Abstract
In the paper the principles of generation of low temperature capacitively coupled in a vacuum chamber of a large size with the use of original low-pressure arc discharges are considered. The designs of plasma sources and their main parameters are described. Examples of effective use of the generated plasma in plasma chemical modification of the surfaces of materials and products are presented.
| Original language | English |
|---|---|
| Pages (from-to) | 1326-1338 |
| Number of pages | 13 |
| Journal | Russian Journal of General Chemistry |
| Volume | 85 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - 18 May 2015 |
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ASJC Scopus subject areas
- Chemistry(all)
Cite this
Generation of low-temperature gas discharge plasma in large vacuum volumes for plasma chemical processes. / Koval, Nikolay Nikolaevich; Ivanov, Yu F.; Lopatin, I. V.; Akhmadeev, Yu H.; Shugurov, V. V.; Krysina, O. V.; Denisov, V. V.
In: Russian Journal of General Chemistry, Vol. 85, No. 5, 18.05.2015, p. 1326-1338.Research output: Contribution to journal › Article
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TY - JOUR
T1 - Generation of low-temperature gas discharge plasma in large vacuum volumes for plasma chemical processes
AU - Koval, Nikolay Nikolaevich
AU - Ivanov, Yu F.
AU - Lopatin, I. V.
AU - Akhmadeev, Yu H.
AU - Shugurov, V. V.
AU - Krysina, O. V.
AU - Denisov, V. V.
PY - 2015/5/18
Y1 - 2015/5/18
N2 - In the paper the principles of generation of low temperature capacitively coupled in a vacuum chamber of a large size with the use of original low-pressure arc discharges are considered. The designs of plasma sources and their main parameters are described. Examples of effective use of the generated plasma in plasma chemical modification of the surfaces of materials and products are presented.
AB - In the paper the principles of generation of low temperature capacitively coupled in a vacuum chamber of a large size with the use of original low-pressure arc discharges are considered. The designs of plasma sources and their main parameters are described. Examples of effective use of the generated plasma in plasma chemical modification of the surfaces of materials and products are presented.
UR - http://www.scopus.com/inward/record.url?scp=84935913192&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84935913192&partnerID=8YFLogxK
U2 - 10.1134/S1070363215050485
DO - 10.1134/S1070363215050485
M3 - Article
AN - SCOPUS:84935913192
VL - 85
SP - 1326
EP - 1338
JO - Russian Journal of General Chemistry
JF - Russian Journal of General Chemistry
SN - 1070-3632
IS - 5
ER -