Abstract
In the paper the principles of generation of low temperature capacitively coupled in a vacuum chamber of a large size with the use of original low-pressure arc discharges are considered. The designs of plasma sources and their main parameters are described. Examples of effective use of the generated plasma in plasma chemical modification of the surfaces of materials and products are presented.
| Original language | English |
|---|---|
| Pages (from-to) | 1326-1338 |
| Number of pages | 13 |
| Journal | Russian Journal of General Chemistry |
| Volume | 85 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - 18 May 2015 |
ASJC Scopus subject areas
- Chemistry(all)
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Cite this
Koval, N. N., Ivanov, Y. F., Lopatin, I. V., Akhmadeev, Y. H., Shugurov, V. V., Krysina, O. V., & Denisov, V. V. (2015). Generation of low-temperature gas discharge plasma in large vacuum volumes for plasma chemical processes. Russian Journal of General Chemistry, 85(5), 1326-1338. https://doi.org/10.1134/S1070363215050485