EUV radiation from plasma of a pseudospark discharge in its different stages

Abstract

The paper describes the main features of the pulsed low-pressure gas discharge in oxygen and xenon, which burns in typical conditions of EUV source operation. It is shown that in a mode of the superdense glow discharge the electron temperature in the discharge plasma is high enough to provide for generation of EUV radiation without magnetic compression of the plasma column.

Original language	English
Title of host publication	Proceedings of SPIE - The International Society for Optical Engineering
Editors	K.A. Valiev, A.A. Orlikovsky
Pages	16-21
Number of pages	6
Volume	5401
DOIs	https://doi.org/10.1117/12.556972
Publication status	Published - 2004
Event	Micro- and Nanoelectronics 2003 - Zvenigorod Duration: 6 Oct 2003 → 10 Oct 2003

Other

Other	Micro- and Nanoelectronics 2003
City	Zvenigorod
Period	6.10.03 → 10.10.03

Keywords

Arc
Dense glow discharge
EUV radiation
Pseudospark discharge
Superdense glow discharge

ASJC Scopus subject areas

Electrical and Electronic Engineering
Condensed Matter Physics

Access to Document

10.1117/12.556972

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EUV radiation from plasma of a pseudospark discharge in its different stages. / Korolev, Yu D.; Frants, O. B.; Geyman, V. G.; Ivashov, R. V.; Landl, N. V.; Shemyakin, I. A.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / K.A. Valiev; A.A. Orlikovsky. Vol. 5401 2004. p. 16-21.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Korolev, YD, Frants, OB, Geyman, VG, Ivashov, RV, Landl, NV & Shemyakin, IA 2004, EUV radiation from plasma of a pseudospark discharge in its different stages. in KA Valiev & AA Orlikovsky (eds), Proceedings of SPIE - The International Society for Optical Engineering. vol. 5401, pp. 16-21, Micro- and Nanoelectronics 2003, Zvenigorod, 6.10.03. https://doi.org/10.1117/12.556972

@inproceedings{38cd364baa6043e3bea16231f105abd8,

title = "EUV radiation from plasma of a pseudospark discharge in its different stages",

abstract = "The paper describes the main features of the pulsed low-pressure gas discharge in oxygen and xenon, which burns in typical conditions of EUV source operation. It is shown that in a mode of the superdense glow discharge the electron temperature in the discharge plasma is high enough to provide for generation of EUV radiation without magnetic compression of the plasma column.",

keywords = "Arc, Dense glow discharge, EUV radiation, Pseudospark discharge, Superdense glow discharge",

author = "Korolev, {Yu D.} and Frants, {O. B.} and Geyman, {V. G.} and Ivashov, {R. V.} and Landl, {N. V.} and Shemyakin, {I. A.}",

year = "2004",

doi = "10.1117/12.556972",

language = "English",

volume = "5401",

pages = "16--21",

editor = "K.A. Valiev and A.A. Orlikovsky",

booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",

note = "Micro- and Nanoelectronics 2003 ; Conference date: 06-10-2003 Through 10-10-2003",

}

TY - GEN

T1 - EUV radiation from plasma of a pseudospark discharge in its different stages

AU - Korolev, Yu D.

AU - Frants, O. B.

AU - Geyman, V. G.

AU - Ivashov, R. V.

AU - Landl, N. V.

AU - Shemyakin, I. A.

PY - 2004

Y1 - 2004

N2 - The paper describes the main features of the pulsed low-pressure gas discharge in oxygen and xenon, which burns in typical conditions of EUV source operation. It is shown that in a mode of the superdense glow discharge the electron temperature in the discharge plasma is high enough to provide for generation of EUV radiation without magnetic compression of the plasma column.

AB - The paper describes the main features of the pulsed low-pressure gas discharge in oxygen and xenon, which burns in typical conditions of EUV source operation. It is shown that in a mode of the superdense glow discharge the electron temperature in the discharge plasma is high enough to provide for generation of EUV radiation without magnetic compression of the plasma column.

KW - Arc

KW - Dense glow discharge

KW - EUV radiation

KW - Pseudospark discharge

KW - Superdense glow discharge

UR - http://www.scopus.com/inward/record.url?scp=3843072028&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=3843072028&partnerID=8YFLogxK

U2 - 10.1117/12.556972

DO - 10.1117/12.556972

M3 - Conference contribution

AN - SCOPUS:3843072028

VL - 5401

SP - 16

EP - 21

BT - Proceedings of SPIE - The International Society for Optical Engineering

A2 - Valiev, K.A.

A2 - Orlikovsky, A.A.

T2 - Micro- and Nanoelectronics 2003

Y2 - 6 October 2003 through 10 October 2003

ER -