Electron beam evaporation of the ceramic targets at a forevacuum pressure

A. S. Klimov, A. A. Zenin, E. M. Oks, M. V. Shandrikov, Y. G. Yushkov

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Using a plasma electron source, the process of beam evaporation of the aluminum oxide ceramic was achieved in the pressure range of 5-15 Pa. With the electron beam power density of 103 W/cm2, an evaporation rate for the ceramic was as high as 4 g/hr. The results open the possibility of making the effective ceramic coatings on the basis of electron-beam technologies.

Original languageEnglish
Pages (from-to)40-44
Number of pages5
JournalApplied Physics
Volume2016-January
Issue number3
Publication statusPublished - 2016
Externally publishedYes

Fingerprint

evaporation
electron beams
ceramics
ceramic coatings
electron sources
evaporation rate
radiant flux density
aluminum oxides

Keywords

  • Ceramic evaporation
  • Electron beam
  • Forevacuum pressure range
  • Plasma electron beam source

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Klimov, A. S., Zenin, A. A., Oks, E. M., Shandrikov, M. V., & Yushkov, Y. G. (2016). Electron beam evaporation of the ceramic targets at a forevacuum pressure. Applied Physics, 2016-January(3), 40-44.

Electron beam evaporation of the ceramic targets at a forevacuum pressure. / Klimov, A. S.; Zenin, A. A.; Oks, E. M.; Shandrikov, M. V.; Yushkov, Y. G.

In: Applied Physics, Vol. 2016-January, No. 3, 2016, p. 40-44.

Research output: Contribution to journalArticle

Klimov, AS, Zenin, AA, Oks, EM, Shandrikov, MV & Yushkov, YG 2016, 'Electron beam evaporation of the ceramic targets at a forevacuum pressure', Applied Physics, vol. 2016-January, no. 3, pp. 40-44.
Klimov, A. S. ; Zenin, A. A. ; Oks, E. M. ; Shandrikov, M. V. ; Yushkov, Y. G. / Electron beam evaporation of the ceramic targets at a forevacuum pressure. In: Applied Physics. 2016 ; Vol. 2016-January, No. 3. pp. 40-44.
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