EUV radiation from plasma of a pseudospark discharge in its different stages

Yu D. Korolev, O. B. Frants, V. G. Geyman, R. V. Ivashov, N. V. Landl, I. A. Shemyakin

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    1 Citation (Scopus)


    The paper describes the main features of the pulsed low-pressure gas discharge in oxygen and xenon, which burns in typical conditions of EUV source operation. It is shown that in a mode of the superdense glow discharge the electron temperature in the discharge plasma is high enough to provide for generation of EUV radiation without magnetic compression of the plasma column.

    Original languageEnglish
    Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
    EditorsK.A. Valiev, A.A. Orlikovsky
    Number of pages6
    Publication statusPublished - 2004
    EventMicro- and Nanoelectronics 2003 - Zvenigorod
    Duration: 6 Oct 200310 Oct 2003


    OtherMicro- and Nanoelectronics 2003


    • Arc
    • Dense glow discharge
    • EUV radiation
    • Pseudospark discharge
    • Superdense glow discharge

    ASJC Scopus subject areas

    • Electrical and Electronic Engineering
    • Condensed Matter Physics

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