The erosion of a solid surface under high-power pulsed ion beams is considered. The values of atom yield from an irradiated surface due to the evaporation are obtained by numerical simulation. The effect of beam parameters and target characteristics on atom emission intensity was investigated. The technological capabilities of high-power submicrosecond ion beams for solid surface etching are assessed.
|Number of pages||4|
|Journal||Bulletin of the Russian Academy of Sciences: Physics|
|Publication status||Published - Feb 2010|
ASJC Scopus subject areas
- Physics and Astronomy(all)