Abstract
This article reports on flexible hard Al-Si-N films prepared by reactive magnetron sputtering. The structure and mechanical properties of Al-Si-N films were controlled by the content of Si in the film, partial pressure of nitrogen pN2 used in sputtering and the power delivered to the magnetron. The Al-Si-N films with a low (≤ 10 at.%) Si content and with a high (≥ 20 at.%) Si content were prepared. Correlations between the structure, microstructure, mechanical properties and their thermal stability of the Al-Si-N films are analyzed in detail. Thermal stability of Al-Si-N films was assessed by thermal annealing in air and water vapor up to annealing temperature Ta = 1200 °C. It is shown that (1) the increase of Si content in the Al-Si-N film leads to the change of its crystalline structure from polycrystalline to X-ray amorphous and (2) the flexible hard Al-Si-N films with high (i) hardness H ≈ 20 GPa, (ii) ratio H/E⁎ ≥ 0.1, and (iii) elastic recovery We ≥ 60% exhibit enhanced resistance to cracking and (3) the thermal stability of Al-Si-N films with a high (≥ 20 at.%) Si content achieves up to Ta ≈ 1200 °C in air and up to Ta ≈ 800 °C in water vapor; here the effective Young's modulus E⁎ = E / (1 − ν2), E is the Young's modulus and ν is the Poisson's ratio. Conditions under which the flexible hard Al-Si-N films with enhanced resistance to cracking and high thermal stability can be prepared are described in detail.
| Original language | English |
|---|---|
| Pages (from-to) | 1112-1118 |
| Number of pages | 7 |
| Journal | Surface and Coatings Technology |
| Volume | 307 |
| DOIs | |
| Publication status | Published - 15 Dec 2016 |
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Keywords
- Al-Si-N film
- High-temperature operation
- Magnetron sputtering
- Mechanical properties
- Structure
- Thermal stability
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry
Cite this
Flexible hard Al-Si-N films for high temperature operation. / Musil, J.; Remnev, G.; Legostaev, V.; Uglov, V.; Lebedynskiy, A.; Lauk, A.; Procházka, J.; Haviar, S.; Smolyanskiy, E.
In: Surface and Coatings Technology, Vol. 307, 15.12.2016, p. 1112-1118.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Flexible hard Al-Si-N films for high temperature operation
AU - Musil, J.
AU - Remnev, G.
AU - Legostaev, V.
AU - Uglov, V.
AU - Lebedynskiy, A.
AU - Lauk, A.
AU - Procházka, J.
AU - Haviar, S.
AU - Smolyanskiy, E.
PY - 2016/12/15
Y1 - 2016/12/15
N2 - This article reports on flexible hard Al-Si-N films prepared by reactive magnetron sputtering. The structure and mechanical properties of Al-Si-N films were controlled by the content of Si in the film, partial pressure of nitrogen pN2 used in sputtering and the power delivered to the magnetron. The Al-Si-N films with a low (≤ 10 at.%) Si content and with a high (≥ 20 at.%) Si content were prepared. Correlations between the structure, microstructure, mechanical properties and their thermal stability of the Al-Si-N films are analyzed in detail. Thermal stability of Al-Si-N films was assessed by thermal annealing in air and water vapor up to annealing temperature Ta = 1200 °C. It is shown that (1) the increase of Si content in the Al-Si-N film leads to the change of its crystalline structure from polycrystalline to X-ray amorphous and (2) the flexible hard Al-Si-N films with high (i) hardness H ≈ 20 GPa, (ii) ratio H/E⁎ ≥ 0.1, and (iii) elastic recovery We ≥ 60% exhibit enhanced resistance to cracking and (3) the thermal stability of Al-Si-N films with a high (≥ 20 at.%) Si content achieves up to Ta ≈ 1200 °C in air and up to Ta ≈ 800 °C in water vapor; here the effective Young's modulus E⁎ = E / (1 − ν2), E is the Young's modulus and ν is the Poisson's ratio. Conditions under which the flexible hard Al-Si-N films with enhanced resistance to cracking and high thermal stability can be prepared are described in detail.
AB - This article reports on flexible hard Al-Si-N films prepared by reactive magnetron sputtering. The structure and mechanical properties of Al-Si-N films were controlled by the content of Si in the film, partial pressure of nitrogen pN2 used in sputtering and the power delivered to the magnetron. The Al-Si-N films with a low (≤ 10 at.%) Si content and with a high (≥ 20 at.%) Si content were prepared. Correlations between the structure, microstructure, mechanical properties and their thermal stability of the Al-Si-N films are analyzed in detail. Thermal stability of Al-Si-N films was assessed by thermal annealing in air and water vapor up to annealing temperature Ta = 1200 °C. It is shown that (1) the increase of Si content in the Al-Si-N film leads to the change of its crystalline structure from polycrystalline to X-ray amorphous and (2) the flexible hard Al-Si-N films with high (i) hardness H ≈ 20 GPa, (ii) ratio H/E⁎ ≥ 0.1, and (iii) elastic recovery We ≥ 60% exhibit enhanced resistance to cracking and (3) the thermal stability of Al-Si-N films with a high (≥ 20 at.%) Si content achieves up to Ta ≈ 1200 °C in air and up to Ta ≈ 800 °C in water vapor; here the effective Young's modulus E⁎ = E / (1 − ν2), E is the Young's modulus and ν is the Poisson's ratio. Conditions under which the flexible hard Al-Si-N films with enhanced resistance to cracking and high thermal stability can be prepared are described in detail.
KW - Al-Si-N film
KW - High-temperature operation
KW - Magnetron sputtering
KW - Mechanical properties
KW - Structure
KW - Thermal stability
UR - http://www.scopus.com/inward/record.url?scp=84971657616&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84971657616&partnerID=8YFLogxK
U2 - 10.1016/j.surfcoat.2016.05.054
DO - 10.1016/j.surfcoat.2016.05.054
M3 - Article
AN - SCOPUS:84971657616
VL - 307
SP - 1112
EP - 1118
JO - Surface and Coatings Technology
JF - Surface and Coatings Technology
SN - 0257-8972
ER -