Effect of titanium ion implantation and the gas atmosphere on the electrophysical properties of alumina

A. V. Kabyshev, F. V. Konusov

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

The energy and kinetic characteristics of the dark conductivity and photoconductivity of polycrystalline alumina irradiated by titanium ions and then annealed in vacuum and air have been studied. The effect of temperature on the properties and electron-transport mechanisms is determined. In the air pressure range from 105 to 1 Pa, the electrophysical properties are reversible. A semiconductor coating can be formed on the alumina surface via vacuum annealing; when heated in air, it becomes insulating. The reverse transition is also possible. These modifications are related to the formation of defects, accumulation of oxygen-containing complexes, and changes in the stoichiometric compositions of the compounds synthesized by the ion thermal treatment.

Original languageEnglish
Pages (from-to)734-738
Number of pages5
JournalTechnical Physics
Volume52
Issue number6
DOIs
Publication statusPublished - 1 Jun 2007

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ion implantation
aluminum oxides
titanium
atmospheres
air
gases
vacuum
photoconductivity
ions
coatings
conductivity
annealing
defects
kinetics
oxygen
electrons
temperature
energy

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Effect of titanium ion implantation and the gas atmosphere on the electrophysical properties of alumina. / Kabyshev, A. V.; Konusov, F. V.

In: Technical Physics, Vol. 52, No. 6, 01.06.2007, p. 734-738.

Research output: Contribution to journalArticle

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