Formation of concentration profiles of implanted ions in metallic materials under polyenergetic implantation

T. V. Vakhnii, G. A. Vershinin, I. A. Bozhko, I. A. Kurzina, Yu P. Sharkeev, T. S. Grekova

Research output: Contribution to journal › Article

Abstract

A physical and mathematical model of mass transfer in polycrystalline metallic materials under exposure to ion beams is proposed. Alongside bulk indiffusion from the irradiated surface, diffusion along the migrating extensive defects interacting with an impurity is considered. For a polyenergetic ion beam, the contribution of bulk indiffusion is presented as an integral over energy of the product of two functions; one of them describes the energy distribution of ions in a beam and the second represents the implantation profile of monoenergetic ion beam.

Original language	English
Pages (from-to)	301-304
Number of pages	4
Journal	Journal of Surface Investigation
Volume	2
Issue number	2
DOIs	https://doi.org/10.1134/S1027451008020262
Publication status	Published - 1 Apr 2008

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ASJC Scopus subject areas

Surfaces, Coatings and Films

Cite this

Vakhnii, T. V., Vershinin, G. A., Bozhko, I. A., Kurzina, I. A., Sharkeev, Y. P., & Grekova, T. S. (2008). Formation of concentration profiles of implanted ions in metallic materials under polyenergetic implantation. Journal of Surface Investigation, 2(2), 301-304. https://doi.org/10.1134/S1027451008020262

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AU - Bozhko, I. A.

AU - Kurzina, I. A.

AU - Sharkeev, Yu P.

AU - Grekova, T. S.

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10.1134/S1027451008020262