Abstract
Gallium-doped zinc oxide films are deposited using an unbalanced magnetron sputtering system. The films are deposited by dc sputtering of a conducting ceramic target in an argon atmosphere. The substrate temperature is 150°C. The film surface morphology is studied by scanning electron microscopy and atomic force microscopy. As the degree of magnetron unbalance increases, the electrophysical properties of the films deposited along the system axis are shown to improve, and the distribution of the film electrical resistivity over the substrate surface becomes more uniform.
| Original language | English |
|---|---|
| Pages (from-to) | 719-723 |
| Number of pages | 5 |
| Journal | Technical Physics |
| Volume | 55 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - 1 May 2010 |
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ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)
Cite this
Gallium-doped zinc oxide films deposited using an unbalanced magnetron sputtering system. / Zakharov, A. N.; Oskomov, K. V.; Rabotkin, S. V.; Solov'ev, A. A.; Sochugov, N. S.
In: Technical Physics, Vol. 55, No. 5, 01.05.2010, p. 719-723.Research output: Contribution to journal › Article
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TY - JOUR
T1 - Gallium-doped zinc oxide films deposited using an unbalanced magnetron sputtering system
AU - Zakharov, A. N.
AU - Oskomov, K. V.
AU - Rabotkin, S. V.
AU - Solov'ev, A. A.
AU - Sochugov, N. S.
PY - 2010/5/1
Y1 - 2010/5/1
N2 - Gallium-doped zinc oxide films are deposited using an unbalanced magnetron sputtering system. The films are deposited by dc sputtering of a conducting ceramic target in an argon atmosphere. The substrate temperature is 150°C. The film surface morphology is studied by scanning electron microscopy and atomic force microscopy. As the degree of magnetron unbalance increases, the electrophysical properties of the films deposited along the system axis are shown to improve, and the distribution of the film electrical resistivity over the substrate surface becomes more uniform.
AB - Gallium-doped zinc oxide films are deposited using an unbalanced magnetron sputtering system. The films are deposited by dc sputtering of a conducting ceramic target in an argon atmosphere. The substrate temperature is 150°C. The film surface morphology is studied by scanning electron microscopy and atomic force microscopy. As the degree of magnetron unbalance increases, the electrophysical properties of the films deposited along the system axis are shown to improve, and the distribution of the film electrical resistivity over the substrate surface becomes more uniform.
UR - http://www.scopus.com/inward/record.url?scp=79956104613&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=79956104613&partnerID=8YFLogxK
U2 - 10.1134/S1063784210050191
DO - 10.1134/S1063784210050191
M3 - Article
VL - 55
SP - 719
EP - 723
JO - Technical Physics
JF - Technical Physics
SN - 1063-7842
IS - 5
ER -