Generation of low-temperature gas discharge plasma in large vacuum volumes for plasma chemical processes

Nikolay Nikolaevich Koval, Yu F. Ivanov, I. V. Lopatin, Yu H. Akhmadeev, V. V. Shugurov, O. V. Krysina, V. V. Denisov

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Abstract

In the paper the principles of generation of low temperature capacitively coupled in a vacuum chamber of a large size with the use of original low-pressure arc discharges are considered. The designs of plasma sources and their main parameters are described. Examples of effective use of the generated plasma in plasma chemical modification of the surfaces of materials and products are presented.

Original languageEnglish
Pages (from-to)1326-1338
Number of pages13
JournalRussian Journal of General Chemistry
Volume85
Issue number5
DOIs
Publication statusPublished - 18 May 2015

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ASJC Scopus subject areas

  • Chemistry(all)

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