Generation of low-temperature gas discharge plasma in large vacuum volumes for plasma chemical processes

Nikolay Nikolaevich Koval, Yu F. Ivanov, I. V. Lopatin, Yu H. Akhmadeev, V. V. Shugurov, O. V. Krysina, V. V. Denisov

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

In the paper the principles of generation of low temperature capacitively coupled in a vacuum chamber of a large size with the use of original low-pressure arc discharges are considered. The designs of plasma sources and their main parameters are described. Examples of effective use of the generated plasma in plasma chemical modification of the surfaces of materials and products are presented.

Original languageEnglish
Pages (from-to)1326-1338
Number of pages13
JournalRussian Journal of General Chemistry
Volume85
Issue number5
DOIs
Publication statusPublished - 18 May 2015

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Plasma Gases
Vacuum
Plasmas
Plasma sources
Chemical modification
Temperature

ASJC Scopus subject areas

  • Chemistry(all)

Cite this

Generation of low-temperature gas discharge plasma in large vacuum volumes for plasma chemical processes. / Koval, Nikolay Nikolaevich; Ivanov, Yu F.; Lopatin, I. V.; Akhmadeev, Yu H.; Shugurov, V. V.; Krysina, O. V.; Denisov, V. V.

In: Russian Journal of General Chemistry, Vol. 85, No. 5, 18.05.2015, p. 1326-1338.

Research output: Contribution to journalArticle

Koval, Nikolay Nikolaevich ; Ivanov, Yu F. ; Lopatin, I. V. ; Akhmadeev, Yu H. ; Shugurov, V. V. ; Krysina, O. V. ; Denisov, V. V. / Generation of low-temperature gas discharge plasma in large vacuum volumes for plasma chemical processes. In: Russian Journal of General Chemistry. 2015 ; Vol. 85, No. 5. pp. 1326-1338.
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