Generation of low-temperature gas discharge plasma in large vacuum volumes for plasma chemical processes

Nikolay Nikolaevich Koval, Yu F. Ivanov, I. V. Lopatin, Yu H. Akhmadeev, V. V. Shugurov, O. V. Krysina, V. V. Denisov

Research Center for Physical Materials Science and Composite Materials

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Abstract

In the paper the principles of generation of low temperature capacitively coupled in a vacuum chamber of a large size with the use of original low-pressure arc discharges are considered. The designs of plasma sources and their main parameters are described. Examples of effective use of the generated plasma in plasma chemical modification of the surfaces of materials and products are presented.

Original language	English
Pages (from-to)	1326-1338
Number of pages	13
Journal	Russian Journal of General Chemistry
Volume	85
Issue number	5
DOIs	https://doi.org/10.1134/S1070363215050485
Publication status	Published - 18 May 2015

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ASJC Scopus subject areas

Chemistry(all)

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Koval, N. N., Ivanov, Y. F., Lopatin, I. V., Akhmadeev, Y. H., Shugurov, V. V., Krysina, O. V., & Denisov, V. V. (2015). Generation of low-temperature gas discharge plasma in large vacuum volumes for plasma chemical processes. Russian Journal of General Chemistry, 85(5), 1326-1338. https://doi.org/10.1134/S1070363215050485

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AU - Akhmadeev, Yu H.

AU - Shugurov, V. V.

AU - Krysina, O. V.

AU - Denisov, V. V.

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10.1134/S1070363215050485