Abstract
The paper describes the main features of the pulsed low-pressure gas discharge in oxygen and xenon, which burns in typical conditions of EUV source operation. It is shown that in a mode of the superdense glow discharge the electron temperature in the discharge plasma is high enough to provide for generation of EUV radiation without magnetic compression of the plasma column.
Original language | English |
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Title of host publication | Proceedings of SPIE - The International Society for Optical Engineering |
Editors | K.A. Valiev, A.A. Orlikovsky |
Pages | 16-21 |
Number of pages | 6 |
Volume | 5401 |
DOIs | |
Publication status | Published - 2004 |
Event | Micro- and Nanoelectronics 2003 - Zvenigorod Duration: 6 Oct 2003 → 10 Oct 2003 |
Other
Other | Micro- and Nanoelectronics 2003 |
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City | Zvenigorod |
Period | 6.10.03 → 10.10.03 |
Keywords
- Arc
- Dense glow discharge
- EUV radiation
- Pseudospark discharge
- Superdense glow discharge
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Condensed Matter Physics