EUV radiation from plasma of a pseudospark discharge in its different stages

Yu D. Korolev, O. B. Frants, V. G. Geyman, R. V. Ivashov, N. V. Landl, I. A. Shemyakin

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

The paper describes the main features of the pulsed low-pressure gas discharge in oxygen and xenon, which burns in typical conditions of EUV source operation. It is shown that in a mode of the superdense glow discharge the electron temperature in the discharge plasma is high enough to provide for generation of EUV radiation without magnetic compression of the plasma column.

Original language	English
Title of host publication	Proceedings of SPIE - The International Society for Optical Engineering
Editors	K.A. Valiev, A.A. Orlikovsky
Pages	16-21
Number of pages	6
Volume	5401
DOIs	https://doi.org/10.1117/12.556972
Publication status	Published - 2004
Event	Micro- and Nanoelectronics 2003 - Zvenigorod Duration: 6 Oct 2003 → 10 Oct 2003

Other

Other	Micro- and Nanoelectronics 2003
City	Zvenigorod
Period	6.10.03 → 10.10.03

Fingerprint

magnetic compression

burn-in

gas discharges

glow discharges

xenon

plasma jets

low pressure

electron energy

Plasmas

Radiation

Electron temperature

Xenon

Glow discharges

oxygen

radiation

Discharge (fluid mechanics)

Oxygen

Gases

Keywords

Arc
Dense glow discharge
EUV radiation
Pseudospark discharge
Superdense glow discharge

ASJC Scopus subject areas

Electrical and Electronic Engineering
Condensed Matter Physics

Cite this

Korolev, Y. D., Frants, O. B., Geyman, V. G., Ivashov, R. V., Landl, N. V., & Shemyakin, I. A. (2004). EUV radiation from plasma of a pseudospark discharge in its different stages. In K. A. Valiev, & A. A. Orlikovsky (Eds.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 5401, pp. 16-21) https://doi.org/10.1117/12.556972

EUV radiation from plasma of a pseudospark discharge in its different stages. / Korolev, Yu D.; Frants, O. B.; Geyman, V. G.; Ivashov, R. V.; Landl, N. V.; Shemyakin, I. A.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / K.A. Valiev; A.A. Orlikovsky. Vol. 5401 2004. p. 16-21.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Korolev, YD, Frants, OB, Geyman, VG, Ivashov, RV, Landl, NV & Shemyakin, IA 2004, EUV radiation from plasma of a pseudospark discharge in its different stages. in KA Valiev & AA Orlikovsky (eds), Proceedings of SPIE - The International Society for Optical Engineering. vol. 5401, pp. 16-21, Micro- and Nanoelectronics 2003, Zvenigorod, 6.10.03. https://doi.org/10.1117/12.556972

Korolev YD, Frants OB, Geyman VG, Ivashov RV, Landl NV, Shemyakin IA. EUV radiation from plasma of a pseudospark discharge in its different stages. In Valiev KA, Orlikovsky AA, editors, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 5401. 2004. p. 16-21 https://doi.org/10.1117/12.556972

Korolev, Yu D. ; Frants, O. B. ; Geyman, V. G. ; Ivashov, R. V. ; Landl, N. V. ; Shemyakin, I. A. / EUV radiation from plasma of a pseudospark discharge in its different stages. Proceedings of SPIE - The International Society for Optical Engineering. editor / K.A. Valiev ; A.A. Orlikovsky. Vol. 5401 2004. pp. 16-21

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Access to Document

10.1117/12.556972