactive magnetron sputtering of oxide films.

Original languageEnglish
Pages (from-to)910-914
Number of pages5
JournalPlasma Processes and Polymers
Issue number11
Publication statusPublished - 23 Nov 2010



  • aluminium oxide
  • ion-energy distribution function
  • magnetron
  • mass spectrometry
  • pulsed discharges

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Polymers and Plastics

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